JPH0248425Y2 - - Google Patents

Info

Publication number
JPH0248425Y2
JPH0248425Y2 JP1985170698U JP17069885U JPH0248425Y2 JP H0248425 Y2 JPH0248425 Y2 JP H0248425Y2 JP 1985170698 U JP1985170698 U JP 1985170698U JP 17069885 U JP17069885 U JP 17069885U JP H0248425 Y2 JPH0248425 Y2 JP H0248425Y2
Authority
JP
Japan
Prior art keywords
wafer
disk
hook
vacuum evaporation
flat surface
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1985170698U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6279872U (enrdf_load_html_response
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985170698U priority Critical patent/JPH0248425Y2/ja
Publication of JPS6279872U publication Critical patent/JPS6279872U/ja
Application granted granted Critical
Publication of JPH0248425Y2 publication Critical patent/JPH0248425Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
  • Physical Vapour Deposition (AREA)
JP1985170698U 1985-11-05 1985-11-05 Expired JPH0248425Y2 (enrdf_load_html_response)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985170698U JPH0248425Y2 (enrdf_load_html_response) 1985-11-05 1985-11-05

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985170698U JPH0248425Y2 (enrdf_load_html_response) 1985-11-05 1985-11-05

Publications (2)

Publication Number Publication Date
JPS6279872U JPS6279872U (enrdf_load_html_response) 1987-05-21
JPH0248425Y2 true JPH0248425Y2 (enrdf_load_html_response) 1990-12-19

Family

ID=31105656

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985170698U Expired JPH0248425Y2 (enrdf_load_html_response) 1985-11-05 1985-11-05

Country Status (1)

Country Link
JP (1) JPH0248425Y2 (enrdf_load_html_response)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5818711B2 (ja) * 2012-02-14 2015-11-18 三菱電機株式会社 ウェハ保持構造およびそれを備えた蒸着装置

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61194175A (ja) * 1985-02-21 1986-08-28 Murata Mfg Co Ltd 薄膜形成装置

Also Published As

Publication number Publication date
JPS6279872U (enrdf_load_html_response) 1987-05-21

Similar Documents

Publication Publication Date Title
US4674621A (en) Substrate processing apparatus
EP0555890A3 (en) Vacuum processing system
JPH10335435A (ja) 枚葉式ウエハ用化学気相堆積／エッチングプロセスチャンバのための石英ピンリフト
JPH0248425Y2 (enrdf_load_html_response)
JPH0727628Y2 (ja) ウエハ保持治具
JPH10150095A (ja) ウエーハ処理装置
US20030124765A1 (en) System and method for achieving planar alignment of a substrate during solder ball mounting for use in semiconductor fabrication
JP2793554B2 (ja) 半導体装置の製造方法
JP3007963U (ja) 真空蒸着装置のワーク取付具
JPS6245378A (ja) 塗布装置
JP2629274B2 (ja) 半導体ウェーハのオリエンテーション・フラット合せ機
JP2646832B2 (ja) ウェハー整列装置
JPS6356310B2 (enrdf_load_html_response)
JPH0722892B2 (ja) 光ディスク成形用スタンパの裏面研磨装置
JPS6220348A (ja) ウエハ自公転機構
JPS607487Y2 (ja) ペレツト剥離装置
JPH05295540A (ja) 真空成膜装置
KR20020097332A (ko) 반도체 웨이퍼 고정용 진공 척
JPH08319560A (ja) 真空蒸着装置および真空蒸着方法
JPH0129004Y2 (enrdf_load_html_response)
JPH07164291A (ja) ウェーハ外周部の研磨装置
JPH0638111Y2 (ja) 成膜装置の試料台保持機構
JPS626640B2 (enrdf_load_html_response)
JPH06151566A (ja) オリフラ位置検出装置およびオリフラ位置合わせ装置
JPH0635471Y2 (ja) ウエーハ持ち替え用治具