JPS647495B2 - - Google Patents
Info
- Publication number
- JPS647495B2 JPS647495B2 JP56097731A JP9773181A JPS647495B2 JP S647495 B2 JPS647495 B2 JP S647495B2 JP 56097731 A JP56097731 A JP 56097731A JP 9773181 A JP9773181 A JP 9773181A JP S647495 B2 JPS647495 B2 JP S647495B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- silicon nitride
- gas mixture
- nitride film
- reaction
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H10P14/69433—
Landscapes
- Formation Of Insulating Films (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56097731A JPS57211736A (en) | 1981-06-24 | 1981-06-24 | Manufacture of silicon nitride film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP56097731A JPS57211736A (en) | 1981-06-24 | 1981-06-24 | Manufacture of silicon nitride film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57211736A JPS57211736A (en) | 1982-12-25 |
| JPS647495B2 true JPS647495B2 (OSRAM) | 1989-02-09 |
Family
ID=14200031
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP56097731A Granted JPS57211736A (en) | 1981-06-24 | 1981-06-24 | Manufacture of silicon nitride film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57211736A (OSRAM) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59215732A (ja) * | 1983-05-24 | 1984-12-05 | Semiconductor Energy Lab Co Ltd | 窒化珪素被膜作製方法 |
-
1981
- 1981-06-24 JP JP56097731A patent/JPS57211736A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57211736A (en) | 1982-12-25 |
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