JPH02232363A - 加熱サンプルキャリヤ付き装置 - Google Patents

加熱サンプルキャリヤ付き装置

Info

Publication number
JPH02232363A
JPH02232363A JP1344977A JP34497789A JPH02232363A JP H02232363 A JPH02232363 A JP H02232363A JP 1344977 A JP1344977 A JP 1344977A JP 34497789 A JP34497789 A JP 34497789A JP H02232363 A JPH02232363 A JP H02232363A
Authority
JP
Japan
Prior art keywords
sample carrier
frame
heated sample
heat
disk
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1344977A
Other languages
English (en)
Japanese (ja)
Inventor
Philippe Houdy
フィリップ ウディ
Roger Greco
ロジェ グレコ
Claude Morhaim
クロード モアイム
Francois Delarue
フランソワ デラル
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Koninklijke Philips NV
Original Assignee
Philips Gloeilampenfabrieken NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Philips Gloeilampenfabrieken NV filed Critical Philips Gloeilampenfabrieken NV
Publication of JPH02232363A publication Critical patent/JPH02232363A/ja
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/70Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping
    • H10P72/76Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches
    • H10P72/7604Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support
    • H10P72/7624Handling or holding of wafers, substrates or devices during manufacture or treatment thereof for supporting or gripping using mechanical means, e.g. clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P72/00Handling or holding of wafers, substrates or devices during manufacture or treatment thereof
    • H10P72/04Apparatus for manufacture or treatment
    • H10P72/0431Apparatus for thermal treatment
    • H10P72/0432Apparatus for thermal treatment mainly by conduction
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10WGENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W40/00Arrangements for thermal protection or thermal control
    • H10W40/10Arrangements for heating

Landscapes

  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Surface Heating Bodies (AREA)
  • Physical Vapour Deposition (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Devices For Use In Laboratory Experiments (AREA)
JP1344977A 1988-12-30 1989-12-29 加熱サンプルキャリヤ付き装置 Pending JPH02232363A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8817496A FR2641436A1 (https=) 1988-12-30 1988-12-30
FR8817496 1988-12-30

Publications (1)

Publication Number Publication Date
JPH02232363A true JPH02232363A (ja) 1990-09-14

Family

ID=9373633

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1344977A Pending JPH02232363A (ja) 1988-12-30 1989-12-29 加熱サンプルキャリヤ付き装置

Country Status (4)

Country Link
US (1) US5105066A (https=)
EP (1) EP0376387A1 (https=)
JP (1) JPH02232363A (https=)
FR (1) FR2641436A1 (https=)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002110317A (ja) * 2000-09-28 2002-04-12 Kyocera Corp 円盤状ヒータおよび加熱装置並びにウエハ処理装置
JP2011501458A (ja) * 2007-10-24 2011-01-06 アプライド マテリアルズ イタリア エス. アール. エル. 電子回路の1つ以上のプレートを金属堆積ユニットに位置決めするための位置決めデバイスおよび関連する方法

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE69111493T2 (de) * 1990-03-12 1996-03-21 Ngk Insulators Ltd Wafer-Heizgeräte für Apparate, zur Halbleiterherstellung Heizanlage mit diesen Heizgeräten und Herstellung von Heizgeräten.
US5166856A (en) * 1991-01-31 1992-11-24 International Business Machines Corporation Electrostatic chuck with diamond coating
US5191506A (en) * 1991-05-02 1993-03-02 International Business Machines Corporation Ceramic electrostatic chuck
US5155652A (en) * 1991-05-02 1992-10-13 International Business Machines Corporation Temperature cycling ceramic electrostatic chuck
US6180061B1 (en) 1992-05-11 2001-01-30 Cytologix Corporation Moving platform slide stainer with heating elements
US20040191128A1 (en) * 1992-05-11 2004-09-30 Cytologix Corporation Slide stainer with heating
US5237267A (en) * 1992-05-29 1993-08-17 Cascade Microtech, Inc. Wafer probe station having auxiliary chucks
US6582962B1 (en) * 1998-02-27 2003-06-24 Ventana Medical Systems, Inc. Automated molecular pathology apparatus having independent slide heaters
US6183693B1 (en) * 1998-02-27 2001-02-06 Cytologix Corporation Random access slide stainer with independent slide heating regulation
ES2354598T3 (es) 1998-02-27 2011-03-16 Ventana Medical Systems, Inc. Aparato de patología molecular automatizado que tiene calefactores de portaobjetos independientes.
US6242722B1 (en) * 1999-07-01 2001-06-05 Thermostone Usa, Llc Temperature controlled thin film circular heater
JP4398064B2 (ja) * 2000-05-12 2010-01-13 日本発條株式会社 加熱装置
US7425306B1 (en) 2001-09-11 2008-09-16 Ventana Medical Systems, Inc. Slide heater
US7270785B1 (en) * 2001-11-02 2007-09-18 Ventana Medical Systems, Inc. Automated molecular pathology apparatus having fixed slide platforms
AU2003224987B2 (en) 2002-04-15 2009-09-10 Ventana Medical Systems, Inc. Automated high volume slide staining system
US7468161B2 (en) 2002-04-15 2008-12-23 Ventana Medical Systems, Inc. Automated high volume slide processing system
US11249095B2 (en) 2002-04-15 2022-02-15 Ventana Medical Systems, Inc. Automated high volume slide processing system
JP4091599B2 (ja) * 2002-04-26 2008-05-28 ヴェンタナ メディカル システムズ インコーポレイテッド 固定スライドプラットホームを有する自動化された分子病理学装置
US7025893B2 (en) * 2003-08-12 2006-04-11 Thermo Stone Usa, Llc Structure and method to compensate for thermal edge loss in thin film heaters
EP1697719B1 (en) 2003-12-23 2018-09-19 Ventana Medical Systems, Inc. Method and apparatus for efficient thin film fluid processing of flat surfaces
DE102006038925A1 (de) * 2006-08-18 2008-02-21 Forschungszentrum Jülich GmbH Vorrichtung zum Heizen einer Probe
ITUD20070156A1 (it) * 2007-09-04 2009-03-05 Baccini S P A Disositivo di posizionamento per posizionare uno o piu' wafer a base di silicio, in particolare per celle fotovoltaiche, in un'unita' di deposizione del metallo
ITUD20080141A1 (it) * 2008-06-19 2009-12-20 Baccini S P A Sistema di trasporto di precisione per stampa serigrafica
AU2009313985B2 (en) 2008-11-12 2014-07-31 Ventana Medical Systems, Inc. Methods and apparatuses for heating slides carrying specimens
EP3080579B1 (en) 2013-12-13 2022-07-27 Ventana Medical Systems, Inc. Automated slide processing apparatus

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US1406850A (en) * 1915-07-31 1922-02-14 Jr William S Hadaway Electric stove or heater
US1639382A (en) * 1926-06-08 1927-08-16 Frederick W Moffat Electric heating element
US2261496A (en) * 1938-11-23 1941-11-04 Arthur H Happe Electric heating unit
US2269689A (en) * 1941-01-08 1942-01-13 Reichold Ludwig Electric cooking vessel and stand
US2456202A (en) * 1945-11-26 1948-12-14 Lee Hoard Heating unit
US3047702A (en) * 1958-10-03 1962-07-31 Fredrick L Lefebvre Plate heater
DE2205132C3 (de) * 1972-02-03 1980-09-04 E.G.O. Elektro-Geraete Blanc U. Fischer, 7519 Oberderdingen Elektrokochgerät
US4196338A (en) * 1974-04-29 1980-04-01 Saint-Gobain Industries Electrically heated vehicle window
US4054939A (en) * 1975-06-06 1977-10-18 Elfab Corporation Multi-layer backpanel including metal plate ground and voltage planes
US4491173A (en) * 1982-05-28 1985-01-01 Temptronic Corporation Rotatable inspection table
JPS59124140A (ja) * 1982-12-29 1984-07-18 Fujitsu Ltd 静電吸着装置

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002110317A (ja) * 2000-09-28 2002-04-12 Kyocera Corp 円盤状ヒータおよび加熱装置並びにウエハ処理装置
JP2011501458A (ja) * 2007-10-24 2011-01-06 アプライド マテリアルズ イタリア エス. アール. エル. 電子回路の1つ以上のプレートを金属堆積ユニットに位置決めするための位置決めデバイスおよび関連する方法

Also Published As

Publication number Publication date
US5105066A (en) 1992-04-14
FR2641436A1 (https=) 1990-07-06
EP0376387A1 (fr) 1990-07-04

Similar Documents

Publication Publication Date Title
JPH02232363A (ja) 加熱サンプルキャリヤ付き装置
US6242719B1 (en) Multiple-layered ceramic heater
US5166856A (en) Electrostatic chuck with diamond coating
KR102677038B1 (ko) 정전 척과 그 제조 방법 및 기판 처리 장치
JPH0727962B2 (ja) 温度サイクル動作型セラミック静電式チャック
US20070023320A1 (en) Wafer holder, heater unit having the wafer holder, and wafer prober having the heater unit
KR19980063671A (ko) 기판의 균일 가열을 위한 기판 지지부재
JP2002184558A (ja) ヒータ
US6191390B1 (en) Heating element with a diamond sealing material
JPH0746437Y2 (ja) 静電チャック
US7329842B2 (en) Ceramic heater and method for producing ceramic heater
JP2521471B2 (ja) 静電吸着装置
JP2002146540A (ja) 基板加熱装置
US5126533A (en) Substrate heater utilizing protective heat sinking means
JPH06244143A (ja) 処理装置
JP7213080B2 (ja) 載置台
JP3502827B2 (ja) ウエハ加熱装置
JP2001338862A (ja) ウエハ加熱装置
JP2002198297A (ja) ウエハ加熱装置
JP4975146B2 (ja) ウエハ加熱装置
JP2001189276A (ja) ウエハ加熱装置
JP2002184557A (ja) 半導体製造・検査装置用ヒータ
JP2002110524A (ja) ウエハ加熱装置
JP4002409B2 (ja) ウェハ加熱装置
JP2002083858A (ja) ウエハ加熱装置