JPH0237092B2 - - Google Patents
Info
- Publication number
- JPH0237092B2 JPH0237092B2 JP60209741A JP20974185A JPH0237092B2 JP H0237092 B2 JPH0237092 B2 JP H0237092B2 JP 60209741 A JP60209741 A JP 60209741A JP 20974185 A JP20974185 A JP 20974185A JP H0237092 B2 JPH0237092 B2 JP H0237092B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film
- forming
- charged particles
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Electrodes Of Semiconductors (AREA)
- Internal Circuitry In Semiconductor Integrated Circuit Devices (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60209741A JPS6269534A (ja) | 1985-09-20 | 1985-09-20 | 平坦性薄膜の形成方法 |
| CA000508851A CA1247464A (en) | 1985-05-13 | 1986-05-12 | Method for forming a planarized thin film |
| DE3650612T DE3650612T2 (de) | 1985-05-13 | 1986-05-12 | Verfahren zur Planarisierung einer dünnen Al-Schicht |
| EP93102886A EP0544648B1 (en) | 1985-05-13 | 1986-05-12 | Method for forming a planarized Al thin film |
| KR1019860003683A KR900005785B1 (ko) | 1985-05-13 | 1986-05-12 | 평탄성 박막의 제조방법 |
| EP86106432A EP0202572B1 (en) | 1985-05-13 | 1986-05-12 | Method for forming a planarized aluminium thin film |
| DE3689388T DE3689388T2 (de) | 1985-05-13 | 1986-05-12 | Verfahren zur Herstellung einer planierten Dünnschicht aus Aluminium. |
| US07/075,208 US4816126A (en) | 1985-05-13 | 1987-07-20 | Method for forming a planarized thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60209741A JPS6269534A (ja) | 1985-09-20 | 1985-09-20 | 平坦性薄膜の形成方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6269534A JPS6269534A (ja) | 1987-03-30 |
| JPH0237092B2 true JPH0237092B2 (enrdf_load_stackoverflow) | 1990-08-22 |
Family
ID=16577868
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60209741A Granted JPS6269534A (ja) | 1985-05-13 | 1985-09-20 | 平坦性薄膜の形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6269534A (enrdf_load_stackoverflow) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3382031B2 (ja) * | 1993-11-16 | 2003-03-04 | 株式会社東芝 | 半導体装置の製造方法 |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5810838A (ja) * | 1981-07-14 | 1983-01-21 | Fujitsu Ltd | 半導体装置の製造方法 |
| JPS58115835A (ja) * | 1981-12-28 | 1983-07-09 | Fujitsu Ltd | 半導体装置の埋込配線形成方法 |
-
1985
- 1985-09-20 JP JP60209741A patent/JPS6269534A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6269534A (ja) | 1987-03-30 |
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