JPH0144730B2 - - Google Patents

Info

Publication number
JPH0144730B2
JPH0144730B2 JP55086908A JP8690880A JPH0144730B2 JP H0144730 B2 JPH0144730 B2 JP H0144730B2 JP 55086908 A JP55086908 A JP 55086908A JP 8690880 A JP8690880 A JP 8690880A JP H0144730 B2 JPH0144730 B2 JP H0144730B2
Authority
JP
Japan
Prior art keywords
unsaturated
resin composition
photosensitive resin
reaction product
reaction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55086908A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5712021A (en
Inventor
Shigehiko Yoshioka
Itsuki Sugyama
Yoshinobu Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Kagaku Kogyo Co Ltd
Original Assignee
Seiko Kagaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Kagaku Kogyo Co Ltd filed Critical Seiko Kagaku Kogyo Co Ltd
Priority to JP8690880A priority Critical patent/JPS5712021A/ja
Publication of JPS5712021A publication Critical patent/JPS5712021A/ja
Publication of JPH0144730B2 publication Critical patent/JPH0144730B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polymerisation Methods In General (AREA)
JP8690880A 1980-06-26 1980-06-26 Photosensitive unsaturated polymer and photosensitive resin composition containing the same Granted JPS5712021A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8690880A JPS5712021A (en) 1980-06-26 1980-06-26 Photosensitive unsaturated polymer and photosensitive resin composition containing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8690880A JPS5712021A (en) 1980-06-26 1980-06-26 Photosensitive unsaturated polymer and photosensitive resin composition containing the same

Publications (2)

Publication Number Publication Date
JPS5712021A JPS5712021A (en) 1982-01-21
JPH0144730B2 true JPH0144730B2 (show.php) 1989-09-29

Family

ID=13899931

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8690880A Granted JPS5712021A (en) 1980-06-26 1980-06-26 Photosensitive unsaturated polymer and photosensitive resin composition containing the same

Country Status (1)

Country Link
JP (1) JPS5712021A (show.php)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60197719A (ja) * 1984-03-19 1985-10-07 Showa Highpolymer Co Ltd 硬化可能な樹脂の製造方法
JP2782862B2 (ja) * 1989-11-11 1998-08-06 トヨタ自動車株式会社 内燃機関の蒸発燃料処理装置
CN1152903C (zh) * 1995-11-03 2004-06-09 Dsm有限公司 无溶剂、可辐照固化的光学玻璃纤维涂料组合物及其制法
JP5497303B2 (ja) * 2009-02-05 2014-05-21 共栄社化学株式会社 カール抑制コーティング剤

Also Published As

Publication number Publication date
JPS5712021A (en) 1982-01-21

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