JPS5712021A - Photosensitive unsaturated polymer and photosensitive resin composition containing the same - Google Patents

Photosensitive unsaturated polymer and photosensitive resin composition containing the same

Info

Publication number
JPS5712021A
JPS5712021A JP8690880A JP8690880A JPS5712021A JP S5712021 A JPS5712021 A JP S5712021A JP 8690880 A JP8690880 A JP 8690880A JP 8690880 A JP8690880 A JP 8690880A JP S5712021 A JPS5712021 A JP S5712021A
Authority
JP
Japan
Prior art keywords
polymer
unsaturated
unsaturated polymer
photosensitive
oligomer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP8690880A
Other languages
Japanese (ja)
Other versions
JPH0144730B2 (en
Inventor
Shigehiko Yoshioka
Iwao Sugiyama
Yoshinobu Nagai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Kagaku Kogyo Co Ltd
Original Assignee
Seiko Kagaku Kogyo Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Kagaku Kogyo Co Ltd filed Critical Seiko Kagaku Kogyo Co Ltd
Priority to JP8690880A priority Critical patent/JPS5712021A/en
Publication of JPS5712021A publication Critical patent/JPS5712021A/en
Publication of JPH0144730B2 publication Critical patent/JPH0144730B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Polyurethanes Or Polyureas (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

PURPOSE: To provide a photosensitive unsaturated polymer which has excellent guick-curing characteristics and adhesion of cured film to a substrate, by reacting the hydroxyl group of a liquid vinyl polymer with the terminal isocyanate group of an unsaturated urethane oligomer.
CONSTITUTION: In an unsaturated polymer composed of a reaction product between a liquid vinyl polymer (A) having hydroxyl groups and an MW of 2,000W10,000 and an unsaturated urethane oligomer (B) having isocyanate groups at its terminal, said unsaturated polymer is obtd. by using a reaction product between a polyol compd. having hydroxyl groups and a polyisocyanate as said oligomer B having isocyanate groups at its terminal. Since the MW of this unsaturated polymer is increased, the curing rate of the polymer is faster than that of the oligomer B. Further since excellent adhesiveness to a substrate, which the liquid polymer A possesses, is entirely retained, said unsaturated polymer has well-balanced properties between quick-curing characteristics and adhesiveness.
COPYRIGHT: (C)1982,JPO&Japio
JP8690880A 1980-06-26 1980-06-26 Photosensitive unsaturated polymer and photosensitive resin composition containing the same Granted JPS5712021A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP8690880A JPS5712021A (en) 1980-06-26 1980-06-26 Photosensitive unsaturated polymer and photosensitive resin composition containing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP8690880A JPS5712021A (en) 1980-06-26 1980-06-26 Photosensitive unsaturated polymer and photosensitive resin composition containing the same

Publications (2)

Publication Number Publication Date
JPS5712021A true JPS5712021A (en) 1982-01-21
JPH0144730B2 JPH0144730B2 (en) 1989-09-29

Family

ID=13899931

Family Applications (1)

Application Number Title Priority Date Filing Date
JP8690880A Granted JPS5712021A (en) 1980-06-26 1980-06-26 Photosensitive unsaturated polymer and photosensitive resin composition containing the same

Country Status (1)

Country Link
JP (1) JPS5712021A (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60197719A (en) * 1984-03-19 1985-10-07 Showa Highpolymer Co Ltd Production of curable resin
US5111796A (en) * 1989-11-11 1992-05-12 Toyota Jidosha Kabushiki Kaisha Evaporative fuel control system
US5847021A (en) * 1995-11-03 1998-12-08 Dsm N.V. Solvent-free, radiation-curable, optical glass fiber coating composition and solvent-free method for making a solvent-free, radiation-curable, optical glass fiber coating composition
JP2010180319A (en) * 2009-02-05 2010-08-19 Kyoeisha Chem Co Ltd Urethane (meth)acrylate and coating agent containing the same

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60197719A (en) * 1984-03-19 1985-10-07 Showa Highpolymer Co Ltd Production of curable resin
JPH0368049B2 (en) * 1984-03-19 1991-10-25 Showa Highpolymer
US5111796A (en) * 1989-11-11 1992-05-12 Toyota Jidosha Kabushiki Kaisha Evaporative fuel control system
US5847021A (en) * 1995-11-03 1998-12-08 Dsm N.V. Solvent-free, radiation-curable, optical glass fiber coating composition and solvent-free method for making a solvent-free, radiation-curable, optical glass fiber coating composition
US6107361A (en) * 1995-11-03 2000-08-22 Dsm N.V. Solvent-free, radiation-curable, optical glass fiber coating composition and solvent-free method for making a solvent-free, radiation-curable, optical glass fiber coating composition
JP2010180319A (en) * 2009-02-05 2010-08-19 Kyoeisha Chem Co Ltd Urethane (meth)acrylate and coating agent containing the same

Also Published As

Publication number Publication date
JPH0144730B2 (en) 1989-09-29

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