JPH0150007B2 - - Google Patents

Info

Publication number
JPH0150007B2
JPH0150007B2 JP58242882A JP24288283A JPH0150007B2 JP H0150007 B2 JPH0150007 B2 JP H0150007B2 JP 58242882 A JP58242882 A JP 58242882A JP 24288283 A JP24288283 A JP 24288283A JP H0150007 B2 JPH0150007 B2 JP H0150007B2
Authority
JP
Japan
Prior art keywords
film
magnetic
gap
forming
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58242882A
Other languages
English (en)
Japanese (ja)
Other versions
JPS60133516A (ja
Inventor
Tetsuo Kobayashi
Yukihisa Tsukada
Shinji Narushige
Shinichi Hara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP58242882A priority Critical patent/JPS60133516A/ja
Publication of JPS60133516A publication Critical patent/JPS60133516A/ja
Priority to US07/001,440 priority patent/US4791719A/en
Publication of JPH0150007B2 publication Critical patent/JPH0150007B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127—Structure or manufacture of heads, e.g. inductive
    • G11B5/31—Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163—Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y10T29/49044—Plural magnetic deposition layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/49036—Fabricating head structure or component thereof including measuring or testing
    • Y10T29/49043—Depositing magnetic layer or coating
    • Y10T29/49046—Depositing magnetic layer or coating with etching or machining of magnetic material
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/4902—Electromagnet, transformer or inductor
    • Y10T29/49021—Magnetic recording reproducing transducer [e.g., tape head, core, etc.]
    • Y10T29/49032—Fabricating head structure or component thereof
    • Y10T29/4906—Providing winding
    • Y10T29/49062—Multilayered winding

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)
JP58242882A 1983-12-22 1983-12-22 薄膜磁気ヘツドの製造方法 Granted JPS60133516A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP58242882A JPS60133516A (ja) 1983-12-22 1983-12-22 薄膜磁気ヘツドの製造方法
US07/001,440 US4791719A (en) 1983-12-22 1987-01-08 Method of manufacturing a thin-film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58242882A JPS60133516A (ja) 1983-12-22 1983-12-22 薄膜磁気ヘツドの製造方法

Publications (2)

Publication Number Publication Date
JPS60133516A JPS60133516A (ja) 1985-07-16
JPH0150007B2 true JPH0150007B2 (OSRAM) 1989-10-26

Family

ID=17095630

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58242882A Granted JPS60133516A (ja) 1983-12-22 1983-12-22 薄膜磁気ヘツドの製造方法

Country Status (2)

Country Link
US (1) US4791719A (OSRAM)
JP (1) JPS60133516A (OSRAM)

Families Citing this family (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62173607A (ja) * 1986-01-27 1987-07-30 Hitachi Ltd 薄膜磁気ヘツド
JPH06101098B2 (ja) * 1987-06-02 1994-12-12 ティーディーケイ株式会社 薄膜磁気ヘッド及びその製造方法
FR2619457B1 (fr) * 1987-08-14 1989-11-17 Commissariat Energie Atomique Procede d'obtention d'un motif notamment en materiau ferromagnetique ayant des flancs de pente differente et tete magnetique comportant un tel motif
CA2009504A1 (en) * 1989-02-10 1990-08-10 Hideki Yoshikawa Magnetic head and process for producing same
US4878290A (en) * 1989-02-13 1989-11-07 International Business Machines Corporation Method for making thin film magnetic head
US5200056A (en) * 1990-02-15 1993-04-06 Seagate Technology Inc. Method for aligning pole tips in a thin film head
US4992901A (en) * 1990-02-15 1991-02-12 Seagate Technology, Inc. Self aligned magnetic poles using sacrificial mask
US5141623A (en) * 1990-02-15 1992-08-25 Seagate Technology, Inc. Method for aligning pole tips in a thin film head
US5116719A (en) * 1990-02-15 1992-05-26 Seagate Technology, Inc. Top pole profile for pole tip trimming
JPH0410208A (ja) * 1990-04-27 1992-01-14 Hitachi Ltd 薄膜磁気ヘッド及びその製造方法
US5059278A (en) * 1990-09-28 1991-10-22 Seagate Technology Selective chemical removal of coil seed-layer in thin film head magnetic transducer
US5472736A (en) * 1991-06-03 1995-12-05 Read-Rite Corporation Method of making a bi-level coil for a thin film magnetic transducer
US5256249A (en) * 1991-09-17 1993-10-26 Seagate Technology, Inc. Method of manufacturing a planarized magnetoresistive sensor
US5820770A (en) * 1992-07-21 1998-10-13 Seagate Technology, Inc. Thin film magnetic head including vias formed in alumina layer and process for making the same
US5326429A (en) * 1992-07-21 1994-07-05 Seagate Technology, Inc. Process for making studless thin film magnetic head
EP0635821A1 (en) * 1993-07-22 1995-01-25 International Business Machines Corporation A process for the fabrication of thin film magnetic heads
JPH0765322A (ja) 1993-08-27 1995-03-10 Sanyo Electric Co Ltd 浮動型薄膜ヘッド及びその製造方法
DE69418551T2 (de) * 1993-08-27 1999-09-16 Read-Rite Corp., Milpitas Magnetkopfzusammenbau mit Schreibpol-/Abschirmstruktur
US5452166A (en) * 1993-10-01 1995-09-19 Applied Magnetics Corporation Thin film magnetic recording head for minimizing undershoots and a method for manufacturing the same
US6195232B1 (en) 1995-08-24 2001-02-27 Torohead, Inc. Low-noise toroidal thin film head with solenoidal coil
US5703740A (en) * 1995-08-24 1997-12-30 Velocidata, Inc. Toroidal thin film head
US5874010A (en) * 1996-07-17 1999-02-23 Headway Technologies, Inc. Pole trimming technique for high data rate thin film heads
JP2953401B2 (ja) * 1996-10-04 1999-09-27 日本電気株式会社 磁気抵抗効果型複合ヘッドの製造方法
US5966800A (en) * 1997-07-28 1999-10-19 Read-Rite Corporation Method of making a magnetic head with aligned pole tips and pole layers formed of high magnetic moment material
US6074566A (en) * 1997-09-16 2000-06-13 International Business Machines Corporation Thin film inductive write head with minimal organic insulation material and method for its manufacture
JP3305244B2 (ja) * 1997-12-10 2002-07-22 アルプス電気株式会社 薄膜磁気ヘッドおよびその製造方法
US5867890A (en) * 1997-12-17 1999-02-09 International Business Machines Corporation Method for making a thin film merged magnetoresistive read/inductive write head having a pedestal pole tip
JP3576783B2 (ja) * 1997-12-26 2004-10-13 Ｔｄｋ株式会社 薄膜磁気ヘッドの製造方法
US6464891B1 (en) 1999-03-17 2002-10-15 Veeco Instruments, Inc. Method for repetitive ion beam processing with a carbon containing ion beam
US6417998B1 (en) 1999-03-23 2002-07-09 Read-Rite Corporation Ultra small advanced write transducer and method for making same
US6238582B1 (en) 1999-03-30 2001-05-29 Veeco Instruments, Inc. Reactive ion beam etching method and a thin film head fabricated using the method
US6317290B1 (en) 1999-08-31 2001-11-13 Read-Rite Corporation Advance pole trim writer with moment P1 and low apex angle
US6856228B2 (en) * 1999-11-23 2005-02-15 Intel Corporation Integrated inductor
US6815220B2 (en) * 1999-11-23 2004-11-09 Intel Corporation Magnetic layer processing
US6452247B1 (en) * 1999-11-23 2002-09-17 Intel Corporation Inductor for integrated circuit
US6891461B2 (en) 1999-11-23 2005-05-10 Intel Corporation Integrated transformer
US6870456B2 (en) * 1999-11-23 2005-03-22 Intel Corporation Integrated transformer
JP3539630B2 (ja) * 2000-03-22 2004-07-07 Ｔｄｋ株式会社 薄膜磁気ヘッドの製造方法
JP2002015405A (ja) * 2000-06-28 2002-01-18 Tdk Corp 薄膜磁気ヘッドおよびその製造方法
JP3943337B2 (ja) 2000-11-10 2007-07-11 Ｔｄｋ株式会社 薄膜磁気ヘッドの製造方法
US6850390B2 (en) 2000-11-10 2005-02-01 Tdk Corporation Thin-film magnetic head and method of manufacturing same
US7852185B2 (en) * 2003-05-05 2010-12-14 Intel Corporation On-die micro-transformer structures with magnetic materials
JP2004342210A (ja) 2003-05-15 2004-12-02 Tdk Corp 垂直磁気記録用磁気ヘッドおよびその製造方法、ヘッドジンバルアセンブリならびにハードディスク装置
JP4028476B2 (ja) 2003-11-28 2007-12-26 Ｔｄｋ株式会社 薄膜磁気ヘッドの製造方法
US7139153B2 (en) 2004-02-23 2006-11-21 Hitachi Global Storage Technologies Netherlands B.V. Magnetic pole tip for perpendicular magnetic recording
US7444739B2 (en) * 2005-03-30 2008-11-04 Hitachi Global Storage Technologies Netherlands, B.V. Method for fabricating improved sensor for a magnetic head utilizing reactive ion milling process
US8134548B2 (en) 2005-06-30 2012-03-13 Micron Technology, Inc. DC-DC converter switching transistor current measurement technique
TWM339193U (en) * 2008-01-31 2008-08-21 Hipro Electronics Taiwan Co Ltd Water-proof structure of electronic device

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2721201A1 (de) * 1977-05-11 1978-11-16 Siemens Ag Verfahren zur herstellung integrierter magnetkopfstrukturen
US4422117A (en) * 1980-04-11 1983-12-20 Matsushita Electric Industrial Co., Ltd. Thin film magnetic head and method of making it
US4317149A (en) * 1980-06-02 1982-02-23 International Business Machines Corporation Magnetic head having static discharge means
JPS5744217A (en) * 1980-08-28 1982-03-12 Nec Corp Production of thin film magnetic head
DE3102647A1 (de) * 1981-01-27 1982-08-19 Siemens AG, 1000 Berlin und 8000 München Strukturierung von metalloxidmasken, insbesondere durch reaktives ionenstrahlaetzen
US4436593A (en) * 1981-07-13 1984-03-13 Memorex Corporation Self-aligned pole tips
JPH061769B2 (ja) * 1983-08-10 1994-01-05 株式会社日立製作所 アルミナ膜のパターニング方法

Also Published As

Publication number Publication date
JPS60133516A (ja) 1985-07-16
US4791719A (en) 1988-12-20

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