JPH023492B2 - - Google Patents

Info

Publication number
JPH023492B2
JPH023492B2 JP57059452A JP5945282A JPH023492B2 JP H023492 B2 JPH023492 B2 JP H023492B2 JP 57059452 A JP57059452 A JP 57059452A JP 5945282 A JP5945282 A JP 5945282A JP H023492 B2 JPH023492 B2 JP H023492B2
Authority
JP
Japan
Prior art keywords
water
polyvinyl alcohol
salts
chloride
resin
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57059452A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58174942A (ja
Inventor
Kiichi Maruhashi
Jusuke Tsumura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP5945282A priority Critical patent/JPS58174942A/ja
Publication of JPS58174942A publication Critical patent/JPS58174942A/ja
Publication of JPH023492B2 publication Critical patent/JPH023492B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5945282A 1982-04-08 1982-04-08 フオトレジストの形成法 Granted JPS58174942A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5945282A JPS58174942A (ja) 1982-04-08 1982-04-08 フオトレジストの形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5945282A JPS58174942A (ja) 1982-04-08 1982-04-08 フオトレジストの形成法

Publications (2)

Publication Number Publication Date
JPS58174942A JPS58174942A (ja) 1983-10-14
JPH023492B2 true JPH023492B2 (cg-RX-API-DMAC7.html) 1990-01-23

Family

ID=13113697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5945282A Granted JPS58174942A (ja) 1982-04-08 1982-04-08 フオトレジストの形成法

Country Status (1)

Country Link
JP (1) JPS58174942A (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0653817B2 (ja) * 1986-01-24 1994-07-20 日本合成化学工業株式会社 アセト酢酸エステル基含有水溶性高分子の耐水化方法

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50101445A (cg-RX-API-DMAC7.html) * 1974-01-10 1975-08-12
JPS5757628A (en) * 1980-09-25 1982-04-06 Teijin Ltd Manufacture of blaxially rolled film

Also Published As

Publication number Publication date
JPS58174942A (ja) 1983-10-14

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