JPH0238587A - レーザ加工とウエットエッチングを併用した加工方法 - Google Patents
レーザ加工とウエットエッチングを併用した加工方法Info
- Publication number
- JPH0238587A JPH0238587A JP63187528A JP18752888A JPH0238587A JP H0238587 A JPH0238587 A JP H0238587A JP 63187528 A JP63187528 A JP 63187528A JP 18752888 A JP18752888 A JP 18752888A JP H0238587 A JPH0238587 A JP H0238587A
- Authority
- JP
- Japan
- Prior art keywords
- melted
- substrate
- etching
- processing
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000001039 wet etching Methods 0.000 title claims description 11
- 238000003754 machining Methods 0.000 title abstract 3
- 238000000034 method Methods 0.000 title description 7
- 238000005530 etching Methods 0.000 claims abstract description 26
- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- 238000003672 processing method Methods 0.000 claims description 4
- 239000000758 substrate Substances 0.000 abstract description 39
- 229910021578 Iron(III) chloride Inorganic materials 0.000 abstract description 3
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 abstract description 3
- 239000000243 solution Substances 0.000 description 6
- 229910003271 Ni-Fe Inorganic materials 0.000 description 4
- 229910001004 magnetic alloy Inorganic materials 0.000 description 4
- 230000000149 penetrating effect Effects 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 3
- 238000005553 drilling Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 229910052751 metal Inorganic materials 0.000 description 3
- 239000002184 metal Substances 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- 230000001681 protective effect Effects 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000003698 laser cutting Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/50—Working by transmitting the laser beam through or within the workpiece
- B23K26/53—Working by transmitting the laser beam through or within the workpiece for modifying or reforming the material inside the workpiece, e.g. for producing break initiation cracks
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/352—Working by laser beam, e.g. welding, cutting or boring for surface treatment
- B23K26/354—Working by laser beam, e.g. welding, cutting or boring for surface treatment by melting
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Plasma & Fusion (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Laser Beam Processing (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63187528A JPH0238587A (ja) | 1988-07-27 | 1988-07-27 | レーザ加工とウエットエッチングを併用した加工方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP63187528A JPH0238587A (ja) | 1988-07-27 | 1988-07-27 | レーザ加工とウエットエッチングを併用した加工方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPH0238587A true JPH0238587A (ja) | 1990-02-07 |
JPH0453952B2 JPH0453952B2 (de) | 1992-08-28 |
Family
ID=16207664
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP63187528A Granted JPH0238587A (ja) | 1988-07-27 | 1988-07-27 | レーザ加工とウエットエッチングを併用した加工方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0238587A (de) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4110745A1 (de) * | 1990-04-04 | 1991-10-10 | Mitsubishi Electric Corp | Verfahren zur bearbeitung eines keramischen materials |
US5185295A (en) * | 1990-05-16 | 1993-02-09 | Kabushiki Kaisha Toshiba | Method for dicing semiconductor substrates using a laser scribing and dual etch process |
WO1994024705A1 (en) * | 1993-04-14 | 1994-10-27 | Hitachi Construction Machinery Co., Ltd. | Metal sheet processing method and lead frame processing method, and lead frame and semiconductor device manufacturing method and semiconductor device |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62202418A (ja) * | 1986-03-03 | 1987-09-07 | 凸版印刷株式会社 | 透明電極基板の製造法 |
-
1988
- 1988-07-27 JP JP63187528A patent/JPH0238587A/ja active Granted
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS62202418A (ja) * | 1986-03-03 | 1987-09-07 | 凸版印刷株式会社 | 透明電極基板の製造法 |
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4110745A1 (de) * | 1990-04-04 | 1991-10-10 | Mitsubishi Electric Corp | Verfahren zur bearbeitung eines keramischen materials |
US5178725A (en) * | 1990-04-04 | 1993-01-12 | Mitsubishi Denki Kabushiki Kaisha | Method for working ceramic material |
DE4110745C2 (de) * | 1990-04-04 | 1997-01-16 | Mitsubishi Electric Corp | Verfahren zum Materialabtrag an schwer bearbeitbarem, im wesentlichen aus keramischem Material bestehendem Basismaterial |
US5185295A (en) * | 1990-05-16 | 1993-02-09 | Kabushiki Kaisha Toshiba | Method for dicing semiconductor substrates using a laser scribing and dual etch process |
WO1994024705A1 (en) * | 1993-04-14 | 1994-10-27 | Hitachi Construction Machinery Co., Ltd. | Metal sheet processing method and lead frame processing method, and lead frame and semiconductor device manufacturing method and semiconductor device |
US5580466A (en) * | 1993-04-14 | 1996-12-03 | Hitachi Construction Machinery Co., Ltd. | Metal plate processing method, lead frame processing method, lead frame, semiconductor device manufacturing method, and semiconductor device |
Also Published As
Publication number | Publication date |
---|---|
JPH0453952B2 (de) | 1992-08-28 |
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