JPH0217555U - - Google Patents
Info
- Publication number
- JPH0217555U JPH0217555U JP9663688U JP9663688U JPH0217555U JP H0217555 U JPH0217555 U JP H0217555U JP 9663688 U JP9663688 U JP 9663688U JP 9663688 U JP9663688 U JP 9663688U JP H0217555 U JPH0217555 U JP H0217555U
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- heater
- plasma cvd
- cvd apparatus
- cathode electrode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 claims description 4
- 238000005268 plasma chemical vapour deposition Methods 0.000 claims 2
- 238000006243 chemical reaction Methods 0.000 claims 1
- 230000005684 electric field Effects 0.000 claims 1
- 239000010409 thin film Substances 0.000 claims 1
- 239000000376 reactant Substances 0.000 description 1
Landscapes
- Chemical Vapour Deposition (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9663688U JPH0217555U (ko) | 1988-07-21 | 1988-07-21 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP9663688U JPH0217555U (ko) | 1988-07-21 | 1988-07-21 |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH0217555U true JPH0217555U (ko) | 1990-02-05 |
Family
ID=31321672
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP9663688U Pending JPH0217555U (ko) | 1988-07-21 | 1988-07-21 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH0217555U (ko) |
-
1988
- 1988-07-21 JP JP9663688U patent/JPH0217555U/ja active Pending