JPH0159571B2 - - Google Patents

Info

Publication number
JPH0159571B2
JPH0159571B2 JP14610783A JP14610783A JPH0159571B2 JP H0159571 B2 JPH0159571 B2 JP H0159571B2 JP 14610783 A JP14610783 A JP 14610783A JP 14610783 A JP14610783 A JP 14610783A JP H0159571 B2 JPH0159571 B2 JP H0159571B2
Authority
JP
Japan
Prior art keywords
general formula
formula
polymer
resistant material
heat
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP14610783A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6037550A (ja
Inventor
Shigeru Kubota
Norimoto Moriwaki
Torahiko Ando
Shohei Eto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP14610783A priority Critical patent/JPS6037550A/ja
Publication of JPS6037550A publication Critical patent/JPS6037550A/ja
Publication of JPH0159571B2 publication Critical patent/JPH0159571B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
  • Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
  • Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
JP14610783A 1983-08-09 1983-08-09 ポジ型感光性耐熱材料 Granted JPS6037550A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP14610783A JPS6037550A (ja) 1983-08-09 1983-08-09 ポジ型感光性耐熱材料

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP14610783A JPS6037550A (ja) 1983-08-09 1983-08-09 ポジ型感光性耐熱材料

Publications (2)

Publication Number Publication Date
JPS6037550A JPS6037550A (ja) 1985-02-26
JPH0159571B2 true JPH0159571B2 (enrdf_load_html_response) 1989-12-18

Family

ID=15400303

Family Applications (1)

Application Number Title Priority Date Filing Date
JP14610783A Granted JPS6037550A (ja) 1983-08-09 1983-08-09 ポジ型感光性耐熱材料

Country Status (1)

Country Link
JP (1) JPS6037550A (enrdf_load_html_response)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6836305B1 (en) 1998-07-15 2004-12-28 Hitachi, Ltd. Reflection-type, liquid crystal display device and process for producing the same
EP4421610A1 (en) 2023-02-21 2024-08-28 FUJIFILM Business Innovation Corp. Printing system, printing method, method for manufacturing printed matter, and control device

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63191831A (ja) * 1986-09-04 1988-08-09 Kanegafuchi Chem Ind Co Ltd 感光性両性高分子化合物およびその製造法
EP0452986A3 (en) * 1986-09-04 1991-12-18 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Photosensitive amphiphilic high molecular weight polymers and process for their production
JPH01232037A (ja) * 1988-03-11 1989-09-18 Kanegafuchi Chem Ind Co Ltd 感光性両性高分子化合物の薄膜を含む複合物品
JP3509612B2 (ja) 1998-05-29 2004-03-22 日立化成デュポンマイクロシステムズ株式会社 感光性重合体組成物、レリーフパターンの製造法及び電子部品
KR100422971B1 (ko) 1999-12-29 2004-03-12 삼성전자주식회사 나프톨 구조를 가진 이온형 광산발생제 및 이를 이용한감광성 폴리이미드 조성물
JP3773845B2 (ja) 2000-12-29 2006-05-10 三星電子株式会社 ポジティブ型感光性ポリイミド前駆体およびこれを含む組成物
KR100532590B1 (ko) 2002-11-07 2005-12-01 삼성전자주식회사 감광성 폴리이미드 전구체용 가용성 폴리이미드 및, 이를포함하는 감광성 폴리이드 전구체 조성물
CN102854745B (zh) 2004-01-14 2015-05-27 日立化成杜邦微系统股份有限公司 感光性树脂组合物、图案制造方法及电子部件
JP2008103660A (ja) * 2006-09-19 2008-05-01 Hitachi Chemical Dupont Microsystems Ltd 樹脂膜形成方法、レリーフパターンの製造方法及び電子部品
WO2009110764A2 (en) 2008-03-07 2009-09-11 Lg Chem, Ltd. Positive photosensitive polyimide composition

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6836305B1 (en) 1998-07-15 2004-12-28 Hitachi, Ltd. Reflection-type, liquid crystal display device and process for producing the same
EP4421610A1 (en) 2023-02-21 2024-08-28 FUJIFILM Business Innovation Corp. Printing system, printing method, method for manufacturing printed matter, and control device

Also Published As

Publication number Publication date
JPS6037550A (ja) 1985-02-26

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