JPH0250613B2 - - Google Patents

Info

Publication number
JPH0250613B2
JPH0250613B2 JP55118536A JP11853680A JPH0250613B2 JP H0250613 B2 JPH0250613 B2 JP H0250613B2 JP 55118536 A JP55118536 A JP 55118536A JP 11853680 A JP11853680 A JP 11853680A JP H0250613 B2 JPH0250613 B2 JP H0250613B2
Authority
JP
Japan
Prior art keywords
mask
plane
wave
slits
order
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP55118536A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5640831A (en
Inventor
Ruumigieeru Jannrui
Nubieeru Misheru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of JPS5640831A publication Critical patent/JPS5640831A/ja
Publication of JPH0250613B2 publication Critical patent/JPH0250613B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70583—Speckle reduction, e.g. coherence control or amplitude/wavefront splitting
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2045—Exposure; Apparatus therefor using originals with apertures, e.g. stencil exposure masks
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70566—Polarisation control
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/7055—Exposure light control in all parts of the microlithographic apparatus, e.g. pulse length control or light interruption
    • G03F7/70575—Wavelength control, e.g. control of bandwidth, multiple wavelength, selection of wavelength or matching of optical components to wavelength
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7065—Production of alignment light, e.g. light source, control of coherence, polarization, pulse length, wavelength
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S359/00—Optical: systems and elements
    • Y10S359/90—Methods

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Spectrometry And Color Measurement (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
JP11853680A 1979-09-10 1980-08-29 Projecting image of mask having periodically distributed plural slits onto support and its application to lithographic photography Granted JPS5640831A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7922554A FR2465255B1 (fr) 1979-09-10 1979-09-10 Procede pour reporter sur un support l'ombre fidele d'un masque perce de fentes distribuees periodiquement, et application de ce procede notamment en photolithogravure

Publications (2)

Publication Number Publication Date
JPS5640831A JPS5640831A (en) 1981-04-17
JPH0250613B2 true JPH0250613B2 (en, 2012) 1990-11-02

Family

ID=9229507

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11853680A Granted JPS5640831A (en) 1979-09-10 1980-08-29 Projecting image of mask having periodically distributed plural slits onto support and its application to lithographic photography

Country Status (7)

Country Link
US (1) US4389094A (en, 2012)
EP (1) EP0025380B1 (en, 2012)
JP (1) JPS5640831A (en, 2012)
AT (1) ATE7967T1 (en, 2012)
CA (1) CA1140373A (en, 2012)
DE (1) DE3068204D1 (en, 2012)
FR (1) FR2465255B1 (en, 2012)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5465220A (en) * 1992-06-02 1995-11-07 Fujitsu Limited Optical exposure method
FR2519157B1 (fr) * 1981-12-30 1987-07-31 Labo Electronique Physique Procede pour la realisation de motifs submicroniques et motifs ainsi obtenus
JPS5930574A (ja) * 1982-08-14 1984-02-18 Konishiroku Photo Ind Co Ltd 電子写真複写機用クリ−ニングブレ−ド
US5243583A (en) * 1989-04-06 1993-09-07 Ricoh Company, Ltd. Optical pickup device with dual grating element
DE19810055A1 (de) * 1998-03-09 1999-09-23 Suess Kg Karl Verfahren zur Nahfeldbelichtung mit im wesentlichen parallelem Licht
RU2164705C1 (ru) * 2000-07-31 2001-03-27 Чурюмов Владимир Александрович Способ получения вариоизображений

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1744642A (en) * 1925-08-04 1930-01-21 Kondo Kenyu Manufacture of reproduced diffraction gratings
DE1572195A1 (de) * 1965-06-05 1970-03-26 Telefunken Patent Verfahren zur Herstellung von Mikrostrukturen kleiner Linienbreite
US3615449A (en) * 1969-09-25 1971-10-26 Rca Corp Method of generating high area-density periodic arrays by diffraction imaging
US3640197A (en) * 1970-01-22 1972-02-08 Motorola Inc Production of fine single lines and of discrete closely spaced fine lines
DE2037590A1 (de) * 1970-07-29 1972-02-10 Licentia Gmbh Verfahren zur Herstellung von Mikro strukturen
US3680945A (en) * 1970-10-23 1972-08-01 Xerox Corp Fabrication of refractive blazed holograms
DE2116713B2 (de) * 1971-04-06 1974-03-28 Ibm Deutschland Gmbh, 7000 Stuttgart Belichtungsverfahren zum Abbilden sehr fein strukturierter Lichtmuster auf Photolackschichten und dazu geeignete Belichtungsvorrichtung
US3697178A (en) * 1971-11-01 1972-10-10 Rca Corp Method of projection printing photoresist masking layers, including elimination of spurious diffraction-associated patterns from the print
JPS5147573A (en) * 1974-10-22 1976-04-23 Japan Atomic Energy Res Inst Yojoodei kongonamaodeino maeshorihoho
JPS51120615A (en) * 1975-04-16 1976-10-22 Nippon Hoso Kyokai <Nhk> Manufacturing method for comb-type electrodes
FR2356975A1 (fr) * 1976-06-30 1978-01-27 Ibm Procede d'impression photolithographique du type a contact permettant d'obtenir des profils a resolution elevee et appareil utilisant un tel procede
FR2406236A1 (fr) * 1976-12-10 1979-05-11 Thomson Csf Dispositif optique a source coherente pour le transfert rapide de motifs sur substrats, applique a la realisation de composants et circuits a microstructures
US4157935A (en) * 1977-12-23 1979-06-12 International Business Machines Corporation Method for producing nozzle arrays for ink jet printers

Also Published As

Publication number Publication date
CA1140373A (en) 1983-02-01
FR2465255B1 (fr) 1987-02-20
ATE7967T1 (de) 1984-06-15
FR2465255A1 (fr) 1981-03-20
DE3068204D1 (en) 1984-07-19
EP0025380A1 (fr) 1981-03-18
JPS5640831A (en) 1981-04-17
US4389094A (en) 1983-06-21
EP0025380B1 (fr) 1984-06-13

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