JPH0213465B2 - - Google Patents
Info
- Publication number
- JPH0213465B2 JPH0213465B2 JP55154861A JP15486180A JPH0213465B2 JP H0213465 B2 JPH0213465 B2 JP H0213465B2 JP 55154861 A JP55154861 A JP 55154861A JP 15486180 A JP15486180 A JP 15486180A JP H0213465 B2 JPH0213465 B2 JP H0213465B2
- Authority
- JP
- Japan
- Prior art keywords
- electrode
- capacitance
- semiconductor substrate
- floating electrode
- variable
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000004065 semiconductor Substances 0.000 claims description 34
- 239000000758 substrate Substances 0.000 claims description 24
- 238000009792 diffusion process Methods 0.000 claims description 23
- 239000003990 capacitor Substances 0.000 claims description 17
- 238000002347 injection Methods 0.000 claims 1
- 239000007924 injection Substances 0.000 claims 1
- 239000010408 film Substances 0.000 description 20
- 230000001590 oxidative effect Effects 0.000 description 6
- 238000009413 insulation Methods 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 3
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/86—Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
- H01L29/92—Capacitors having potential barriers
- H01L29/93—Variable capacitance diodes, e.g. varactors
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Ceramic Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Semiconductor Integrated Circuits (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15486180A JPS5778181A (en) | 1980-11-04 | 1980-11-04 | Semiconductor variable capacity element |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15486180A JPS5778181A (en) | 1980-11-04 | 1980-11-04 | Semiconductor variable capacity element |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5778181A JPS5778181A (en) | 1982-05-15 |
JPH0213465B2 true JPH0213465B2 (ko) | 1990-04-04 |
Family
ID=15593511
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15486180A Granted JPS5778181A (en) | 1980-11-04 | 1980-11-04 | Semiconductor variable capacity element |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5778181A (ko) |
Families Citing this family (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH01125987A (ja) * | 1987-11-11 | 1989-05-18 | Seiko Instr & Electron Ltd | 半導体可変容量素子 |
US5248891A (en) * | 1988-03-25 | 1993-09-28 | Hiroshi Takato | High integration semiconductor device |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53115185A (en) * | 1977-03-17 | 1978-10-07 | Sanyo Electric Co Ltd | Memory type variable capacitive device |
JPS53135235A (en) * | 1977-04-30 | 1978-11-25 | Toshiba Corp | Nonvolatile memory array |
-
1980
- 1980-11-04 JP JP15486180A patent/JPS5778181A/ja active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS53115185A (en) * | 1977-03-17 | 1978-10-07 | Sanyo Electric Co Ltd | Memory type variable capacitive device |
JPS53135235A (en) * | 1977-04-30 | 1978-11-25 | Toshiba Corp | Nonvolatile memory array |
Also Published As
Publication number | Publication date |
---|---|
JPS5778181A (en) | 1982-05-15 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP3057661B2 (ja) | 半導体装置 | |
CN101286517B (zh) | 包含电容器的集成电路装置及制造方法 | |
US4646118A (en) | Semiconductor memory device | |
JPS61280651A (ja) | 半導体記憶装置 | |
EP0116643A1 (en) | METHOD FOR PRODUCING A CONDENSER FOR AN INTEGRATED CIRCUIT. | |
JPH02246261A (ja) | コンデンサ構造とモノリシック電圧掛算器 | |
JPS6156446A (ja) | 半導体装置およびその製造方法 | |
JP3272979B2 (ja) | 半導体装置 | |
US20040084713A1 (en) | Structure with composite floating gate by poly spacer in flash | |
JP3203709B2 (ja) | フローティングゲートを有する半導体装置及びその製造方法 | |
JPS58213460A (ja) | 半導体集積回路装置 | |
JPH0213465B2 (ko) | ||
JPS62155557A (ja) | 半導体記憶装置 | |
JPH0138375B2 (ko) | ||
JP3303479B2 (ja) | 薄膜トランジスタ | |
JPH06103735B2 (ja) | 半導体集積回路 | |
JPS61239661A (ja) | 半導体記憶装置 | |
KR960015525B1 (ko) | 반도체 소자의 제조방법 | |
JPH0352232B2 (ko) | ||
JP2002009183A (ja) | 半導体記憶装置およびその製造方法 | |
US4809051A (en) | Vertical punch-through cell | |
JPH0797626B2 (ja) | Mis型半導体記憶装置 | |
JPS6110271A (ja) | 半導体装置 | |
JPS5978561A (ja) | 半導体記憶装置 | |
JPS6358959A (ja) | キヤパシタを有する電界効果型半導体装置 |