JPH0132739Y2 - - Google Patents

Info

Publication number
JPH0132739Y2
JPH0132739Y2 JP1984004740U JP474084U JPH0132739Y2 JP H0132739 Y2 JPH0132739 Y2 JP H0132739Y2 JP 1984004740 U JP1984004740 U JP 1984004740U JP 474084 U JP474084 U JP 474084U JP H0132739 Y2 JPH0132739 Y2 JP H0132739Y2
Authority
JP
Japan
Prior art keywords
facet
wafer
eraser
pattern area
glass mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP1984004740U
Other languages
English (en)
Japanese (ja)
Other versions
JPS60118235U (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP474084U priority Critical patent/JPS60118235U/ja
Publication of JPS60118235U publication Critical patent/JPS60118235U/ja
Application granted granted Critical
Publication of JPH0132739Y2 publication Critical patent/JPH0132739Y2/ja
Granted legal-status Critical Current

Links

JP474084U 1984-01-17 1984-01-17 フアセツトイレ−サ Granted JPS60118235U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP474084U JPS60118235U (ja) 1984-01-17 1984-01-17 フアセツトイレ−サ

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP474084U JPS60118235U (ja) 1984-01-17 1984-01-17 フアセツトイレ−サ

Publications (2)

Publication Number Publication Date
JPS60118235U JPS60118235U (ja) 1985-08-09
JPH0132739Y2 true JPH0132739Y2 (enrdf_load_stackoverflow) 1989-10-05

Family

ID=30480600

Family Applications (1)

Application Number Title Priority Date Filing Date
JP474084U Granted JPS60118235U (ja) 1984-01-17 1984-01-17 フアセツトイレ−サ

Country Status (1)

Country Link
JP (1) JPS60118235U (enrdf_load_stackoverflow)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57100730A (en) * 1980-12-16 1982-06-23 Nec Corp Manufacture of semiconductor device

Also Published As

Publication number Publication date
JPS60118235U (ja) 1985-08-09

Similar Documents

Publication Publication Date Title
JPH0132739Y2 (enrdf_load_stackoverflow)
JPH07117744B2 (ja) ダイシングラインの形成方法
CN113024098B (zh) 金属掩膜版切割防护设备
JPS58139144A (ja) 目合せ露光装置
JPS61102738A (ja) レジスト膜パタ−ンの形成方法
JPH069487Y2 (ja) ウェハ周辺露光装置
JPS59141230A (ja) パタ−ン形成方法
JPH064576Y2 (ja) ウエハ周辺露光装置
JPS5931852B2 (ja) フォトレジスト露光用マスク
JP2548268B2 (ja) レジストパターンの形成方法
JPS58219738A (ja) 半導体装置の製造方法
JPH039327Y2 (enrdf_load_stackoverflow)
JPS6132423A (ja) 周辺部に段差を有する半導体基板およびその製法
JPS6179227A (ja) 感光性レジストを用いたパタ−ン形成方法
JPH0710487Y2 (ja) 半導体ウエハ製造装置
JPS62128121A (ja) 半導体装置の製造方法
JPS60234318A (ja) 写真処理方法
JP2590990B2 (ja) 露光方法
JPH0644550B2 (ja) 半導体装置の製造方法
JPH023044A (ja) 露光方法
JP2000100693A (ja) 半導体装置の製造方法及び半導体製造装置
JPH01134917A (ja) パターンの形成方法
JPH0328052B2 (enrdf_load_stackoverflow)
JPS6045250A (ja) ガラスマスク
KR19990012266A (ko) 포토 마스크의 리페어 방법