JPH0248618B2 - - Google Patents

Info

Publication number
JPH0248618B2
JPH0248618B2 JP57011217A JP1121782A JPH0248618B2 JP H0248618 B2 JPH0248618 B2 JP H0248618B2 JP 57011217 A JP57011217 A JP 57011217A JP 1121782 A JP1121782 A JP 1121782A JP H0248618 B2 JPH0248618 B2 JP H0248618B2
Authority
JP
Japan
Prior art keywords
vacuum
carburizing
heating chamber
temperature
heating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57011217A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58130270A (ja
Inventor
Michio Sugyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Individual
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Priority to JP1121782A priority Critical patent/JPS58130270A/ja
Publication of JPS58130270A publication Critical patent/JPS58130270A/ja
Publication of JPH0248618B2 publication Critical patent/JPH0248618B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C8/00—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals
    • C23C8/06—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases
    • C23C8/08—Solid state diffusion of only non-metal elements into metallic material surfaces; Chemical surface treatment of metallic material by reaction of the surface with a reactive gas, leaving reaction products of surface material in the coating, e.g. conversion coatings, passivation of metals using gases only one element being applied
    • C23C8/20—Carburising
    • C23C8/22—Carburising of ferrous surfaces

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
JP1121782A 1982-01-27 1982-01-27 連続真空浸炭炉とその操業方法 Granted JPS58130270A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1121782A JPS58130270A (ja) 1982-01-27 1982-01-27 連続真空浸炭炉とその操業方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1121782A JPS58130270A (ja) 1982-01-27 1982-01-27 連続真空浸炭炉とその操業方法

Publications (2)

Publication Number Publication Date
JPS58130270A JPS58130270A (ja) 1983-08-03
JPH0248618B2 true JPH0248618B2 (enrdf_load_stackoverflow) 1990-10-25

Family

ID=11771796

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1121782A Granted JPS58130270A (ja) 1982-01-27 1982-01-27 連続真空浸炭炉とその操業方法

Country Status (1)

Country Link
JP (1) JPS58130270A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013049898A (ja) * 2011-08-31 2013-03-14 Ihi Corp 真空加熱炉の絶縁抵抗改善方法

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AT404029B (de) * 1996-09-16 1998-07-27 Ald Aichelin Ges M B H Niederdruck-aufkohlungsanlage
JP4537522B2 (ja) * 2000-02-07 2010-09-01 中外炉工業株式会社 間欠駆動式真空浸炭炉
EP1642995A4 (en) * 2003-07-04 2008-12-24 Nachi Fujikoshi Corp METHOD FOR CONTINUOUS VACUUM CARBURATION OF METAL CABLE, METAL STRIP, OR METAL PIPE, AND ASSOCIATED APPARATUS
JP4741523B2 (ja) * 2007-01-19 2011-08-03 株式会社電子工学センター 瞬停発生装置
JP5225634B2 (ja) * 2007-08-14 2013-07-03 Ｄｏｗａサーモテック株式会社 熱処理方法及び熱処理設備
EP3136032A1 (en) * 2014-04-24 2017-03-01 IHI Corporation Heat treatment device

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5431976A (en) * 1977-08-13 1979-03-09 Norichika Tanaka Multiistage vertical incinerator
JPS568915A (en) * 1979-07-03 1981-01-29 Victor Co Of Japan Ltd Nonlinear distortion reducing circuit of digital filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013049898A (ja) * 2011-08-31 2013-03-14 Ihi Corp 真空加熱炉の絶縁抵抗改善方法

Also Published As

Publication number Publication date
JPS58130270A (ja) 1983-08-03

Similar Documents

Publication Publication Date Title
JPS6127485A (ja) 連続式雰囲気熱処理炉
JPH08285462A (ja) 真空下で金属加工物を熱処理する装置
JPH0141684B2 (enrdf_load_stackoverflow)
KR100881822B1 (ko) 침탄 처리 장치
JPH0248618B2 (enrdf_load_stackoverflow)
JPS63148088A (ja) 連続式真空熱処理炉
TW469338B (en) Substrate heating method and the continuous heat treatment furnace thereof
JP3211356B2 (ja) インライン式プラズマｃｖｄ装置
JP5428032B2 (ja) 浸炭処理方法
JP2859704B2 (ja) 真空熱処理炉
JPH04297025A (ja) 半導体製造装置
JP2871111B2 (ja) 真空炉における冷却方法
JP2001004282A (ja) 真空加熱装置
JP3537049B2 (ja) 連続真空浸炭方法およびその装置
JPS60141863A (ja) 連続熱処理方法および連続熱処理装置
JPS63262455A (ja) 真空浸炭炉とその操業方法
JP2555868B2 (ja) 真空熱処理方法
JP2833051B2 (ja) 真空熱処理方法
JPH0268927A (ja) 半導体製造装置
JP3103905B2 (ja) バッチ型雰囲気炉の炉圧調整方法
JP2003171717A (ja) ２室型熱処理炉
JPH0345946Y2 (enrdf_load_stackoverflow)
JP2003166016A (ja) 真空浸炭装置
JPH06248329A (ja) 焼入油槽室を有する熱処理装置
JPH0382707A (ja) 連続式真空熱処理炉