JPH0243172B2 - - Google Patents

Info

Publication number
JPH0243172B2
JPH0243172B2 JP56095916A JP9591681A JPH0243172B2 JP H0243172 B2 JPH0243172 B2 JP H0243172B2 JP 56095916 A JP56095916 A JP 56095916A JP 9591681 A JP9591681 A JP 9591681A JP H0243172 B2 JPH0243172 B2 JP H0243172B2
Authority
JP
Japan
Prior art keywords
resist
resist film
plasma
pattern
radiation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP56095916A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57211143A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP9591681A priority Critical patent/JPS57211143A/ja
Publication of JPS57211143A publication Critical patent/JPS57211143A/ja
Publication of JPH0243172B2 publication Critical patent/JPH0243172B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP9591681A 1981-06-23 1981-06-23 Formation of micropattern Granted JPS57211143A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9591681A JPS57211143A (en) 1981-06-23 1981-06-23 Formation of micropattern

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9591681A JPS57211143A (en) 1981-06-23 1981-06-23 Formation of micropattern

Publications (2)

Publication Number Publication Date
JPS57211143A JPS57211143A (en) 1982-12-24
JPH0243172B2 true JPH0243172B2 (en, 2012) 1990-09-27

Family

ID=14150597

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9591681A Granted JPS57211143A (en) 1981-06-23 1981-06-23 Formation of micropattern

Country Status (1)

Country Link
JP (1) JPS57211143A (en, 2012)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61248035A (ja) * 1985-04-26 1986-11-05 Nippon Zeon Co Ltd 密着性の改良されたホトレジスト組成物
JPS62137830A (ja) * 1985-12-12 1987-06-20 Mitsubishi Electric Corp 微細パタ−ン形成方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5952824B2 (ja) * 1977-05-02 1984-12-21 株式会社日立製作所 感光性組成物処理方法
JPS5427369A (en) * 1977-08-01 1979-03-01 Hitachi Ltd Pattern formation method
JPS5449072A (en) * 1977-09-26 1979-04-18 Mitsubishi Electric Corp Developing method for resist film
JPS5460571A (en) * 1977-10-24 1979-05-16 Cho Lsi Gijutsu Kenkyu Kumiai Dry developing and etching method
JPS57157241A (en) * 1981-03-25 1982-09-28 Oki Electric Ind Co Ltd Formation of resist material and its pattern
US4396704A (en) * 1981-04-22 1983-08-02 Bell Telephone Laboratories, Incorporated Solid state devices produced by organometallic plasma developed resists
JPS57202537A (en) * 1981-06-09 1982-12-11 Fujitsu Ltd Resist composition for dry development
JPS57202533A (en) * 1981-06-09 1982-12-11 Fujitsu Ltd Formation of pattern
JPS57202535A (en) * 1981-06-09 1982-12-11 Fujitsu Ltd Formation of negative resist pattern
JPS57202532A (en) * 1981-06-09 1982-12-11 Fujitsu Ltd Formation of pattern
JPS57202534A (en) * 1981-06-09 1982-12-11 Fujitsu Ltd Negative type resist composition

Also Published As

Publication number Publication date
JPS57211143A (en) 1982-12-24

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