JPH0212017B2 - - Google Patents
Info
- Publication number
- JPH0212017B2 JPH0212017B2 JP56149520A JP14952081A JPH0212017B2 JP H0212017 B2 JPH0212017 B2 JP H0212017B2 JP 56149520 A JP56149520 A JP 56149520A JP 14952081 A JP14952081 A JP 14952081A JP H0212017 B2 JPH0212017 B2 JP H0212017B2
- Authority
- JP
- Japan
- Prior art keywords
- layer
- gold
- aluminum
- melting point
- high melting
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
Landscapes
- Junction Field-Effect Transistors (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56149520A JPS5852876A (ja) | 1981-09-24 | 1981-09-24 | 砒化ガリウム半導体装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56149520A JPS5852876A (ja) | 1981-09-24 | 1981-09-24 | 砒化ガリウム半導体装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5852876A JPS5852876A (ja) | 1983-03-29 |
| JPH0212017B2 true JPH0212017B2 (cs) | 1990-03-16 |
Family
ID=15476928
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56149520A Granted JPS5852876A (ja) | 1981-09-24 | 1981-09-24 | 砒化ガリウム半導体装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5852876A (cs) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59136974A (ja) * | 1983-01-26 | 1984-08-06 | Nec Corp | 半導体装置 |
| JPS6046075A (ja) * | 1983-08-24 | 1985-03-12 | Toshiba Corp | 電界効果トランジスタ |
| JPS60123067A (ja) * | 1983-12-08 | 1985-07-01 | Matsushita Electric Ind Co Ltd | 半導体装置およびその製造方法 |
| JPS61114581A (ja) * | 1984-11-09 | 1986-06-02 | Matsushita Electric Ind Co Ltd | GaAs半導体装置 |
| JPH11274468A (ja) * | 1998-03-25 | 1999-10-08 | Sony Corp | オーミック電極およびその形成方法ならびにオーミック電極形成用積層体 |
-
1981
- 1981-09-24 JP JP56149520A patent/JPS5852876A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5852876A (ja) | 1983-03-29 |
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