JPH0212377B2 - - Google Patents
Info
- Publication number
- JPH0212377B2 JPH0212377B2 JP8551785A JP8551785A JPH0212377B2 JP H0212377 B2 JPH0212377 B2 JP H0212377B2 JP 8551785 A JP8551785 A JP 8551785A JP 8551785 A JP8551785 A JP 8551785A JP H0212377 B2 JPH0212377 B2 JP H0212377B2
- Authority
- JP
- Japan
- Prior art keywords
- anode
- cathode
- electron beam
- rectangular
- hole
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 238000010894 electron beam technology Methods 0.000 claims description 27
- 238000000605 extraction Methods 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 8
- 239000000463 material Substances 0.000 description 2
- 230000001133 acceleration Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 239000003989 dielectric material Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 230000001678 irradiating effect Effects 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8551785A JPS61245453A (ja) | 1985-04-23 | 1985-04-23 | 線状電子ビ−ム熱処理装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8551785A JPS61245453A (ja) | 1985-04-23 | 1985-04-23 | 線状電子ビ−ム熱処理装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61245453A JPS61245453A (ja) | 1986-10-31 |
| JPH0212377B2 true JPH0212377B2 (sv) | 1990-03-20 |
Family
ID=13861101
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8551785A Granted JPS61245453A (ja) | 1985-04-23 | 1985-04-23 | 線状電子ビ−ム熱処理装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS61245453A (sv) |
-
1985
- 1985-04-23 JP JP8551785A patent/JPS61245453A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61245453A (ja) | 1986-10-31 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP1721329A2 (en) | Modulating ion beam current | |
| US3218431A (en) | Self-focusing electron beam apparatus | |
| JP2989986B2 (ja) | イオン注入と同時に電子シャワーを照射するイオン注入装置 | |
| JPH0526539B2 (sv) | ||
| JPH0212377B2 (sv) | ||
| JP2946433B2 (ja) | イオンビーム制御システム | |
| JP2644958B2 (ja) | イオン源装置およびそのイオン源装置を備えたイオン打ち込み装置 | |
| JP2713692B2 (ja) | イオン打込み装置 | |
| JPS6035446A (ja) | 電子流カーテン生成装置 | |
| JPS63274049A (ja) | 走査型電子顕微鏡 | |
| JPH0636735A (ja) | 多価イオン注入法による基板製造装置および基板製造方法 | |
| JPH0550267A (ja) | 電子ビーム加工装置 | |
| JPH0744023B2 (ja) | イオン注入装置 | |
| JP3105931B2 (ja) | 電子ビーム照射装置及び電子ビーム照射方法 | |
| JPH02112140A (ja) | 低速イオン銃 | |
| JPH027503B2 (sv) | ||
| JPS6314867A (ja) | イオン注入装置 | |
| JP3535402B2 (ja) | イオンビーム装置 | |
| JP2870858B2 (ja) | 線状電子ビーム照射方法とその装置 | |
| JPH088084B2 (ja) | イオンビ−ム蒸着装置 | |
| JPH03252037A (ja) | 荷電粒子ビーム装置 | |
| JPH01105448A (ja) | 荷電粒子線装置 | |
| JPS6264036A (ja) | 電子ビ−ム装置 | |
| JPH0666256B2 (ja) | 線状電子ビ−ムアニ−ル装置 | |
| JPH0234429B2 (sv) |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |