JPH0137857B2 - - Google Patents
Info
- Publication number
- JPH0137857B2 JPH0137857B2 JP56204550A JP20455081A JPH0137857B2 JP H0137857 B2 JPH0137857 B2 JP H0137857B2 JP 56204550 A JP56204550 A JP 56204550A JP 20455081 A JP20455081 A JP 20455081A JP H0137857 B2 JPH0137857 B2 JP H0137857B2
- Authority
- JP
- Japan
- Prior art keywords
- semiconductor layer
- field effect
- effect transistor
- barrier field
- shot
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D30/00—Field-effect transistors [FET]
- H10D30/80—FETs having rectifying junction gate electrodes
- H10D30/87—FETs having Schottky gate electrodes, e.g. metal-semiconductor FETs [MESFET]
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D62/00—Semiconductor bodies, or regions thereof, of devices having potential barriers
- H10D62/10—Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
- H10D62/17—Semiconductor regions connected to electrodes not carrying current to be rectified, amplified or switched, e.g. channel regions
- H10D62/213—Channel regions of field-effect devices
- H10D62/221—Channel regions of field-effect devices of FETs
Landscapes
- Junction Field-Effect Transistors (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| GB8040795A GB2090053B (en) | 1980-12-19 | 1980-12-19 | Mesfet |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57128980A JPS57128980A (en) | 1982-08-10 |
| JPH0137857B2 true JPH0137857B2 (OSRAM) | 1989-08-09 |
Family
ID=10518113
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56204550A Granted JPS57128980A (en) | 1980-12-19 | 1981-12-19 | Schottky barrier field effect transistor |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US4486766A (OSRAM) |
| JP (1) | JPS57128980A (OSRAM) |
| CA (1) | CA1171553A (OSRAM) |
| DE (1) | DE3149101A1 (OSRAM) |
| FR (1) | FR2496990A1 (OSRAM) |
| GB (1) | GB2090053B (OSRAM) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02122027U (OSRAM) * | 1989-03-17 | 1990-10-04 |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4783688A (en) * | 1981-12-02 | 1988-11-08 | U.S. Philips Corporation | Schottky barrier field effect transistors |
| JPH0669101B2 (ja) * | 1983-08-25 | 1994-08-31 | 松下電子工業株式会社 | 半導体装置の製造方法 |
| DE3581159D1 (de) * | 1984-10-08 | 1991-02-07 | Fujitsu Ltd | Halbleiteranordnung mit integrierter schaltung. |
| JP2604349B2 (ja) * | 1984-12-12 | 1997-04-30 | 日本電気株式会社 | 半導体装置 |
| GB2172744B (en) * | 1985-03-23 | 1989-07-19 | Stc Plc | Semiconductor devices |
| WO1989001235A1 (en) * | 1987-08-03 | 1989-02-09 | Ford Microelectronics, Inc. | High effective barrier height transistor and method of making same |
| JPH01132170A (ja) * | 1987-11-18 | 1989-05-24 | Toshiba Corp | 電界効果トランジスタ |
| JPH01187837A (ja) * | 1988-01-22 | 1989-07-27 | Agency Of Ind Science & Technol | 半導体集積回路 |
| BR9406727A (pt) * | 1993-05-28 | 1996-01-30 | Axiom Bildverarbeit Syst | Aparelho de inspeção automática para classificar artigo de acordo com caracteristica superficial de artigo aparelho de seleção automática aparelho de inspeção automática para categorizar peça de trabalho com base em seu padrão superficial e/ou de core/ou de textura processo para inspecionar artigo automaticamente para classificar o artigo de acordo com uma caracteristica superficical do mesmo |
| JP3102783B2 (ja) * | 1998-02-11 | 2000-10-23 | 三星電子株式会社 | 外部電界を利用して電子放出を活性化させた冷陰極電子放出素子 |
| JP2005150190A (ja) * | 2003-11-12 | 2005-06-09 | Mitsubishi Electric Corp | 電界効果トランジスタ |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US28500A (en) * | 1860-05-29 | Feathebs | ||
| USRE28500E (en) | 1970-12-14 | 1975-07-29 | Low noise field effect transistor with channel having subsurface portion of high conductivity | |
| GB1459231A (en) * | 1973-06-26 | 1976-12-22 | Mullard Ltd | Semiconductor devices |
| GB1507091A (en) * | 1974-03-29 | 1978-04-12 | Siemens Ag | Schottky-gate field-effect transistors |
| US3964084A (en) * | 1974-06-12 | 1976-06-15 | Bell Telephone Laboratories, Incorporated | Schottky barrier diode contacts |
| US4156879A (en) * | 1977-02-07 | 1979-05-29 | Hughes Aircraft Company | Passivated V-gate GaAs field-effect transistor |
| JPS53105984A (en) * | 1977-02-28 | 1978-09-14 | Nec Corp | Semiconductor device |
| JPS5457969A (en) * | 1977-10-18 | 1979-05-10 | Sony Corp | Electric field effect transistor |
| CA1131801A (en) * | 1978-01-18 | 1982-09-14 | Johannes A. Appels | Semiconductor device |
| US4193079A (en) * | 1978-01-30 | 1980-03-11 | Xerox Corporation | MESFET with non-uniform doping |
| JPS55153378A (en) * | 1979-05-18 | 1980-11-29 | Matsushita Electronics Corp | Field effect transistor |
| NL187415C (nl) * | 1980-09-08 | 1991-09-16 | Philips Nv | Halfgeleiderinrichting met gereduceerde oppervlakteveldsterkte. |
-
1980
- 1980-12-19 GB GB8040795A patent/GB2090053B/en not_active Expired
-
1981
- 1981-12-02 US US06/326,467 patent/US4486766A/en not_active Expired - Fee Related
- 1981-12-11 DE DE19813149101 patent/DE3149101A1/de active Granted
- 1981-12-17 CA CA000392537A patent/CA1171553A/en not_active Expired
- 1981-12-18 FR FR8123711A patent/FR2496990A1/fr active Granted
- 1981-12-19 JP JP56204550A patent/JPS57128980A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02122027U (OSRAM) * | 1989-03-17 | 1990-10-04 |
Also Published As
| Publication number | Publication date |
|---|---|
| US4486766A (en) | 1984-12-04 |
| DE3149101C2 (OSRAM) | 1992-12-17 |
| FR2496990A1 (fr) | 1982-06-25 |
| JPS57128980A (en) | 1982-08-10 |
| CA1171553A (en) | 1984-07-24 |
| DE3149101A1 (de) | 1982-07-29 |
| GB2090053B (en) | 1984-09-19 |
| GB2090053A (en) | 1982-06-30 |
| FR2496990B1 (OSRAM) | 1984-02-10 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| US6963090B2 (en) | Enhancement mode metal-oxide-semiconductor field effect transistor | |
| JPH0435904B2 (OSRAM) | ||
| US4783688A (en) | Schottky barrier field effect transistors | |
| EP0198336B1 (en) | Hybrid extended drain concept for reduced hot electron effect | |
| JPH0137857B2 (OSRAM) | ||
| KR920003799B1 (ko) | 반도체 장치 | |
| JPH0259624B2 (OSRAM) | ||
| JPH0324782B2 (OSRAM) | ||
| US5101245A (en) | Field effect transistor and method for making same | |
| USRE32613E (en) | Method of making contact electrodes to silicon gate, and source and drain regions, of a semiconductor device | |
| US4764796A (en) | Heterojunction field effect transistor with two-dimensional electron layer | |
| JP3221901B2 (ja) | 半導体装置 | |
| JP2550013B2 (ja) | 電界効果トランジスタ | |
| GB2074374A (en) | Method of making field effect transistors | |
| US5242846A (en) | Method of manufacturing a junction field effect transistor | |
| JP3034546B2 (ja) | 電界効果型トランジスタの製造方法 | |
| JPS6027173A (ja) | 電界効果トランジスタおよびその製造方法 | |
| CA1208808A (en) | Semiconductor device | |
| JPH0797638B2 (ja) | 電界効果トランジスタ | |
| JP2963120B2 (ja) | 半導体装置及びその製造方法 | |
| JP3018885B2 (ja) | 半導体装置の製造方法 | |
| JP2911075B2 (ja) | 電界効果トランジスタ | |
| WO1989001235A1 (en) | High effective barrier height transistor and method of making same | |
| JP3467288B2 (ja) | バイポーラ動作モードが最適化された垂直接合形電界効果トランジスタ及びその製造方法 | |
| JP2000021899A (ja) | 電界効果トランジスタおよびその製造方法 |