JPS62107439U - - Google Patents

Info

Publication number
JPS62107439U
JPS62107439U JP19839785U JP19839785U JPS62107439U JP S62107439 U JPS62107439 U JP S62107439U JP 19839785 U JP19839785 U JP 19839785U JP 19839785 U JP19839785 U JP 19839785U JP S62107439 U JPS62107439 U JP S62107439U
Authority
JP
Japan
Prior art keywords
processing chamber
plasma
gas
dry etching
processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP19839785U
Other languages
English (en)
Japanese (ja)
Other versions
JPH0528757Y2 (ko
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1985198397U priority Critical patent/JPH0528757Y2/ja
Publication of JPS62107439U publication Critical patent/JPS62107439U/ja
Application granted granted Critical
Publication of JPH0528757Y2 publication Critical patent/JPH0528757Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP1985198397U 1985-12-25 1985-12-25 Expired - Lifetime JPH0528757Y2 (ko)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1985198397U JPH0528757Y2 (ko) 1985-12-25 1985-12-25

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1985198397U JPH0528757Y2 (ko) 1985-12-25 1985-12-25

Publications (2)

Publication Number Publication Date
JPS62107439U true JPS62107439U (ko) 1987-07-09
JPH0528757Y2 JPH0528757Y2 (ko) 1993-07-23

Family

ID=31159046

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1985198397U Expired - Lifetime JPH0528757Y2 (ko) 1985-12-25 1985-12-25

Country Status (1)

Country Link
JP (1) JPH0528757Y2 (ko)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01287285A (ja) * 1988-05-13 1989-11-17 Matsushita Electric Ind Co Ltd ドライエッチング装置
JP2003520418A (ja) * 1999-09-23 2003-07-02 ラム リサーチ コーポレーション 放射加熱されるセラミックライナを備えた半導体プロセス装置

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753939A (ja) * 1980-09-17 1982-03-31 Matsushita Electric Ind Co Ltd Hakumakunodoraietsuchinguhoho
JPS57100732A (en) * 1980-12-16 1982-06-23 Nec Corp Dry etching device

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5753939A (ja) * 1980-09-17 1982-03-31 Matsushita Electric Ind Co Ltd Hakumakunodoraietsuchinguhoho
JPS57100732A (en) * 1980-12-16 1982-06-23 Nec Corp Dry etching device

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01287285A (ja) * 1988-05-13 1989-11-17 Matsushita Electric Ind Co Ltd ドライエッチング装置
JP2003520418A (ja) * 1999-09-23 2003-07-02 ラム リサーチ コーポレーション 放射加熱されるセラミックライナを備えた半導体プロセス装置
JP4837860B2 (ja) * 1999-09-23 2011-12-14 ラム リサーチ コーポレーション プラズマ処理システム及び基板の処理方法

Also Published As

Publication number Publication date
JPH0528757Y2 (ko) 1993-07-23

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