JPH0159729B2 - - Google Patents
Info
- Publication number
- JPH0159729B2 JPH0159729B2 JP6085583A JP6085583A JPH0159729B2 JP H0159729 B2 JPH0159729 B2 JP H0159729B2 JP 6085583 A JP6085583 A JP 6085583A JP 6085583 A JP6085583 A JP 6085583A JP H0159729 B2 JPH0159729 B2 JP H0159729B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- loss tangent
- dielectric loss
- base material
- vinylidene fluoride
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Treatments Of Macromolecular Shaped Articles (AREA)
- Laminated Bodies (AREA)
- Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
- Organic Insulating Materials (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6085583A JPS59188109A (ja) | 1983-04-08 | 1983-04-08 | コンデンサ−用フイルムの製造方法 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP6085583A JPS59188109A (ja) | 1983-04-08 | 1983-04-08 | コンデンサ−用フイルムの製造方法 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS59188109A JPS59188109A (ja) | 1984-10-25 |
JPH0159729B2 true JPH0159729B2 (enrdf_load_stackoverflow) | 1989-12-19 |
Family
ID=13154409
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6085583A Granted JPS59188109A (ja) | 1983-04-08 | 1983-04-08 | コンデンサ−用フイルムの製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS59188109A (enrdf_load_stackoverflow) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7125588B2 (en) | 1990-09-25 | 2006-10-24 | Semiconductor Energy Laboratory Co., Ltd. | Pulsed plasma CVD method for forming a film |
-
1983
- 1983-04-08 JP JP6085583A patent/JPS59188109A/ja active Granted
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7125588B2 (en) | 1990-09-25 | 2006-10-24 | Semiconductor Energy Laboratory Co., Ltd. | Pulsed plasma CVD method for forming a film |
Also Published As
Publication number | Publication date |
---|---|
JPS59188109A (ja) | 1984-10-25 |
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