JPS58174942A - フオトレジストの形成法 - Google Patents

フオトレジストの形成法

Info

Publication number
JPS58174942A
JPS58174942A JP5945282A JP5945282A JPS58174942A JP S58174942 A JPS58174942 A JP S58174942A JP 5945282 A JP5945282 A JP 5945282A JP 5945282 A JP5945282 A JP 5945282A JP S58174942 A JPS58174942 A JP S58174942A
Authority
JP
Japan
Prior art keywords
polyvinyl alcohol
water
group
chloride
acetoacetate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5945282A
Other languages
English (en)
Japanese (ja)
Other versions
JPH023492B2 (cg-RX-API-DMAC7.html
Inventor
Kiichi Maruhashi
丸橋 基一
Yusuke Tsumura
津村 雄右
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Chemical Corp
Original Assignee
Nippon Synthetic Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Synthetic Chemical Industry Co Ltd filed Critical Nippon Synthetic Chemical Industry Co Ltd
Priority to JP5945282A priority Critical patent/JPS58174942A/ja
Publication of JPS58174942A publication Critical patent/JPS58174942A/ja
Publication of JPH023492B2 publication Critical patent/JPH023492B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP5945282A 1982-04-08 1982-04-08 フオトレジストの形成法 Granted JPS58174942A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5945282A JPS58174942A (ja) 1982-04-08 1982-04-08 フオトレジストの形成法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5945282A JPS58174942A (ja) 1982-04-08 1982-04-08 フオトレジストの形成法

Publications (2)

Publication Number Publication Date
JPS58174942A true JPS58174942A (ja) 1983-10-14
JPH023492B2 JPH023492B2 (cg-RX-API-DMAC7.html) 1990-01-23

Family

ID=13113697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5945282A Granted JPS58174942A (ja) 1982-04-08 1982-04-08 フオトレジストの形成法

Country Status (1)

Country Link
JP (1) JPS58174942A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172027A (ja) * 1986-01-24 1987-07-29 Nippon Synthetic Chem Ind Co Ltd:The アセト酢酸エステル基含有水溶性高分子の耐水化方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50101445A (cg-RX-API-DMAC7.html) * 1974-01-10 1975-08-12
JPS5757628A (en) * 1980-09-25 1982-04-06 Teijin Ltd Manufacture of blaxially rolled film

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS50101445A (cg-RX-API-DMAC7.html) * 1974-01-10 1975-08-12
JPS5757628A (en) * 1980-09-25 1982-04-06 Teijin Ltd Manufacture of blaxially rolled film

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62172027A (ja) * 1986-01-24 1987-07-29 Nippon Synthetic Chem Ind Co Ltd:The アセト酢酸エステル基含有水溶性高分子の耐水化方法

Also Published As

Publication number Publication date
JPH023492B2 (cg-RX-API-DMAC7.html) 1990-01-23

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