JPH0143023B2 - - Google Patents
Info
- Publication number
- JPH0143023B2 JPH0143023B2 JP62180388A JP18038887A JPH0143023B2 JP H0143023 B2 JPH0143023 B2 JP H0143023B2 JP 62180388 A JP62180388 A JP 62180388A JP 18038887 A JP18038887 A JP 18038887A JP H0143023 B2 JPH0143023 B2 JP H0143023B2
- Authority
- JP
- Japan
- Prior art keywords
- processed
- vacuum
- pressure
- sample stage
- cooling gas
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000112 cooling gas Substances 0.000 claims description 17
- 238000001816 cooling Methods 0.000 description 6
- 239000007789 gas Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 238000012806 monitoring device Methods 0.000 description 3
- 238000003825 pressing Methods 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- 230000002159 abnormal effect Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 239000000498 cooling water Substances 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 238000005468 ion implantation Methods 0.000 description 1
- 230000000149 penetrating effect Effects 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Drying Of Semiconductors (AREA)
- Physical Vapour Deposition (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62180388A JPS6424427A (en) | 1987-07-20 | 1987-07-20 | Vacuum treatment equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62180388A JPS6424427A (en) | 1987-07-20 | 1987-07-20 | Vacuum treatment equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6424427A JPS6424427A (en) | 1989-01-26 |
| JPH0143023B2 true JPH0143023B2 (enExample) | 1989-09-18 |
Family
ID=16082360
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62180388A Granted JPS6424427A (en) | 1987-07-20 | 1987-07-20 | Vacuum treatment equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6424427A (enExample) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH03102820A (ja) * | 1989-09-18 | 1991-04-30 | Tokuda Seisakusho Ltd | 真空処理装置 |
-
1987
- 1987-07-20 JP JP62180388A patent/JPS6424427A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6424427A (en) | 1989-01-26 |
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