JPH0235438U - - Google Patents

Info

Publication number
JPH0235438U
JPH0235438U JP11397488U JP11397488U JPH0235438U JP H0235438 U JPH0235438 U JP H0235438U JP 11397488 U JP11397488 U JP 11397488U JP 11397488 U JP11397488 U JP 11397488U JP H0235438 U JPH0235438 U JP H0235438U
Authority
JP
Japan
Prior art keywords
substrate
electrode
processed
electric field
electrostatic adsorption
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP11397488U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11397488U priority Critical patent/JPH0235438U/ja
Publication of JPH0235438U publication Critical patent/JPH0235438U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Physical Vapour Deposition (AREA)
  • Drying Of Semiconductors (AREA)
JP11397488U 1988-08-29 1988-08-29 Pending JPH0235438U (enrdf_load_stackoverflow)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11397488U JPH0235438U (enrdf_load_stackoverflow) 1988-08-29 1988-08-29

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11397488U JPH0235438U (enrdf_load_stackoverflow) 1988-08-29 1988-08-29

Publications (1)

Publication Number Publication Date
JPH0235438U true JPH0235438U (enrdf_load_stackoverflow) 1990-03-07

Family

ID=31354299

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11397488U Pending JPH0235438U (enrdf_load_stackoverflow) 1988-08-29 1988-08-29

Country Status (1)

Country Link
JP (1) JPH0235438U (enrdf_load_stackoverflow)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001516967A (ja) * 1997-09-16 2001-10-02 アプライド マテリアルズ インコーポレイテッド 電気的に結合されているカラーリングを有するプラズマチャンバ支持体
JP2001345372A (ja) * 2000-05-31 2001-12-14 Kyocera Corp ウエハ支持部材及びその製造方法
WO2007132757A1 (ja) * 2006-05-15 2007-11-22 Ulvac, Inc. クリーニング方法及び真空処理装置
JP2008171888A (ja) * 2007-01-09 2008-07-24 Ulvac Japan Ltd プラズマｃｖｄ装置、薄膜形成方法
JP2011138907A (ja) * 2009-12-28 2011-07-14 Tokyo Electron Ltd プラズマ処理装置
US8962101B2 (en) 2007-08-31 2015-02-24 Novellus Systems, Inc. Methods and apparatus for plasma-based deposition
US9088085B2 (en) 2012-09-21 2015-07-21 Novellus Systems, Inc. High temperature electrode connections
JP2022523630A (ja) * 2019-01-15 2022-04-26 アプライド マテリアルズ インコーポレイテッド 基板処理チャンバ用ペデスタル

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001516967A (ja) * 1997-09-16 2001-10-02 アプライド マテリアルズ インコーポレイテッド 電気的に結合されているカラーリングを有するプラズマチャンバ支持体
JP2001345372A (ja) * 2000-05-31 2001-12-14 Kyocera Corp ウエハ支持部材及びその製造方法
WO2007132757A1 (ja) * 2006-05-15 2007-11-22 Ulvac, Inc. クリーニング方法及び真空処理装置
JP5335421B2 (ja) * 2006-05-15 2013-11-06 株式会社アルバック 真空処理装置
JP2008171888A (ja) * 2007-01-09 2008-07-24 Ulvac Japan Ltd プラズマｃｖｄ装置、薄膜形成方法
US8962101B2 (en) 2007-08-31 2015-02-24 Novellus Systems, Inc. Methods and apparatus for plasma-based deposition
JP2011138907A (ja) * 2009-12-28 2011-07-14 Tokyo Electron Ltd プラズマ処理装置
US9245776B2 (en) 2009-12-28 2016-01-26 Tokyo Electron Limited Plasma processing apparatus
US9088085B2 (en) 2012-09-21 2015-07-21 Novellus Systems, Inc. High temperature electrode connections
JP2022523630A (ja) * 2019-01-15 2022-04-26 アプライド マテリアルズ インコーポレイテッド 基板処理チャンバ用ペデスタル
JP2024102072A (ja) * 2019-01-15 2024-07-30 アプライド マテリアルズ インコーポレイテッド 基板処理チャンバ用ペデスタル

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