JPH02126696A - Enameled wiring board and manufacture thereof - Google Patents
Enameled wiring board and manufacture thereofInfo
- Publication number
- JPH02126696A JPH02126696A JP27937888A JP27937888A JPH02126696A JP H02126696 A JPH02126696 A JP H02126696A JP 27937888 A JP27937888 A JP 27937888A JP 27937888 A JP27937888 A JP 27937888A JP H02126696 A JPH02126696 A JP H02126696A
- Authority
- JP
- Japan
- Prior art keywords
- lead frame
- enamel
- enameled
- layer
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 9
- 239000002184 metal Substances 0.000 claims abstract description 20
- 229910052751 metal Inorganic materials 0.000 claims abstract description 20
- 210000003298 dental enamel Anatomy 0.000 claims abstract description 19
- 238000000034 method Methods 0.000 claims abstract description 10
- 239000011521 glass Substances 0.000 claims abstract description 9
- 239000010409 thin film Substances 0.000 claims abstract description 5
- 239000011248 coating agent Substances 0.000 claims description 4
- 238000000576 coating method Methods 0.000 claims description 4
- 238000004534 enameling Methods 0.000 claims description 4
- 238000010304 firing Methods 0.000 claims description 4
- 238000004080 punching Methods 0.000 claims description 4
- 238000004381 surface treatment Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 abstract description 12
- 238000001721 transfer moulding Methods 0.000 abstract description 4
- 230000003746 surface roughness Effects 0.000 abstract description 3
- 239000003822 epoxy resin Substances 0.000 abstract description 2
- 238000009413 insulation Methods 0.000 abstract description 2
- 229920000647 polyepoxide Polymers 0.000 abstract description 2
- 239000010410 layer Substances 0.000 description 9
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 6
- 239000000956 alloy Substances 0.000 description 4
- 229910045601 alloy Inorganic materials 0.000 description 4
- 238000005488 sandblasting Methods 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 3
- 239000002245 particle Substances 0.000 description 3
- 239000004593 Epoxy Substances 0.000 description 2
- 238000005520 cutting process Methods 0.000 description 2
- 238000005238 degreasing Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- 238000005422 blasting Methods 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000002320 enamel (paints) Substances 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000009545 invasion Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 238000005406 washing Methods 0.000 description 1
Landscapes
- Insulated Metal Substrates For Printed Circuits (AREA)
Abstract
Description
【発明の詳細な説明】
(産業上の利用分野〕
本発明はリードフレーム部と基板部分を一体化したホウ
ロウ配線基板に関する。更に該モジュールを多数枚一連
としたもののホウロウかけなどを一度に施工するホウロ
ウ配線基板の製造法に関する。[Detailed Description of the Invention] (Industrial Application Field) The present invention relates to an enameled wiring board that integrates a lead frame part and a board part.Furthermore, it is possible to perform enameling etc. of a series of many modules at once. This invention relates to a method for manufacturing an enameled wiring board.
〔従来の技術]
従来はアルミナ基板と、リードフレームと(ま別個に製
作されl−ランスファーモールドに於いて一体化されて
いる。第2図において4はアルミナ基板でその表面に回
路を形成し、ICチップ等を実装している。[Prior Art] Conventionally, an alumina substrate and a lead frame (which were manufactured separately and integrated in an l-transfer mold) are used. In Fig. 2, 4 is an alumina substrate on which a circuit is formed. , IC chips, etc. are mounted.
その出力端子部から、ボンディングワイヤでリードフレ
ームへ接続し、これを一体向にエポキシ樹脂等でトラン
スファーモールドによって封止している。The output terminal portion is connected to a lead frame using a bonding wire, and this is integrally sealed with epoxy resin or the like by transfer molding.
また4のアルミナ基板の代りに42合金(Ni42%、
Fe58%)の表面にイオンブレーティング法等でアル
ミナ層を形成し、絶縁層としだものも試みられている。Also, instead of the alumina substrate of 4, 42 alloy (42% Ni,
Attempts have also been made to form an alumina layer on the surface of 58% Fe (58% Fe) using an ion blasting method or the like and use it as an insulating layer.
しかし、これらの配線基板に於いては、工程数が多い上
に、夫々の基板を個別に製造するため、工程が多くなり
、製造コストが非常に高くなるという問題があった。However, these wiring boards require a large number of steps, and since each board is manufactured individually, there are problems in that the number of steps increases and the manufacturing cost becomes extremely high.
(発明が解決しようとする課題〕
本発明の目的tよ回路形成、部品実装等を行<【つだ回
路基板とリードフレームを持ちよって、一体止させる従
来の配線基板の袈漬十の煩雑さを回避し、配線基板の製
造に於ける回路形成やICチップの実装簀の作業を同り
に多数枚)ル続的にでさる様なホウロウ配線基板とする
ことによって、コスト削減と工程の合理化ができるホウ
ロウ配線単板とその製)方法を提供することにある。(Problems to be Solved by the Invention) The purpose of the present invention is to eliminate the complexity of conventional wiring boards in which the circuit board and lead frame are held together and fixed together. Cost reduction and process rationalization can be achieved by using a enamel wiring board, which allows circuit formation and IC chip mounting work to be carried out continuously in the production of wiring boards (many boards at the same time). The purpose of the present invention is to provide an enameled wiring veneer and a method for producing the same.
(課題を解決するための手段)
水元明石らは前記の課題を解決するため鋭意研究を行っ
た。その結末、リードフレームとり仮に別々にホウロウ
がけすることなくリードフレーム部と基板部分とが一体
に形成されたパターンの金属コアを一組としこれを多数
に連続した形に同一金属板に形成し、必要部分のみホウ
ロウ層をコーティングしてなるホウロウ配線基板となす
ことにより工程が合理化され製造コストを人「1]に削
減し得る口とを見い出し本発明を完成した。(Means for solving the problem) Akashi Mizumoto and his colleagues conducted intensive research to solve the above problem. As a result, a set of metal cores with a pattern in which the lead frame part and the board part are integrally formed without enameling the lead frame separately is formed in a continuous form in a large number on the same metal plate. By creating an enamel wiring board with an enamel layer coated only on the necessary parts, the process was streamlined and the manufacturing cost could be reduced to 1 person, and the present invention was completed.
このホウ口′つ層としてはアルカリフリーの結晶化ガラ
スよりなり、表面が簿膜回路形成可能な平滑表面のもの
である事が好ましい。It is preferable that this enamel layer is made of alkali-free crystallized glass and has a smooth surface on which a film circuit can be formed.
製造方法としては同一金属コアよりリードフレームと回
路基板を一体として打扱いて形成した金属板を一組とし
、該金属板を多数組一連に連続した金aiを形成し、表
面処理、ホウロウコーティング、焼成等の後工程を同時
に行うことを特徴とするホ・クロウ配線基板の製造法で
ある。As for the manufacturing method, a set of metal plates is formed by handling the lead frame and circuit board as one unit from the same metal core, and a continuous gold AI is formed in a series of multiple sets of the metal plates, followed by surface treatment, enameling coating, This is a method for manufacturing a hollow wiring board characterized by performing post-processes such as firing at the same time.
本発明にj5いては、第1図の白(友となっている部分
のようなリードフレーム部と基板部分とを一体化した金
属コアをプレスで打扱く。金属コアどしてはリードフレ
ームも兼ねるので42合金又は426合金が好ましい。In the case of the present invention, a metal core that integrates a lead frame part and a board part, such as the white part in FIG. 42 alloy or 426 alloy is preferable because it also serves as a material.
これを数十枚一連として、表面処理(脱脂、サンドブラ
スト)、ガラスコーティング、焼成を行う。Dozens of these pieces are assembled in series and subjected to surface treatment (degreasing, sandblasting), glass coating, and firing.
ここでガラスフリットとしては特間I?3567364
3号広報に示されているようなりad。Is it special I as a glass frit here? 3567364
ad as shown in the 3rd bulletin.
MgO,B O、S+02を含む結晶化ガラスが好適
に用いられる。Crystallized glass containing MgO, B 2 O, and S+02 is preferably used.
焼成後のホウロウ層表面には簿膜回路形成を行うのでガ
ラス粒子には平均粒子径0.5〜4μmのものを用いる
ことが望ましい。これによって薄膜回路形成に必要な表
面粗度Rt=0.5〜1μmのものが得られる。Since a film circuit is formed on the surface of the enamel layer after firing, it is desirable to use glass particles having an average particle diameter of 0.5 to 4 μm. As a result, a surface roughness Rt of 0.5 to 1 μm, which is necessary for forming a thin film circuit, can be obtained.
このホウロウ絶縁の、不要な部分は予め金属コアをマス
キングして、ホウロウ被覆層が形成されない様にするか
、又はホウロウ層rG Ffi形成後サンドブラスト等
で、ホウロウ層を除去し、この侵回路形成、ダイボンド
、ワイヤボンドなどを行なう。For unnecessary parts of this enamel insulation, mask the metal core in advance to prevent the formation of the enamel coating layer, or remove the enamel layer by sandblasting etc. after forming the enamel layer rG Ffi to form this invasion circuit. Performs die bonding, wire bonding, etc.
す板には回路形成、部品実装後、エポキシ81脂などに
よりトランスファーモールドを第1図の点線で囲んだ部
分に対して行う。After circuit formation and component mounting on the board, transfer molding is performed using epoxy 81 resin or the like on the area surrounded by the dotted line in FIG.
最終的には第1図の一点鎖線で示した部分を切断するこ
とにより一組のリードフレーム付基板を(9る。Finally, a set of lead frame-attached substrates (9) are obtained by cutting the portions indicated by the dashed lines in FIG.
第1図において、1は基板、2はリードフレーム、3は
ホウロウを剥離して金属を露出させる部分を示す。点線
内はトランスファーモールド、点鎖線は最終切断部を示
す。In FIG. 1, 1 is a substrate, 2 is a lead frame, and 3 is a portion where the enamel is peeled off to expose the metal. The dotted line shows the transfer mold, and the dotted chain line shows the final cutting part.
第2図の4はアルミナ4根、5tよICチップ、6は導
体回路、7はボンディングワイヤ、8はリードフレーム
、9はトランスファーモールドを示す。In FIG. 2, 4 is alumina 4 roots, 5t is an IC chip, 6 is a conductor circuit, 7 is a bonding wire, 8 is a lead frame, and 9 is a transfer mold.
第3図は従来のリードフレームの一例を示す。FIG. 3 shows an example of a conventional lead frame.
10は基板設定予定場所、11はリードフレームを示す
。Reference numeral 10 indicates a planned board setting location, and reference numeral 11 indicates a lead frame.
(実施例)
以下に実施例により、本発明を更に詳細に説明覆るが、
本発明(よこの実施例に限定されるものではない。(Example) The present invention will be explained in more detail with reference to Examples below.
The present invention is not limited to these embodiments.
厚さ0.27Fの42合金板より、第1図のパターンが
30枚一連に連なったものを白1友部分を残してプレス
により打抜いたリードフレーム付基板連続体を作成した
。A continuous board with a lead frame was prepared by punching out a series of 30 sheets with the pattern shown in FIG. 1 from a 42 alloy plate having a thickness of 0.27F, leaving a white 1-side portion.
この連続体に対して、アルコール洗浄による脱脂、サン
ドブラストを行った後、BaO−MgOB203−8
i 02系でアルカリフリーの結晶化ガラスで平均粒子
t!i!0.8μmのガラスフリットを施釉し、850
℃で焼成した。第1図の一点鎖線と点線の間の部分のホ
ウロウをサンドブラストにより除去した。After degreasing this continuum by alcohol washing and sandblasting, BaO-MgOB203-8
i 02 series alkali-free crystallized glass with average particle size t! i! Glazed with 0.8 μm glass frit, 850
Calcined at ℃. The enamel in the area between the dashed line and the dotted line in FIG. 1 was removed by sandblasting.
ホウロウ基板上に回路形成、ベアチップ等の部品実装を
行い、史に基板端子とリードフレーム部との間のワイヤ
ボンディングを行った(長、点線内部分をエポキシ()
]脂によりトランスファーモールドを行って封止した。Circuits were formed on the enamel board, components such as bare chips were mounted, and wire bonding was performed between the board terminals and the lead frame (length, the part inside the dotted line was made using epoxy ()).
] Transfer molding was performed using oil for sealing.
その後各々に切断し、リードフレーム部と回路基板部分
とが一体に形成されたホウロウ配線基板を得た。Thereafter, each piece was cut to obtain an enameled wiring board in which a lead frame portion and a circuit board portion were integrally formed.
(発明の効果)
以上説明した様に本発明による配線基板はリードフレー
ム部と基板部分とを一体に打l友き形成されたパターン
の金属コアを一組とし、これを多数組連続した形に同一
金属板に形成し、必要部分のみをホウロウ被覆してなる
配線基板であるから同時に多数組のホウロウ配線Jス板
を連続的に得ることができる。このため]Iニ稈が簡略
化され、大幅なコス1へ削減ができる。(Effects of the Invention) As explained above, the wiring board according to the present invention has one set of metal cores with a pattern formed by integrally punching the lead frame part and the board part, and many sets of these metal cores are connected in a continuous form. Since the wiring board is formed on the same metal plate and only the necessary parts are coated with enamel, it is possible to continuously obtain many sets of enamel wiring boards at the same time. Therefore, the I culm is simplified, and the cost can be significantly reduced to 1.
又ホウロウ絶縁層表面は表面粗度Rt−0,5〜1μm
の平滑な表面状態を有するので、ファインパターンの薄
膜回路形成が可能であると共にd機内強度、電磁シール
ド性、放熱性に優れるから配F11基板として極めて有
用である。In addition, the surface of the enamel insulating layer has a surface roughness of Rt-0.5 to 1 μm.
Since it has a smooth surface condition, it is possible to form fine-pattern thin film circuits, and it also has excellent internal strength, electromagnetic shielding properties, and heat dissipation properties, making it extremely useful as an F11 substrate.
第1図は本発明のリードフレームと基板とを一体化した
金属フレームの一組を示した
平面図である。
第2図は従来のプラスチック封小型アルミナ基板とリー
ドフレームの関係を示した断
面立体図である。
第3図は従来のリードフレームの一例を示した平面図で
ある。FIG. 1 is a plan view showing a set of metal frames in which a lead frame and a substrate of the present invention are integrated. FIG. 2 is a sectional three-dimensional view showing the relationship between a conventional plastic-sealed small alumina substrate and a lead frame. FIG. 3 is a plan view showing an example of a conventional lead frame.
Claims (3)
一体として打抜いて形成し、必要部分のみホウロウ層を
コーティングしてなるホウロウ配線基板。1. This enamel wiring board is made by punching out the lead frame part and the board part as one piece from the same metal core, and coating only the necessary parts with an enamel layer.
とを一体として打抜いて形成した金属板を1組とし、該
金属板を多数組一連に連続した金属板を形成し、表面処
理、ホウロウコーディング、焼成等の後工程を同時に行
うことを特徴とするホウロウ配線基板の製造法。2. A set of metal plates is formed by punching out a lead frame part and a circuit board part from the same metal core as one unit, and multiple sets of these metal plates are formed into a series of continuous metal plates, which are then subjected to surface treatment, enameling coating, and firing. A method for manufacturing an enameled wiring board, characterized in that post-processes such as the following are performed simultaneously.
り、表面が薄膜回路形成可能な平滑表面である請求項1
記載のホウロウ配線基板。3. Claim 1: The enamel layer is made of alkali-free crystallized glass and has a smooth surface capable of forming a thin film circuit.
Enamel wiring board described.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27937888A JPH02126696A (en) | 1988-11-07 | 1988-11-07 | Enameled wiring board and manufacture thereof |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP27937888A JPH02126696A (en) | 1988-11-07 | 1988-11-07 | Enameled wiring board and manufacture thereof |
Publications (1)
Publication Number | Publication Date |
---|---|
JPH02126696A true JPH02126696A (en) | 1990-05-15 |
Family
ID=17610310
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP27937888A Pending JPH02126696A (en) | 1988-11-07 | 1988-11-07 | Enameled wiring board and manufacture thereof |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPH02126696A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011014639A (en) * | 2009-06-30 | 2011-01-20 | Yazaki Corp | Base material for metal core substrate and method for manufacturing metal core substrate using the same |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57200564A (en) * | 1981-06-03 | 1982-12-08 | Fujikura Ltd | Manufacture of enameled substrate |
JPS59155152A (en) * | 1983-02-24 | 1984-09-04 | Seiko Epson Corp | Resin-sealed semiconductor device |
JPS59219951A (en) * | 1983-05-30 | 1984-12-11 | Sumitomo Electric Ind Ltd | Lead frame for plastic seal type semiconductor device |
JPS6110263A (en) * | 1984-06-26 | 1986-01-17 | Nec Kansai Ltd | Hybrid ic |
JPS62261192A (en) * | 1986-05-08 | 1987-11-13 | ティーディーケイ株式会社 | Thin film electronic circuit device |
JPS6316455B2 (en) * | 1980-10-06 | 1988-04-08 | Hitachi Chemical Co Ltd |
-
1988
- 1988-11-07 JP JP27937888A patent/JPH02126696A/en active Pending
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6316455B2 (en) * | 1980-10-06 | 1988-04-08 | Hitachi Chemical Co Ltd | |
JPS57200564A (en) * | 1981-06-03 | 1982-12-08 | Fujikura Ltd | Manufacture of enameled substrate |
JPS59155152A (en) * | 1983-02-24 | 1984-09-04 | Seiko Epson Corp | Resin-sealed semiconductor device |
JPS59219951A (en) * | 1983-05-30 | 1984-12-11 | Sumitomo Electric Ind Ltd | Lead frame for plastic seal type semiconductor device |
JPS6110263A (en) * | 1984-06-26 | 1986-01-17 | Nec Kansai Ltd | Hybrid ic |
JPS62261192A (en) * | 1986-05-08 | 1987-11-13 | ティーディーケイ株式会社 | Thin film electronic circuit device |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011014639A (en) * | 2009-06-30 | 2011-01-20 | Yazaki Corp | Base material for metal core substrate and method for manufacturing metal core substrate using the same |
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