JPH0219186B2 - - Google Patents

Info

Publication number
JPH0219186B2
JPH0219186B2 JP58135116A JP13511683A JPH0219186B2 JP H0219186 B2 JPH0219186 B2 JP H0219186B2 JP 58135116 A JP58135116 A JP 58135116A JP 13511683 A JP13511683 A JP 13511683A JP H0219186 B2 JPH0219186 B2 JP H0219186B2
Authority
JP
Japan
Prior art keywords
chamber
substrate
film forming
dust
vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58135116A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6027114A (ja
Inventor
Koyo Tsucha
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ulvac Inc
Original Assignee
Ulvac Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ulvac Inc filed Critical Ulvac Inc
Priority to JP58135116A priority Critical patent/JPS6027114A/ja
Publication of JPS6027114A publication Critical patent/JPS6027114A/ja
Publication of JPH0219186B2 publication Critical patent/JPH0219186B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P95/00—

Landscapes

  • Physical Vapour Deposition (AREA)
JP58135116A 1983-07-26 1983-07-26 真空成膜装置に於ける除塵方法 Granted JPS6027114A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58135116A JPS6027114A (ja) 1983-07-26 1983-07-26 真空成膜装置に於ける除塵方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58135116A JPS6027114A (ja) 1983-07-26 1983-07-26 真空成膜装置に於ける除塵方法

Publications (2)

Publication Number Publication Date
JPS6027114A JPS6027114A (ja) 1985-02-12
JPH0219186B2 true JPH0219186B2 (OSRAM) 1990-04-27

Family

ID=15144197

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58135116A Granted JPS6027114A (ja) 1983-07-26 1983-07-26 真空成膜装置に於ける除塵方法

Country Status (1)

Country Link
JP (1) JPS6027114A (OSRAM)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61291032A (ja) * 1985-06-17 1986-12-20 Fujitsu Ltd 真空装置
JP2577162B2 (ja) * 1991-06-17 1997-01-29 アプライド マテリアルズ インコーポレイテッド ロードロックチャンバにおける加熱されたシリコン基板に生じる温度差を制御する方法および装置
JP2009252953A (ja) * 2008-04-04 2009-10-29 Hitachi High-Technologies Corp 真空処理装置
CN111575672B (zh) * 2020-06-05 2022-09-23 浙江晶驰光电科技有限公司 一种真空溅射镀膜机及其吸灰方法

Also Published As

Publication number Publication date
JPS6027114A (ja) 1985-02-12

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