JPH0146050B2 - - Google Patents

Info

Publication number
JPH0146050B2
JPH0146050B2 JP57500956A JP50095682A JPH0146050B2 JP H0146050 B2 JPH0146050 B2 JP H0146050B2 JP 57500956 A JP57500956 A JP 57500956A JP 50095682 A JP50095682 A JP 50095682A JP H0146050 B2 JPH0146050 B2 JP H0146050B2
Authority
JP
Japan
Prior art keywords
group
pigment
composition
acid
imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP57500956A
Other languages
English (en)
Japanese (ja)
Other versions
JPS58500221A (ja
Inventor
Jon Emu Nuunan
Reimondo Daburyu Ryan
Jeimusu Efu Hooru
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Eastman Kodak Co
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of JPS58500221A publication Critical patent/JPS58500221A/ja
Publication of JPH0146050B2 publication Critical patent/JPH0146050B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images

Landscapes

  • Engineering & Computer Science (AREA)
  • Architecture (AREA)
  • Structural Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Polyesters Or Polycarbonates (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
JP57500956A 1981-02-11 1982-02-10 画像形成組成物 Granted JPS58500221A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US233526 1981-02-11
US06/233,526 US4419437A (en) 1981-02-11 1981-02-11 Image-forming compositions and elements containing ionic polyester dispersing agents

Publications (2)

Publication Number Publication Date
JPS58500221A JPS58500221A (ja) 1983-02-10
JPH0146050B2 true JPH0146050B2 (en, 2012) 1989-10-05

Family

ID=22877609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57500956A Granted JPS58500221A (ja) 1981-02-11 1982-02-10 画像形成組成物

Country Status (8)

Country Link
US (1) US4419437A (en, 2012)
EP (1) EP0070898B1 (en, 2012)
JP (1) JPS58500221A (en, 2012)
AU (1) AU545584B2 (en, 2012)
BR (1) BR8206154A (en, 2012)
CA (1) CA1175703A (en, 2012)
DE (1) DE3266887D1 (en, 2012)
WO (1) WO1982002780A1 (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0354632U (en, 2012) * 1989-09-29 1991-05-27

Families Citing this family (31)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4626361A (en) * 1983-03-09 1986-12-02 Eastman Kodak Company Binder-mixtures for optical recording layers and elements
US4997808A (en) * 1988-12-27 1991-03-05 Eastman Kodak Company Superconductive ceramic oxide combination
US5061600A (en) * 1990-07-17 1991-10-29 Eastman Kodak Company Radiation-sensitive composition containing both a vinyl pyrrolidone polymer and an unsaturated polyester and use thereof in lithographic printing plates
US5053315A (en) * 1990-07-17 1991-10-01 Eastman Kodak Company Radiation-sensitive composition containing an unsaturated polyester and use thereof in lithographic printing plates
US5061601A (en) * 1990-07-17 1991-10-29 Eastman Kodak Company Radiation-sensitive composition containing a vinyl pyrrolidone polymer and use thereof in lithographic printing plates
US5043250A (en) * 1990-07-17 1991-08-27 Eastman Kodak Company Radiation-sensitive composition containing a poly (N-acyl-alkyleneimine) and use thereof in lithographic printing plates
US5045432A (en) * 1990-07-17 1991-09-03 Eastman Kodak Company Radiation-sensitive composition containing both a poly(N-acylalkyleneimine) and an unsaturated polyester and use thereof in lithographic printing plates
US5360706A (en) * 1993-11-23 1994-11-01 Eastman Kodak Company Imaging element
US5366855A (en) * 1994-03-31 1994-11-22 Eastman Kodak Company Photographic support comprising an antistatic layer and a protective overcoat
US5447832A (en) * 1994-03-31 1995-09-05 Eastman Kodak Company Imaging element
JPH08101498A (ja) * 1994-08-03 1996-04-16 Fuji Photo Film Co Ltd 感光性平版印刷版
US5536628A (en) * 1994-12-08 1996-07-16 Eastman Kodak Company Aqueous coating compositions containing dye-impregnated polymers
JPH08262699A (ja) * 1995-03-28 1996-10-11 Canon Inc レジスト組成物、レジスト処理方法及び装置
EP0738931B1 (en) * 1995-04-21 2000-10-25 Agfa-Gevaert N.V. A diazo based imaging element comprising metal-free phtalocyanine as pigment
US5733695A (en) * 1995-11-27 1998-03-31 Eastman Kodak Company Electrophotographic elements with generating layers containing polyester ionomers
US5576162A (en) 1996-01-18 1996-11-19 Eastman Kodak Company Imaging element having an electrically-conductive layer
JP3589365B2 (ja) * 1996-02-02 2004-11-17 富士写真フイルム株式会社 ポジ画像形成組成物
US6270945B1 (en) * 1997-03-19 2001-08-07 Kodak Polychrome Graphics, Llc Photosensitive compositions and elements comprising dyed photosensitive polyesters
US5824461A (en) * 1997-09-17 1998-10-20 Eastman Kodak Company Fluoropolyether containing aqueous coating compositions for an imaging element
US5824464A (en) * 1997-09-17 1998-10-20 Eastman Kodak Company Photographic element with improved drying characteristics
WO2000077575A1 (en) * 1999-06-10 2000-12-21 Alliedsignal Inc. Spin-on-glass anti-reflective coatings for photolithography
US6368400B1 (en) * 2000-07-17 2002-04-09 Honeywell International Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography
US6596456B2 (en) 2001-05-29 2003-07-22 Kodak Polychrome Graphics Llc Use of cinnamic acid groups containing acetal polymers for radiation-sensitive compositions and lithographic printing plates
EP1426415B1 (en) * 2002-12-04 2005-08-17 Eastman Kodak Company Process for forming cycrystals containing chlorine-free titanyl phthalocyanine and low concentration of titanyl fluorophthalocyanine using organic milling aid
EP1426417A1 (en) * 2002-12-04 2004-06-09 NexPress Solutions LLC Self-dispersing titanyl phthalocyanine pigment compositions and electrophotographic charge generation layers containing same
US8053159B2 (en) 2003-11-18 2011-11-08 Honeywell International Inc. Antireflective coatings for via fill and photolithography applications and methods of preparation thereof
US7550240B2 (en) * 2004-05-28 2009-06-23 Eastman Kodak Company Newtonian, ultrasonic-insensitive charge generating layer dispersion composition and a method for producing the composition
US8642246B2 (en) 2007-02-26 2014-02-04 Honeywell International Inc. Compositions, coatings and films for tri-layer patterning applications and methods of preparation thereof
US8557877B2 (en) 2009-06-10 2013-10-15 Honeywell International Inc. Anti-reflective coatings for optically transparent substrates
US8864898B2 (en) 2011-05-31 2014-10-21 Honeywell International Inc. Coating formulations for optical elements
US10544329B2 (en) 2015-04-13 2020-01-28 Honeywell International Inc. Polysiloxane formulations and coatings for optoelectronic applications

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3546180A (en) * 1968-06-25 1970-12-08 Eastman Kodak Co Polyesters containing disulfonamido compounds having improved dyeing properties
US3929489A (en) * 1973-09-14 1975-12-30 Eastman Kodak Co Lithographic plates having radiation sensitive elements developable with aqueous alcohol
US3920457A (en) * 1974-03-04 1975-11-18 Eastman Kodak Co Photographic leuco-dye compositions containing reductones as stabilizers
GB1470059A (en) 1974-09-12 1977-04-14 Kodak Ltd Photocrosslinkable coating compositions
US4139390A (en) * 1977-02-10 1979-02-13 Eastman Kodak Company Presensitized printing plate having a print-out image
US4243430A (en) * 1977-09-21 1981-01-06 Rohm And Haas Company Pigment dispersant for aqueous paints
US4141733A (en) * 1977-10-25 1979-02-27 Eastman Kodak Company Development of light-sensitive quinone diazide compositions

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0354632U (en, 2012) * 1989-09-29 1991-05-27

Also Published As

Publication number Publication date
AU545584B2 (en) 1985-07-18
US4419437A (en) 1983-12-06
BR8206154A (pt) 1983-01-11
DE3266887D1 (en) 1985-11-21
WO1982002780A1 (en) 1982-08-19
EP0070898A1 (en) 1983-02-09
AU8208482A (en) 1982-08-26
EP0070898B1 (en) 1985-10-16
JPS58500221A (ja) 1983-02-10
CA1175703A (en) 1984-10-09
EP0070898A4 (en) 1983-07-04

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