JPH0153351B2 - - Google Patents

Info

Publication number
JPH0153351B2
JPH0153351B2 JP58179697A JP17969783A JPH0153351B2 JP H0153351 B2 JPH0153351 B2 JP H0153351B2 JP 58179697 A JP58179697 A JP 58179697A JP 17969783 A JP17969783 A JP 17969783A JP H0153351 B2 JPH0153351 B2 JP H0153351B2
Authority
JP
Japan
Prior art keywords
evaporation source
grid
evaporated
counter electrode
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58179697A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5989763A (ja
Inventor
Wasaburo Oota
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ricoh Co Ltd
Original Assignee
Ricoh Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ricoh Co Ltd filed Critical Ricoh Co Ltd
Priority to JP17969783A priority Critical patent/JPS5989763A/ja
Publication of JPS5989763A publication Critical patent/JPS5989763A/ja
Publication of JPH0153351B2 publication Critical patent/JPH0153351B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP17969783A 1983-09-28 1983-09-28 薄膜蒸着装置 Granted JPS5989763A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17969783A JPS5989763A (ja) 1983-09-28 1983-09-28 薄膜蒸着装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17969783A JPS5989763A (ja) 1983-09-28 1983-09-28 薄膜蒸着装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP24258883A Division JPS59157279A (ja) 1983-12-22 1983-12-22 薄膜蒸着装置

Publications (2)

Publication Number Publication Date
JPS5989763A JPS5989763A (ja) 1984-05-24
JPH0153351B2 true JPH0153351B2 (instruction) 1989-11-14

Family

ID=16070288

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17969783A Granted JPS5989763A (ja) 1983-09-28 1983-09-28 薄膜蒸着装置

Country Status (1)

Country Link
JP (1) JPS5989763A (instruction)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0765165B2 (ja) * 1986-06-18 1995-07-12 株式会社リコー 薄膜蒸着装置
JPS6386866A (ja) * 1986-09-29 1988-04-18 Ricoh Co Ltd 薄膜形成装置
DE3790317C2 (instruction) * 1986-06-18 1990-06-07 Ricoh Co., Ltd., Tokio/Tokyo, Jp
US4974544A (en) * 1986-10-07 1990-12-04 Ricoh Company, Co. Vapor deposition apparatus
US4876984A (en) * 1987-06-12 1989-10-31 Ricoh Company, Ltd. Apparatus for forming a thin film
US4960072A (en) * 1987-08-05 1990-10-02 Ricoh Company, Ltd. Apparatus for forming a thin film
JPH01100255A (ja) * 1987-10-13 1989-04-18 Ricoh Co Ltd 反射防止膜の成膜方法
JPH01167645A (ja) * 1987-12-23 1989-07-03 Ricoh Co Ltd ガスセンサの製造方法
JP2716715B2 (ja) * 1988-02-04 1998-02-18 株式会社リコー 薄膜形成装置
US5133849A (en) * 1988-12-12 1992-07-28 Ricoh Company, Ltd. Thin film forming apparatus
JPH04212048A (ja) * 1990-06-11 1992-08-03 Ricoh Co Ltd ガスセンサ
US5058527A (en) * 1990-07-24 1991-10-22 Ricoh Company, Ltd. Thin film forming apparatus

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS584920Y2 (ja) * 1978-08-23 1983-01-27 東光株式会社 酸化亜鉛薄膜の製造装置

Also Published As

Publication number Publication date
JPS5989763A (ja) 1984-05-24

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