JPH0132652B2 - - Google Patents

Info

Publication number
JPH0132652B2
JPH0132652B2 JP56097729A JP9772981A JPH0132652B2 JP H0132652 B2 JPH0132652 B2 JP H0132652B2 JP 56097729 A JP56097729 A JP 56097729A JP 9772981 A JP9772981 A JP 9772981A JP H0132652 B2 JPH0132652 B2 JP H0132652B2
Authority
JP
Japan
Prior art keywords
gas
amorphous silicon
mixture
reaction
silicon film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56097729A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57211735A (en
Inventor
Seiichi Iwamatsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP56097729A priority Critical patent/JPS57211735A/ja
Publication of JPS57211735A publication Critical patent/JPS57211735A/ja
Publication of JPH0132652B2 publication Critical patent/JPH0132652B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H10P14/60—
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/48—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation
    • C23C16/482—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating by irradiation, e.g. photolysis, radiolysis, particle radiation using incoherent light, UV to IR, e.g. lamps

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Formation Of Insulating Films (AREA)
JP56097729A 1981-06-24 1981-06-24 Manufacture of amorphous silicon film Granted JPS57211735A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56097729A JPS57211735A (en) 1981-06-24 1981-06-24 Manufacture of amorphous silicon film

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56097729A JPS57211735A (en) 1981-06-24 1981-06-24 Manufacture of amorphous silicon film

Publications (2)

Publication Number Publication Date
JPS57211735A JPS57211735A (en) 1982-12-25
JPH0132652B2 true JPH0132652B2 (OSRAM) 1989-07-10

Family

ID=14199970

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56097729A Granted JPS57211735A (en) 1981-06-24 1981-06-24 Manufacture of amorphous silicon film

Country Status (1)

Country Link
JP (1) JPS57211735A (OSRAM)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59182520A (ja) * 1983-04-01 1984-10-17 Hitachi Ltd 光ｃｖｄ法

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
THE JOURNAL OF PHYSICAL CHEMISTRY *

Also Published As

Publication number Publication date
JPS57211735A (en) 1982-12-25

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