JPH0145973B2 - - Google Patents

Info

Publication number
JPH0145973B2
JPH0145973B2 JP58159652A JP15965283A JPH0145973B2 JP H0145973 B2 JPH0145973 B2 JP H0145973B2 JP 58159652 A JP58159652 A JP 58159652A JP 15965283 A JP15965283 A JP 15965283A JP H0145973 B2 JPH0145973 B2 JP H0145973B2
Authority
JP
Japan
Prior art keywords
light
signal
pattern
wafer
reflected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP58159652A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6052021A (ja
Inventor
Akyoshi Suzuki
Hideki Ine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP58159652A priority Critical patent/JPS6052021A/ja
Priority to US06/642,760 priority patent/US4641035A/en
Priority to DE19843431739 priority patent/DE3431739A1/de
Priority to GB08421876A priority patent/GB2147411B/en
Publication of JPS6052021A publication Critical patent/JPS6052021A/ja
Publication of JPH0145973B2 publication Critical patent/JPH0145973B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
    • H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
    • H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
    • H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP58159652A 1983-08-31 1983-08-31 位置検出方法 Granted JPS6052021A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP58159652A JPS6052021A (ja) 1983-08-31 1983-08-31 位置検出方法
US06/642,760 US4641035A (en) 1983-08-31 1984-08-21 Apparatus and a method for position detection of an object stepped portion
DE19843431739 DE3431739A1 (de) 1983-08-31 1984-08-29 Vorrichtung und verfahren zur positionserfassung
GB08421876A GB2147411B (en) 1983-08-31 1984-08-30 Position detection

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58159652A JPS6052021A (ja) 1983-08-31 1983-08-31 位置検出方法

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP59012488A Division JPS6052024A (ja) 1984-01-26 1984-01-26 位置検出装置

Publications (2)

Publication Number Publication Date
JPS6052021A JPS6052021A (ja) 1985-03-23
JPH0145973B2 true JPH0145973B2 (en, 2012) 1989-10-05

Family

ID=15698384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58159652A Granted JPS6052021A (ja) 1983-08-31 1983-08-31 位置検出方法

Country Status (4)

Country Link
US (1) US4641035A (en, 2012)
JP (1) JPS6052021A (en, 2012)
DE (1) DE3431739A1 (en, 2012)
GB (1) GB2147411B (en, 2012)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6139021A (ja) * 1984-07-31 1986-02-25 Canon Inc 光学装置
US4937459A (en) * 1984-11-16 1990-06-26 Canon Kabushiki Kaisha Alignment signal detecting device
JPS6220313A (ja) * 1985-07-19 1987-01-28 Hitachi Ltd パタ−ン検出方法及びその装置
US5231471A (en) * 1986-03-25 1993-07-27 Canon Kabushiki Kaisha Alignment and exposure apparatus
US5148214A (en) * 1986-05-09 1992-09-15 Canon Kabushiki Kaisha Alignment and exposure apparatus
JPS62262426A (ja) * 1986-05-09 1987-11-14 Canon Inc 露光装置
DE3735154C2 (de) * 1986-10-17 1994-10-20 Canon Kk Verfahren zum Erfassen der Lage einer auf einem Objekt vorgesehenen Marke
JP2514037B2 (ja) * 1987-07-02 1996-07-10 キヤノン株式会社 検知光学系
EP0329430B1 (en) * 1988-02-16 1992-07-01 Canon Kabushiki Kaisha Position detecting device
US5340992A (en) * 1988-02-16 1994-08-23 Canon Kabushiki Kaisha Apparatus and method of detecting positional relationship using a weighted coefficient
US5218415A (en) * 1988-05-31 1993-06-08 Canon Kabushiki Kaisha Device for optically detecting inclination of a surface
JPH07111340B2 (ja) * 1990-10-31 1995-11-29 信越半導体株式会社 パターンシフト測定方法
US5268775A (en) * 1991-02-19 1993-12-07 Hughes-Jvc Technology Corporation Contrast enhancement and ghost elimination, for reflective light valve system
JP3210123B2 (ja) * 1992-03-27 2001-09-17 キヤノン株式会社 結像方法及び該方法を用いたデバイス製造方法
JP3624048B2 (ja) * 1996-03-29 2005-02-23 キヤノン株式会社 照度測定方法
JP3643572B2 (ja) * 2002-05-31 2005-04-27 株式会社アドテックエンジニアリング 投影露光装置及び位置合わせ装置
DE102005061834B4 (de) 2005-12-23 2007-11-08 Ioss Intelligente Optische Sensoren & Systeme Gmbh Vorrichtung und Verfahren zum optischen Prüfen einer Oberfläche
JP2018207140A (ja) * 2017-05-30 2018-12-27 セイコーエプソン株式会社 スキャナーおよびスキャンデータの生産方法

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB1063479A (en) * 1963-10-21 1967-03-30 Owens Illinois Inc Improvements in and relating to the inspection of transparent or translucent containers
CH465269A (de) * 1967-06-15 1968-11-15 Emhart Zuerich Sa Einrichtung zur optischen Prüfung von gläsernen Gegenständen auf Risse
US3739247A (en) * 1971-05-17 1973-06-12 Canon Kk Positioning device using photoelectric scanning
US3796497A (en) * 1971-12-01 1974-03-12 Ibm Optical alignment method and apparatus
US3821545A (en) * 1972-05-26 1974-06-28 Hitachi Ltd Mask alignment in manufacturing semiconductor integrated circuits
CH552197A (de) * 1972-11-24 1974-07-31 Bbc Brown Boveri & Cie Einrichtung zum messen der rauhigkeit einer oberflaeche.
US3885877A (en) * 1973-10-11 1975-05-27 Ibm Electro-optical fine alignment process
US3880750A (en) * 1974-06-06 1975-04-29 Owens Illinois Inc Sealing surface gauge
NO135609C (en, 2012) * 1975-06-03 1977-05-11 Tore Planke
JPS5263755A (en) * 1975-11-22 1977-05-26 Nippon Chemical Ind Pattern line width measuring device
US4092068A (en) * 1976-05-05 1978-05-30 Domtar Inc. Surface sensor
JPS53111280A (en) * 1977-03-10 1978-09-28 Canon Inc Mask or wafer for production of semiconductor elements and device for aligning these
JPS53135654A (en) * 1977-05-01 1978-11-27 Canon Inc Photoelectric detecting device
US4200395A (en) * 1977-05-03 1980-04-29 Massachusetts Institute Of Technology Alignment of diffraction gratings
DE2727927C3 (de) * 1977-06-21 1980-01-24 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Vorrichtung zur getrennten Erfassung von Lichtstrahlen
FR2401415A1 (fr) * 1977-08-24 1979-03-23 Emballage Ste Gle Pour Inspection et controle d'objets transparents
JPS5453562A (en) * 1977-10-05 1979-04-26 Canon Inc Photoelectric detector
DE2808360C3 (de) * 1978-02-27 1981-09-24 Erwin Sick Gmbh Optik-Elektronik, 7808 Waldkirch Optische Vorrichtung zur Bestimmung des Lichtaustrittswinkels
JPS5534490A (en) * 1978-09-01 1980-03-11 Canon Inc Alignment device
JPS593681B2 (ja) * 1978-10-30 1984-01-25 富士通株式会社 パタ−ン検査方式
WO1980001002A1 (en) * 1978-10-30 1980-05-15 Fujitsu Ltd Pattern inspection system
JPS5617017A (en) * 1979-07-20 1981-02-18 Nippon Kogaku Kk <Nikon> Positioning device using bidirectional diffraction grating
JPS5624504A (en) * 1979-08-06 1981-03-09 Canon Inc Photoelectric detector
JPS5874038A (ja) * 1981-10-28 1983-05-04 Canon Inc マスクとウエハ−の位置合せ方法
JPS5972728A (ja) * 1982-10-20 1984-04-24 Canon Inc 自動整合装置

Also Published As

Publication number Publication date
US4641035A (en) 1987-02-03
JPS6052021A (ja) 1985-03-23
DE3431739A1 (de) 1985-03-07
GB2147411B (en) 1987-08-26
GB2147411A (en) 1985-05-09
DE3431739C2 (en, 2012) 1992-06-17
GB8421876D0 (en) 1984-10-03

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