JPH0193727U - - Google Patents

Info

Publication number
JPH0193727U
JPH0193727U JP19085287U JP19085287U JPH0193727U JP H0193727 U JPH0193727 U JP H0193727U JP 19085287 U JP19085287 U JP 19085287U JP 19085287 U JP19085287 U JP 19085287U JP H0193727 U JPH0193727 U JP H0193727U
Authority
JP
Japan
Prior art keywords
reaction vessel
semiconductor wafer
processing apparatus
heating
wafer processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP19085287U
Other languages
English (en)
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP19085287U priority Critical patent/JPH0193727U/ja
Publication of JPH0193727U publication Critical patent/JPH0193727U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)
JP19085287U 1987-12-14 1987-12-14 Pending JPH0193727U (https=)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP19085287U JPH0193727U (https=) 1987-12-14 1987-12-14

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP19085287U JPH0193727U (https=) 1987-12-14 1987-12-14

Publications (1)

Publication Number Publication Date
JPH0193727U true JPH0193727U (https=) 1989-06-20

Family

ID=31481791

Family Applications (1)

Application Number Title Priority Date Filing Date
JP19085287U Pending JPH0193727U (https=) 1987-12-14 1987-12-14

Country Status (1)

Country Link
JP (1) JPH0193727U (https=)

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