JPH0231491B2 - - Google Patents

Info

Publication number
JPH0231491B2
JPH0231491B2 JP59113423A JP11342384A JPH0231491B2 JP H0231491 B2 JPH0231491 B2 JP H0231491B2 JP 59113423 A JP59113423 A JP 59113423A JP 11342384 A JP11342384 A JP 11342384A JP H0231491 B2 JPH0231491 B2 JP H0231491B2
Authority
JP
Japan
Prior art keywords
discharge
chamber
radicals
substrate
growth chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59113423A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60257130A (ja
Inventor
Zenko Hirose
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shingijutsu Kaihatsu Jigyodan
Original Assignee
Shingijutsu Kaihatsu Jigyodan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shingijutsu Kaihatsu Jigyodan filed Critical Shingijutsu Kaihatsu Jigyodan
Priority to JP11342384A priority Critical patent/JPS60257130A/ja
Publication of JPS60257130A publication Critical patent/JPS60257130A/ja
Publication of JPH0231491B2 publication Critical patent/JPH0231491B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/24—Deposition of silicon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/513—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using plasma jets

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
JP11342384A 1984-06-01 1984-06-01 ラジカルビ−ムを用いた薄膜形成方法 Granted JPS60257130A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11342384A JPS60257130A (ja) 1984-06-01 1984-06-01 ラジカルビ−ムを用いた薄膜形成方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11342384A JPS60257130A (ja) 1984-06-01 1984-06-01 ラジカルビ−ムを用いた薄膜形成方法

Publications (2)

Publication Number Publication Date
JPS60257130A JPS60257130A (ja) 1985-12-18
JPH0231491B2 true JPH0231491B2 (cs) 1990-07-13

Family

ID=14611859

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11342384A Granted JPS60257130A (ja) 1984-06-01 1984-06-01 ラジカルビ−ムを用いた薄膜形成方法

Country Status (1)

Country Link
JP (1) JPS60257130A (cs)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6132417A (ja) * 1984-07-24 1986-02-15 Mitsubishi Electric Corp 薄膜形成装置
NL1017849C2 (nl) * 2001-04-16 2002-10-30 Univ Eindhoven Tech Werkwijze en inrichting voor het deponeren van een althans ten dele kristallijne siliciumlaag op een substraat.

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5244174A (en) * 1975-10-06 1977-04-06 Hitachi Ltd Plasma treatment device
JPS57159016A (en) * 1981-03-26 1982-10-01 Sumitomo Electric Ind Ltd Manufacture of amorphous silicon film

Also Published As

Publication number Publication date
JPS60257130A (ja) 1985-12-18

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term