JPH0136554B2 - - Google Patents

Info

Publication number
JPH0136554B2
JPH0136554B2 JP59192575A JP19257584A JPH0136554B2 JP H0136554 B2 JPH0136554 B2 JP H0136554B2 JP 59192575 A JP59192575 A JP 59192575A JP 19257584 A JP19257584 A JP 19257584A JP H0136554 B2 JPH0136554 B2 JP H0136554B2
Authority
JP
Japan
Prior art keywords
width
channel
evaporation
deposition
amount
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP59192575A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6173875A (ja
Inventor
Yoshio Shimozato
Kenichi Yanagi
Mitsuo Kato
Tetsuyoshi Wada
Heizaburo Furukawa
Kanji Wake
Arihiko Morita
Norio Tsukiji
Takuya Aiko
Toshiharu Kitsutaka
Koji Nakanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Priority to JP59192575A priority Critical patent/JPS6173875A/ja
Priority to CA000490046A priority patent/CA1244641A/en
Priority to US06/774,290 priority patent/US4655168A/en
Priority to AU47346/85A priority patent/AU558389B2/en
Priority to EP85111698A priority patent/EP0176852B1/en
Priority to DE8585111698T priority patent/DE3564593D1/de
Priority to KR1019850006779A priority patent/KR890002745B1/ko
Publication of JPS6173875A publication Critical patent/JPS6173875A/ja
Publication of JPH0136554B2 publication Critical patent/JPH0136554B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Treatment Of Metals (AREA)
JP59192575A 1984-09-17 1984-09-17 流路幅調整板付き真空蒸着装置 Granted JPS6173875A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP59192575A JPS6173875A (ja) 1984-09-17 1984-09-17 流路幅調整板付き真空蒸着装置
CA000490046A CA1244641A (en) 1984-09-17 1985-09-05 Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow
US06/774,290 US4655168A (en) 1984-09-17 1985-09-10 Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow
AU47346/85A AU558389B2 (en) 1984-09-17 1985-09-11 Regulating width of vapor flow in cont vacuum deposition
EP85111698A EP0176852B1 (en) 1984-09-17 1985-09-16 Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow
DE8585111698T DE3564593D1 (en) 1984-09-17 1985-09-16 Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow
KR1019850006779A KR890002745B1 (ko) 1984-09-17 1985-09-17 증기류의 폭조정판을 구비한 진공증착장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59192575A JPS6173875A (ja) 1984-09-17 1984-09-17 流路幅調整板付き真空蒸着装置

Publications (2)

Publication Number Publication Date
JPS6173875A JPS6173875A (ja) 1986-04-16
JPH0136554B2 true JPH0136554B2 (en, 2012) 1989-08-01

Family

ID=16293560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59192575A Granted JPS6173875A (ja) 1984-09-17 1984-09-17 流路幅調整板付き真空蒸着装置

Country Status (7)

Country Link
US (1) US4655168A (en, 2012)
EP (1) EP0176852B1 (en, 2012)
JP (1) JPS6173875A (en, 2012)
KR (1) KR890002745B1 (en, 2012)
AU (1) AU558389B2 (en, 2012)
CA (1) CA1244641A (en, 2012)
DE (1) DE3564593D1 (en, 2012)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0621348B2 (ja) * 1986-07-22 1994-03-23 日新製鋼株式会社 合金化亜鉛メツキ鋼板とその製造法
JPH0635656B2 (ja) * 1986-10-03 1994-05-11 三菱重工業株式会社 真空蒸着装置
KR920003591B1 (ko) * 1988-04-11 1992-05-04 미쯔비시주우고오교오 가부시기가이샤 연속진공증착장치
JPH0762239B2 (ja) * 1990-09-28 1995-07-05 三菱重工業株式会社 真空蒸着装置
TW340876B (en) * 1996-03-27 1998-09-21 Nisshin Steel Co Ltd Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor
TWI264473B (en) * 2001-10-26 2006-10-21 Matsushita Electric Works Ltd Vacuum deposition device and vacuum deposition method
US7125587B2 (en) * 2002-05-20 2006-10-24 Varian Semiconductor Equipment Associates Inc. Ion beam for enhancing optical properties of materials
SE527393C2 (sv) * 2003-09-05 2006-02-21 Sandvik Intellectual Property Aluminiumbelagd bandprodukt av rostfritt stål för användning som offeranod
KR100795487B1 (ko) * 2006-09-27 2008-01-16 주식회사 실트론 층류유동제어장치 및 이를 구비한 화학기상증착반응기
EP2516694B1 (en) * 2009-12-24 2018-02-21 Posco Strip passing apparatus and apparatus for treating surface of strip with the same
KR102622868B1 (ko) * 2016-11-28 2024-01-08 엘지디스플레이 주식회사 열충격이 방지된 롤투롤 제조장치
CN107034437B (zh) * 2017-05-27 2024-01-30 郑州华晶新能源科技有限公司 一种宽度自适应铝金属蒸汽导流窗
DE102020200366A1 (de) 2019-04-23 2020-10-29 Sms Group Gmbh PVD Dickenregelung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3394678A (en) * 1966-12-23 1968-07-30 Air Reduction Apparatus for vacuum coating
US3627569A (en) * 1968-12-27 1971-12-14 Bell Telephone Labor Inc Deposition of thin films with controlled thickness and planar area profile
US3989862A (en) * 1970-10-13 1976-11-02 Jones & Laughlin Steel Corporation Method and apparatus for vapor-depositing coatings on substrates
US3735728A (en) * 1971-12-01 1973-05-29 Andvari Inc Apparatus for continuous vacuum deposition
GB1596385A (en) * 1976-12-29 1981-08-26 Matsushita Electric Ind Co Ltd Methods and apparatus for manufacturing magnetic recording media
JPS56163526A (en) * 1980-05-20 1981-12-16 Fuji Photo Film Co Ltd Production of magnetic recording medium
DE3224234A1 (de) * 1981-09-01 1983-03-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von metallfreien streifen bei der metallbedampfung eines isolierstoffbandes und vorrichtung zur durchfuehrung des verfahrens
JPS6021377A (ja) * 1983-07-15 1985-02-02 Nisshin Steel Co Ltd 付着量分布制御手段つき真空蒸着めつき装置

Also Published As

Publication number Publication date
AU4734685A (en) 1986-03-27
US4655168A (en) 1987-04-07
EP0176852B1 (en) 1988-08-24
KR890002745B1 (ko) 1989-07-26
CA1244641A (en) 1988-11-15
KR860002590A (ko) 1986-04-28
AU558389B2 (en) 1987-01-29
DE3564593D1 (en) 1988-09-29
JPS6173875A (ja) 1986-04-16
EP0176852A1 (en) 1986-04-09

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