DE3564593D1 - Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow - Google Patents

Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow

Info

Publication number
DE3564593D1
DE3564593D1 DE8585111698T DE3564593T DE3564593D1 DE 3564593 D1 DE3564593 D1 DE 3564593D1 DE 8585111698 T DE8585111698 T DE 8585111698T DE 3564593 T DE3564593 T DE 3564593T DE 3564593 D1 DE3564593 D1 DE 3564593D1
Authority
DE
Germany
Prior art keywords
vacuum deposition
deposition apparatus
control panels
vapor flow
continuous vacuum
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8585111698T
Other languages
English (en)
Inventor
Yoshio Hiroshima Tec Shimozato
Kenichi Yanagi
Mitsui Kato
Tetsuyoshi Wada
Heizaburo Hiroshimash Furukawa
Kanji Hiroshima Shipyard Wake
Arihiko C O Nisshin R D Morita
Norio C O Nisshin R D Tsukiji
Takuya C O Nisshin R D La Aiko
Toshiharu C O Nisshin Kittaka
Yasuji C O Nisshin R Nakanishi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Heavy Industries Ltd
Nippon Steel Nisshin Co Ltd
Original Assignee
Mitsubishi Heavy Industries Ltd
Nisshin Steel Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Heavy Industries Ltd, Nisshin Steel Co Ltd filed Critical Mitsubishi Heavy Industries Ltd
Application granted granted Critical
Publication of DE3564593D1 publication Critical patent/DE3564593D1/de
Expired legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/04—Coating on selected surface areas, e.g. using masks
    • C23C14/042—Coating on selected surface areas, e.g. using masks using masks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Chemical Treatment Of Metals (AREA)
DE8585111698T 1984-09-17 1985-09-16 Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow Expired DE3564593D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59192575A JPS6173875A (ja) 1984-09-17 1984-09-17 流路幅調整板付き真空蒸着装置

Publications (1)

Publication Number Publication Date
DE3564593D1 true DE3564593D1 (en) 1988-09-29

Family

ID=16293560

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8585111698T Expired DE3564593D1 (en) 1984-09-17 1985-09-16 Continuous vacuum deposition apparatus with control panels for regulating width of vapor flow

Country Status (7)

Country Link
US (1) US4655168A (de)
EP (1) EP0176852B1 (de)
JP (1) JPS6173875A (de)
KR (1) KR890002745B1 (de)
AU (1) AU558389B2 (de)
CA (1) CA1244641A (de)
DE (1) DE3564593D1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0621348B2 (ja) * 1986-07-22 1994-03-23 日新製鋼株式会社 合金化亜鉛メツキ鋼板とその製造法
JPH0635656B2 (ja) * 1986-10-03 1994-05-11 三菱重工業株式会社 真空蒸着装置
KR920003591B1 (ko) * 1988-04-11 1992-05-04 미쯔비시주우고오교오 가부시기가이샤 연속진공증착장치
JPH0762239B2 (ja) * 1990-09-28 1995-07-05 三菱重工業株式会社 真空蒸着装置
TW340876B (en) * 1996-03-27 1998-09-21 Nisshin Steel Co Ltd Method and apparatus for controlling the deposition amount of a plating metal as well as method and apparatus for measuring the amount of a metal vapor
TWI264473B (en) * 2001-10-26 2006-10-21 Matsushita Electric Works Ltd Vacuum deposition device and vacuum deposition method
US7125587B2 (en) * 2002-05-20 2006-10-24 Varian Semiconductor Equipment Associates Inc. Ion beam for enhancing optical properties of materials
SE527393C2 (sv) * 2003-09-05 2006-02-21 Sandvik Intellectual Property Aluminiumbelagd bandprodukt av rostfritt stål för användning som offeranod
KR100795487B1 (ko) * 2006-09-27 2008-01-16 주식회사 실트론 층류유동제어장치 및 이를 구비한 화학기상증착반응기
KR101180246B1 (ko) * 2009-12-24 2012-09-05 주식회사 포스코 연속강판 통판장치와 이를 포함하는 강판표면 처리장치 및, 강판 표면 처리방법
KR102622868B1 (ko) * 2016-11-28 2024-01-08 엘지디스플레이 주식회사 열충격이 방지된 롤투롤 제조장치
CN107034437B (zh) * 2017-05-27 2024-01-30 郑州华晶新能源科技有限公司 一种宽度自适应铝金属蒸汽导流窗
DE102020200366A1 (de) 2019-04-23 2020-10-29 Sms Group Gmbh PVD Dickenregelung

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3394678A (en) * 1966-12-23 1968-07-30 Air Reduction Apparatus for vacuum coating
US3627569A (en) * 1968-12-27 1971-12-14 Bell Telephone Labor Inc Deposition of thin films with controlled thickness and planar area profile
US3989862A (en) * 1970-10-13 1976-11-02 Jones & Laughlin Steel Corporation Method and apparatus for vapor-depositing coatings on substrates
US3735728A (en) * 1971-12-01 1973-05-29 Andvari Inc Apparatus for continuous vacuum deposition
GB1596385A (en) * 1976-12-29 1981-08-26 Matsushita Electric Ind Co Ltd Methods and apparatus for manufacturing magnetic recording media
JPS56163526A (en) * 1980-05-20 1981-12-16 Fuji Photo Film Co Ltd Production of magnetic recording medium
DE3224234A1 (de) * 1981-09-01 1983-03-10 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von metallfreien streifen bei der metallbedampfung eines isolierstoffbandes und vorrichtung zur durchfuehrung des verfahrens
JPS6021377A (ja) * 1983-07-15 1985-02-02 Nisshin Steel Co Ltd 付着量分布制御手段つき真空蒸着めつき装置

Also Published As

Publication number Publication date
CA1244641A (en) 1988-11-15
KR890002745B1 (ko) 1989-07-26
JPS6173875A (ja) 1986-04-16
US4655168A (en) 1987-04-07
AU4734685A (en) 1986-03-27
KR860002590A (ko) 1986-04-28
AU558389B2 (en) 1987-01-29
EP0176852B1 (de) 1988-08-24
JPH0136554B2 (de) 1989-08-01
EP0176852A1 (de) 1986-04-09

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee