JPH0528757Y2 - - Google Patents
Info
- Publication number
- JPH0528757Y2 JPH0528757Y2 JP1985198397U JP19839785U JPH0528757Y2 JP H0528757 Y2 JPH0528757 Y2 JP H0528757Y2 JP 1985198397 U JP1985198397 U JP 1985198397U JP 19839785 U JP19839785 U JP 19839785U JP H0528757 Y2 JPH0528757 Y2 JP H0528757Y2
- Authority
- JP
- Japan
- Prior art keywords
- processing chamber
- lower electrode
- upper electrode
- quartz cover
- reaction products
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000010453 quartz Substances 0.000 claims description 16
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 16
- 238000001312 dry etching Methods 0.000 claims description 9
- 239000007795 chemical reaction product Substances 0.000 description 16
- 239000007789 gas Substances 0.000 description 9
- 238000005530 etching Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 238000000151 deposition Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000009825 accumulation Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 2
- 238000004140 cleaning Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000000463 material Substances 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985198397U JPH0528757Y2 (ko) | 1985-12-25 | 1985-12-25 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1985198397U JPH0528757Y2 (ko) | 1985-12-25 | 1985-12-25 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62107439U JPS62107439U (ko) | 1987-07-09 |
| JPH0528757Y2 true JPH0528757Y2 (ko) | 1993-07-23 |
Family
ID=31159046
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1985198397U Expired - Lifetime JPH0528757Y2 (ko) | 1985-12-25 | 1985-12-25 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0528757Y2 (ko) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2926711B2 (ja) * | 1988-05-13 | 1999-07-28 | 松下電器産業株式会社 | ドライエッチング装置 |
| US6227140B1 (en) * | 1999-09-23 | 2001-05-08 | Lam Research Corporation | Semiconductor processing equipment having radiant heated ceramic liner |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5753939A (ja) * | 1980-09-17 | 1982-03-31 | Matsushita Electric Ind Co Ltd | Hakumakunodoraietsuchinguhoho |
| JPS57100732A (en) * | 1980-12-16 | 1982-06-23 | Nec Corp | Dry etching device |
-
1985
- 1985-12-25 JP JP1985198397U patent/JPH0528757Y2/ja not_active Expired - Lifetime
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5753939A (ja) * | 1980-09-17 | 1982-03-31 | Matsushita Electric Ind Co Ltd | Hakumakunodoraietsuchinguhoho |
| JPS57100732A (en) * | 1980-12-16 | 1982-06-23 | Nec Corp | Dry etching device |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62107439U (ko) | 1987-07-09 |
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