JPH0155201B2 - - Google Patents

Info

Publication number
JPH0155201B2
JPH0155201B2 JP59109108A JP10910884A JPH0155201B2 JP H0155201 B2 JPH0155201 B2 JP H0155201B2 JP 59109108 A JP59109108 A JP 59109108A JP 10910884 A JP10910884 A JP 10910884A JP H0155201 B2 JPH0155201 B2 JP H0155201B2
Authority
JP
Japan
Prior art keywords
ultrafine
gas
metal powder
flame
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59109108A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60255602A (ja
Inventor
Kazuhide Oota
San Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toyota Motor Corp
Original Assignee
Toyota Motor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toyota Motor Corp filed Critical Toyota Motor Corp
Priority to JP59109108A priority Critical patent/JPS60255602A/ja
Priority to EP85101305A priority patent/EP0151490B1/en
Priority to DE8585101305T priority patent/DE3581293D1/de
Priority to US06/699,909 priority patent/US4705762A/en
Publication of JPS60255602A publication Critical patent/JPS60255602A/ja
Publication of JPH0155201B2 publication Critical patent/JPH0155201B2/ja
Granted legal-status Critical Current

Links

Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J3/00—Processes of utilising sub-atmospheric or super-atmospheric pressure to effect chemical or physical change of matter; Apparatus therefor
    • B01J3/06—Processes using ultra-high pressure, e.g. for the formation of diamonds; Apparatus therefor, e.g. moulds or dies
    • B01J3/08—Application of shock waves for chemical reactions or for modifying the crystal structure of substances
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
    • C01B33/181—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof by a dry process
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/0602—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with two or more other elements chosen from metals, silicon or boron
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/0612—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with alkaline-earth metals, beryllium or magnesium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/0615—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium
    • C01B21/0622—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with transition metals other than titanium, zirconium or hafnium with iron, cobalt or nickel
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/068—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with silicon
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/072—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with aluminium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B21/00—Nitrogen; Compounds thereof
    • C01B21/06—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron
    • C01B21/076—Binary compounds of nitrogen with metals, with silicon, or with boron, or with carbon, i.e. nitrides; Compounds of nitrogen with more than one metal, silicon or boron with titanium or zirconium or hafnium
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2002/00—Crystal-structural characteristics
    • C01P2002/02—Amorphous compounds
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/30—Particle morphology extending in three dimensions
    • C01P2004/32—Spheres
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/62—Submicrometer sized, i.e. from 0.1-1 micrometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2004/00—Particle morphology
    • C01P2004/60—Particles characterised by their size
    • C01P2004/64—Nanometer sized, i.e. from 1-100 nanometer
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/10—Solid density
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
    • C01P2006/00—Physical properties of inorganic compounds
    • C01P2006/80—Compositional purity

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Nanotechnology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Compounds Of Iron (AREA)
  • Oxygen, Ozone, And Oxides In General (AREA)
  • Inorganic Chemistry (AREA)
  • Silicon Compounds (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Compounds Of Alkaline-Earth Elements, Aluminum Or Rare-Earth Metals (AREA)
JP59109108A 1984-02-09 1984-05-29 酸化物超微粒子の製造方法 Granted JPS60255602A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP59109108A JPS60255602A (ja) 1984-05-29 1984-05-29 酸化物超微粒子の製造方法
EP85101305A EP0151490B1 (en) 1984-02-09 1985-02-07 Process for producing ultra-fine ceramic particles
DE8585101305T DE3581293D1 (de) 1984-02-09 1985-02-07 Verfahren zur herstellung von ultrafeinen keramikpartikeln.
US06/699,909 US4705762A (en) 1984-02-09 1985-02-08 Process for producing ultra-fine ceramic particles

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59109108A JPS60255602A (ja) 1984-05-29 1984-05-29 酸化物超微粒子の製造方法

Publications (2)

Publication Number Publication Date
JPS60255602A JPS60255602A (ja) 1985-12-17
JPH0155201B2 true JPH0155201B2 (enrdf_load_stackoverflow) 1989-11-22

Family

ID=14501769

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59109108A Granted JPS60255602A (ja) 1984-02-09 1984-05-29 酸化物超微粒子の製造方法

Country Status (1)

Country Link
JP (1) JPS60255602A (enrdf_load_stackoverflow)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016079061A (ja) * 2014-10-15 2016-05-16 株式会社アドマテックス 無機フィラー及びその製造方法、樹脂組成物、及び成形品
EP3037492A1 (en) 2014-12-25 2016-06-29 Shin-Etsu Chemical Co., Ltd. Liquid underfill material composition for sealing semiconductor and flip-chip semiconductor device

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61205604A (ja) * 1985-03-07 1986-09-11 Res Dev Corp Of Japan 酸化物超微粒子の製造方法及び装置
JPH0660003B2 (ja) * 1985-07-24 1994-08-10 日本電装株式会社 超微粒子の製造方法およびその装置
JPS6246905A (ja) * 1985-08-26 1987-02-28 Res Dev Corp Of Japan 酸化物超微粒子の製造方法及び装置
JP2600181B2 (ja) * 1987-07-15 1997-04-16 トヨタ自動車株式会社 酸化物粉末の製造方法
JPH0686557B2 (ja) * 1991-05-27 1994-11-02 信越化学工業株式会社 ポリプロピレンフィルム
JP4318872B2 (ja) * 2001-07-18 2009-08-26 電気化学工業株式会社 微細球状シリカ粉末の製造方法
JP4799835B2 (ja) * 2004-07-09 2011-10-26 東レ・ダウコーニング株式会社 室温硬化性オルガノポリシロキサン組成物、および電気・電子機器
EP2028158B1 (en) 2006-06-09 2017-01-18 Tokuyama Corporation Dry-process for the preparation of silica particles
JP2008120673A (ja) * 2006-10-19 2008-05-29 Showa Denko Kk 球状無機酸化物粉体とその製造方法およびその用途
KR101406571B1 (ko) * 2007-08-01 2014-06-11 덴키 가가쿠 고교 가부시기가이샤 실리카 분말, 그의 제조 방법 및 이를 이용한 조성물
US8290626B2 (en) * 2007-09-10 2012-10-16 SD Lizenzverwertungsgesellschadt mbH & Co KG Chemical process optimization method that considers chemical process plant safety
PT103838B (pt) * 2007-09-28 2008-11-03 Cuf Companhia Uniao Fabril Sgp Óxidos cerâmicos esféricos nanocristalinos, processo para a sua síntese e respectivas utilizações
JP5483539B2 (ja) * 2009-02-04 2014-05-07 日本碍子株式会社 接合方法
JP2013095637A (ja) 2011-11-01 2013-05-20 Shinano Denki Seiren Kk 球状α型炭化ケイ素、その製造方法、及び、該炭化ケイ素を原料としてなる焼結体又は有機樹脂複合体
JP2015074565A (ja) 2013-10-07 2015-04-20 信濃電気製錬株式会社 球状炭化ケイ素粉及びその製造方法
JP6201264B2 (ja) * 2014-07-18 2017-09-27 大陽日酸株式会社 無機質球状化粒子製造用バーナ、無機質球状化粒子製造装置、無機質球状化粒子の製造方法及び無機質球状化粒子
JP6595137B1 (ja) 2019-02-27 2019-10-23 株式会社アドマテックス 金属酸化物粒子材料の製造方法
WO2021049154A1 (ja) * 2019-09-11 2021-03-18 株式会社フジミインコーポレーテッド 研磨用組成物およびこれを用いた研磨方法
JP7712155B2 (ja) * 2021-09-02 2025-07-23 デンカ株式会社 無機酸化物粒子の製造方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2016079061A (ja) * 2014-10-15 2016-05-16 株式会社アドマテックス 無機フィラー及びその製造方法、樹脂組成物、及び成形品
EP3037492A1 (en) 2014-12-25 2016-06-29 Shin-Etsu Chemical Co., Ltd. Liquid underfill material composition for sealing semiconductor and flip-chip semiconductor device

Also Published As

Publication number Publication date
JPS60255602A (ja) 1985-12-17

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Legal Events

Date Code Title Description
EXPY Cancellation because of completion of term