JPH0234139B2 - - Google Patents
Info
- Publication number
- JPH0234139B2 JPH0234139B2 JP55143308A JP14330880A JPH0234139B2 JP H0234139 B2 JPH0234139 B2 JP H0234139B2 JP 55143308 A JP55143308 A JP 55143308A JP 14330880 A JP14330880 A JP 14330880A JP H0234139 B2 JPH0234139 B2 JP H0234139B2
- Authority
- JP
- Japan
- Prior art keywords
- electron
- aperture
- alignment
- lens
- electron beam
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/3002—Details
- H01J37/3007—Electron or ion-optical systems
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55143308A JPS5767912A (en) | 1980-10-14 | 1980-10-14 | Axis aligning method of electronic optical lens barrel |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP55143308A JPS5767912A (en) | 1980-10-14 | 1980-10-14 | Axis aligning method of electronic optical lens barrel |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5767912A JPS5767912A (en) | 1982-04-24 |
JPH0234139B2 true JPH0234139B2 (enrdf_load_stackoverflow) | 1990-08-01 |
Family
ID=15335736
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP55143308A Granted JPS5767912A (en) | 1980-10-14 | 1980-10-14 | Axis aligning method of electronic optical lens barrel |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5767912A (enrdf_load_stackoverflow) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6091540A (ja) * | 1983-10-25 | 1985-05-22 | Jeol Ltd | 透過電子顕微鏡における軸合せ方法 |
JPH082400B2 (ja) * | 1991-07-02 | 1996-01-17 | 三洋電機株式会社 | アイロン |
JP2006216299A (ja) * | 2005-02-02 | 2006-08-17 | Jeol Ltd | 荷電粒子線装置及び荷電粒子線装置における収差補正器の軸合わせ方法 |
JP4628230B2 (ja) * | 2005-09-16 | 2011-02-09 | 日本電子株式会社 | 荷電粒子線偏向装置 |
JP4928987B2 (ja) * | 2006-03-08 | 2012-05-09 | 株式会社日立ハイテクノロジーズ | 荷電粒子線調整方法及び荷電粒子線装置 |
DE102009028013B9 (de) * | 2009-07-24 | 2014-04-17 | Carl Zeiss Microscopy Gmbh | Teilchenstrahlgerät mit einer Blendeneinheit und Verfahren zur Einstellung eines Strahlstroms in einem Teilchenstrahlgerät |
JP2014212063A (ja) * | 2013-04-19 | 2014-11-13 | 日本電子株式会社 | 走査荷電粒子顕微鏡、走査荷電粒子顕微鏡の制御方法、および走査荷電粒子顕微鏡の軸合わせ方法 |
JP6959969B2 (ja) * | 2016-01-29 | 2021-11-05 | 株式会社日立ハイテク | 荷電粒子線装置 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS54152456A (en) * | 1978-05-22 | 1979-11-30 | Akashi Seisakusho Kk | Device for centering charged particle beam |
-
1980
- 1980-10-14 JP JP55143308A patent/JPS5767912A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5767912A (en) | 1982-04-24 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
US4983832A (en) | Scanning electron microscope | |
JP4383950B2 (ja) | 荷電粒子線調整方法、及び荷電粒子線装置 | |
US5598002A (en) | Electron beam apparatus | |
US6365897B1 (en) | Electron beam type inspection device and method of making same | |
US3753034A (en) | Electron beam apparatus | |
JPH0234139B2 (enrdf_load_stackoverflow) | ||
JPH0122705B2 (enrdf_load_stackoverflow) | ||
US4382182A (en) | Method of displaying an image of phase contrast in a scanning transmission electron microscope | |
JP2946537B2 (ja) | 電子光学鏡筒 | |
JPS614144A (ja) | 電子顕微鏡による回折パタ−ン表示方法 | |
EP1739713A2 (en) | Charged particle beam instrument and method of detecting information from specimen using charged particle beam | |
US4218621A (en) | Electron beam exposure apparatus | |
JP3351647B2 (ja) | 走査電子顕微鏡 | |
JPH01120749A (ja) | 電子顕微鏡の自動焦点合せ装置 | |
US6677581B1 (en) | High energy electron diffraction apparatus | |
JPS6182428A (ja) | 電荷ビ−ム光学鏡筒のレンズ調整方法 | |
JP2001076659A (ja) | 荷電粒子ビーム顕微鏡、欠陥検査装置及び半導体デバイスの製造方法 | |
JPS5820098B2 (ja) | 電子線偏向走査装置 | |
JP2002246303A (ja) | 焦点調整方法及び電子線描画装置 | |
JPS63114035A (ja) | ビ−ムの心合せ方法 | |
JP2008282826A (ja) | 荷電粒子線調整方法、及び荷電粒子線装置 | |
JPH06290726A (ja) | 荷電粒子ビーム用集束装置 | |
JP3112541B2 (ja) | 電子ビーム装置における非点補正方法 | |
JPH05258700A (ja) | 走査像観察方法および走査電子顕微鏡 | |
JPS586267B2 (ja) | 走査電子顕微鏡 |