JPH0160133B2 - - Google Patents

Info

Publication number
JPH0160133B2
JPH0160133B2 JP2003682A JP2003682A JPH0160133B2 JP H0160133 B2 JPH0160133 B2 JP H0160133B2 JP 2003682 A JP2003682 A JP 2003682A JP 2003682 A JP2003682 A JP 2003682A JP H0160133 B2 JPH0160133 B2 JP H0160133B2
Authority
JP
Japan
Prior art keywords
photosensitive
polyvinyl alcohol
pva
modified pva
group
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2003682A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58137834A (ja
Inventor
Tohei Morya
Junnosuke Yamauchi
Makoto Shiraishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kuraray Co Ltd
Original Assignee
Kuraray Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kuraray Co Ltd filed Critical Kuraray Co Ltd
Priority to JP2003682A priority Critical patent/JPS58137834A/ja
Publication of JPS58137834A publication Critical patent/JPS58137834A/ja
Publication of JPH0160133B2 publication Critical patent/JPH0160133B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/016Diazonium salts or compounds
    • G03F7/021Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
    • G03F7/0212Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
    • G03F7/0215Natural gums; Proteins, e.g. gelatins; Macromolecular carbohydrates, e.g. cellulose; Polyvinyl alcohol and derivatives thereof, e.g. polyvinylacetals

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP2003682A 1982-02-09 1982-02-09 感光性組成物 Granted JPS58137834A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003682A JPS58137834A (ja) 1982-02-09 1982-02-09 感光性組成物

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003682A JPS58137834A (ja) 1982-02-09 1982-02-09 感光性組成物

Publications (2)

Publication Number Publication Date
JPS58137834A JPS58137834A (ja) 1983-08-16
JPH0160133B2 true JPH0160133B2 (de) 1989-12-21

Family

ID=12015833

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003682A Granted JPS58137834A (ja) 1982-02-09 1982-02-09 感光性組成物

Country Status (1)

Country Link
JP (1) JPS58137834A (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3442756A1 (de) * 1984-11-23 1986-05-28 Hoechst Ag, 6230 Frankfurt Strahlungsempfindliches gemisch, daraus hergestelltes aufzeichnungsmaterial und verfahren zur herstellung von waermebestaendigen reliefaufzeichnungen
DE3504658A1 (de) * 1985-02-12 1986-08-14 Hoechst Ag, 6230 Frankfurt Lichtempfindliches gemisch und damit hergestelltes aufzeichnungsmaterial
JP2555741B2 (ja) * 1989-09-14 1996-11-20 凸版印刷株式会社 カラーフィルタの製造方法
JP2546403B2 (ja) * 1989-09-14 1996-10-23 凸版印刷株式会社 感光性樹脂組成物
JPH03257402A (ja) * 1990-03-07 1991-11-15 Toppan Printing Co Ltd カラーフィルタの製造方法
JPH0827540B2 (ja) * 1990-09-07 1996-03-21 東京応化工業株式会社 螢光体パターンを形成する方法
DE19644515A1 (de) * 1996-10-25 1998-06-25 Sun Chemical Corp Amidosubstituierte Acetalpolymere und Verwendung derselben in photoempfindlichen Zusammensetzungen und lithographischen Druckplatten
JP5593405B2 (ja) * 2012-02-28 2014-09-24 富士フイルム株式会社 感光性樹脂組成物、硬化膜の製造方法、硬化膜、有機el表示装置および液晶表示装置

Also Published As

Publication number Publication date
JPS58137834A (ja) 1983-08-16

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