JPH0251254B2 - - Google Patents
Info
- Publication number
- JPH0251254B2 JPH0251254B2 JP60278562A JP27856285A JPH0251254B2 JP H0251254 B2 JPH0251254 B2 JP H0251254B2 JP 60278562 A JP60278562 A JP 60278562A JP 27856285 A JP27856285 A JP 27856285A JP H0251254 B2 JPH0251254 B2 JP H0251254B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- contact
- wafer
- semiconductor wafer
- tank body
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000007747 plating Methods 0.000 claims description 48
- 239000004065 semiconductor Substances 0.000 claims description 17
- 230000000873 masking effect Effects 0.000 claims description 5
- 239000012212 insulator Substances 0.000 claims description 4
- 235000012431 wafers Nutrition 0.000 description 28
- 239000007788 liquid Substances 0.000 description 6
- 230000006866 deterioration Effects 0.000 description 3
- 238000009713 electroplating Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000012141 concentrate Substances 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920002120 photoresistant polymer Polymers 0.000 description 1
- 238000003825 pressing Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/11—Manufacturing methods
Landscapes
- Electroplating Methods And Accessories (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60278562A JPS62136859A (ja) | 1985-12-10 | 1985-12-10 | 半導体ウエハのメツキ装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP60278562A JPS62136859A (ja) | 1985-12-10 | 1985-12-10 | 半導体ウエハのメツキ装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS62136859A JPS62136859A (ja) | 1987-06-19 |
JPH0251254B2 true JPH0251254B2 (enrdf_load_stackoverflow) | 1990-11-06 |
Family
ID=17598991
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP60278562A Granted JPS62136859A (ja) | 1985-12-10 | 1985-12-10 | 半導体ウエハのメツキ装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS62136859A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9529270B2 (en) | 2013-08-13 | 2016-12-27 | Canon Kabushiki Kaisha | Lithography apparatus, and method of manufacturing article |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2668243B2 (ja) * | 1988-07-01 | 1997-10-27 | 富士通株式会社 | メッキ処理方法およびメッキ処理装置 |
-
1985
- 1985-12-10 JP JP60278562A patent/JPS62136859A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9529270B2 (en) | 2013-08-13 | 2016-12-27 | Canon Kabushiki Kaisha | Lithography apparatus, and method of manufacturing article |
Also Published As
Publication number | Publication date |
---|---|
JPS62136859A (ja) | 1987-06-19 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4500394A (en) | Contacting a surface for plating thereon | |
WO1994005827A2 (en) | Dry contact electroplating apparatus | |
TW344888B (en) | Electroplated solder terminal | |
US4724180A (en) | Electrically shielded connectors | |
KR910002010A (ko) | 반도체 디바이스 제조 방법 | |
US6181057B1 (en) | Electrode assembly, cathode device and plating apparatus including an insulating member covering an internal circumferential edge of a cathode member | |
JPH0251254B2 (enrdf_load_stackoverflow) | ||
US6841476B1 (en) | Electroless plating method | |
CN109727942A (zh) | 半导体装置以及半导体装置的制造方法 | |
US4011144A (en) | Methods of forming metallization patterns on beam lead semiconductor devices | |
JP2019214765A (ja) | 配線基板の製造方法およびこれに用いるメッキ用治具 | |
JPH10197557A (ja) | 検査部材及びその製造方法 | |
US3280382A (en) | Semiconductor diode comprising caustic-resistant surface coating | |
JPS6092497A (ja) | メツキ装置 | |
JPH02243800A (ja) | リード端子の製造方法 | |
JP3078795B1 (ja) | 配線基板のメッキ方法及びそれに用いるメッキ用冶具 | |
JPS62188798A (ja) | メツキ用コンタクトピン | |
JPH06179998A (ja) | めっき装置 | |
US20150345043A1 (en) | Method for Electrodeposition of an Electrode on a Dielectric Substrate | |
JPS6038024B2 (ja) | 半導体装置の製造方法 | |
JPH0536698A (ja) | ウエーハメツキ用治具 | |
JPS6348691Y2 (enrdf_load_stackoverflow) | ||
JP3206131B2 (ja) | ウエハ用メッキ装置 | |
JPH0813198A (ja) | 接触導通用電極及びそれを用いた半導体製造装置 | |
US6184613B1 (en) | Electrode assembly, cathode device and plating apparatus including a gap configured to eliminate a concentration of a line of electrical force at a boundary between a cathode and plate forming surface of an object |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
EXPY | Cancellation because of completion of term |