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Tokuda Seisakusho Co Ltd
Original Assignee
Tokuda Seisakusho Co Ltd
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Publication date
Application filed by Tokuda Seisakusho Co LtdfiledCriticalTokuda Seisakusho Co Ltd
Priority to JP62180388ApriorityCriticalpatent/JPS6424427A/ja
Publication of JPS6424427ApublicationCriticalpatent/JPS6424427A/ja
Publication of JPH0143023B2publicationCriticalpatent/JPH0143023B2/ja
Plasma apparatus including dielectric window for inducing a uniform electric field in a plasma chamber and method of treating an article with a plasma apparatus in which a uniform electric field is induced by a dielectric window
Improved method and apparatus for monitoring and/or controlling gaseous processes including processes where thermal transpiration effects are present and improved gauging for use therewith