JPS62148570U - - Google Patents
Info
- Publication number
- JPS62148570U JPS62148570U JP3575686U JP3575686U JPS62148570U JP S62148570 U JPS62148570 U JP S62148570U JP 3575686 U JP3575686 U JP 3575686U JP 3575686 U JP3575686 U JP 3575686U JP S62148570 U JPS62148570 U JP S62148570U
- Authority
- JP
- Japan
- Prior art keywords
- discharge electrode
- plasma processing
- chamber
- sample
- high frequency
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010586 diagram Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
Landscapes
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3575686U JPS62148570U (ko) | 1986-03-11 | 1986-03-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3575686U JPS62148570U (ko) | 1986-03-11 | 1986-03-11 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS62148570U true JPS62148570U (ko) | 1987-09-19 |
Family
ID=30845529
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3575686U Pending JPS62148570U (ko) | 1986-03-11 | 1986-03-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62148570U (ko) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01218626A (ja) * | 1988-02-29 | 1989-08-31 | Hitachi Ltd | 放電洗浄装置 |
| JPH02270320A (ja) * | 1989-04-11 | 1990-11-05 | Hitachi Ltd | 表面処理方法および装置 |
| JPH03249191A (ja) * | 1990-02-28 | 1991-11-07 | Nippon Columbia Co Ltd | スタンパ製造方法 |
| JPH06244147A (ja) * | 1993-02-16 | 1994-09-02 | Tokyo Electron Ltd | プラズマ処理装置 |
| WO2019229784A1 (ja) * | 2018-05-28 | 2019-12-05 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
-
1986
- 1986-03-11 JP JP3575686U patent/JPS62148570U/ja active Pending
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH01218626A (ja) * | 1988-02-29 | 1989-08-31 | Hitachi Ltd | 放電洗浄装置 |
| JPH02270320A (ja) * | 1989-04-11 | 1990-11-05 | Hitachi Ltd | 表面処理方法および装置 |
| JPH03249191A (ja) * | 1990-02-28 | 1991-11-07 | Nippon Columbia Co Ltd | スタンパ製造方法 |
| JPH06244147A (ja) * | 1993-02-16 | 1994-09-02 | Tokyo Electron Ltd | プラズマ処理装置 |
| WO2019229784A1 (ja) * | 2018-05-28 | 2019-12-05 | 株式会社日立ハイテクノロジーズ | プラズマ処理装置 |
| KR20190137062A (ko) * | 2018-05-28 | 2019-12-10 | 가부시키가이샤 히다치 하이테크놀로지즈 | 플라스마 처리 장치 |
| JPWO2019229784A1 (ja) * | 2018-05-28 | 2020-08-27 | 株式会社日立ハイテク | プラズマ処理装置 |
| TWI723406B (zh) * | 2018-05-28 | 2021-04-01 | 日商日立全球先端科技股份有限公司 | 電漿處理裝置 |
| US11424106B2 (en) | 2018-05-28 | 2022-08-23 | Hitachi High-Tech Corporation | Plasma processing apparatus |