JPH027394B2 - - Google Patents

Info

Publication number
JPH027394B2
JPH027394B2 JP10621782A JP10621782A JPH027394B2 JP H027394 B2 JPH027394 B2 JP H027394B2 JP 10621782 A JP10621782 A JP 10621782A JP 10621782 A JP10621782 A JP 10621782A JP H027394 B2 JPH027394 B2 JP H027394B2
Authority
JP
Japan
Prior art keywords
steel strip
width direction
differential pressure
chamber
electron beam
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP10621782A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58224165A (ja
Inventor
Toshio Taguchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP10621782A priority Critical patent/JPS58224165A/ja
Publication of JPS58224165A publication Critical patent/JPS58224165A/ja
Publication of JPH027394B2 publication Critical patent/JPH027394B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/54Controlling or regulating the coating process
    • C23C14/541Heating or cooling of the substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP10621782A 1982-06-22 1982-06-22 真空蒸着装置 Granted JPS58224165A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10621782A JPS58224165A (ja) 1982-06-22 1982-06-22 真空蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10621782A JPS58224165A (ja) 1982-06-22 1982-06-22 真空蒸着装置

Publications (2)

Publication Number Publication Date
JPS58224165A JPS58224165A (ja) 1983-12-26
JPH027394B2 true JPH027394B2 (de) 1990-02-16

Family

ID=14427976

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10621782A Granted JPS58224165A (ja) 1982-06-22 1982-06-22 真空蒸着装置

Country Status (1)

Country Link
JP (1) JPS58224165A (de)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6211173U (de) * 1985-07-04 1987-01-23
DE102010028777B4 (de) * 2010-05-07 2013-12-05 Von Ardenne Anlagentechnik Gmbh Verfahren und Vorrichtung zur Entfernung einer Rückseitenbeschichtung auf einem Substrat

Also Published As

Publication number Publication date
JPS58224165A (ja) 1983-12-26

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