JPH0132493B2 - - Google Patents

Info

Publication number
JPH0132493B2
JPH0132493B2 JP55161374A JP16137480A JPH0132493B2 JP H0132493 B2 JPH0132493 B2 JP H0132493B2 JP 55161374 A JP55161374 A JP 55161374A JP 16137480 A JP16137480 A JP 16137480A JP H0132493 B2 JPH0132493 B2 JP H0132493B2
Authority
JP
Japan
Prior art keywords
acrylate
meth
parts
pattern
film
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP55161374A
Other languages
English (en)
Japanese (ja)
Other versions
JPS5785050A (en
Inventor
Kunio Nishihara
Hiroshi Ozawa
Takefumi Shibuya
Shigeo Makino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsui Toatsu Chemicals Inc
Original Assignee
Mitsui Toatsu Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsui Toatsu Chemicals Inc filed Critical Mitsui Toatsu Chemicals Inc
Priority to JP55161374A priority Critical patent/JPS5785050A/ja
Publication of JPS5785050A publication Critical patent/JPS5785050A/ja
Publication of JPH0132493B2 publication Critical patent/JPH0132493B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
JP55161374A 1980-11-18 1980-11-18 Pattern forming composition Granted JPS5785050A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP55161374A JPS5785050A (en) 1980-11-18 1980-11-18 Pattern forming composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP55161374A JPS5785050A (en) 1980-11-18 1980-11-18 Pattern forming composition

Publications (2)

Publication Number Publication Date
JPS5785050A JPS5785050A (en) 1982-05-27
JPH0132493B2 true JPH0132493B2 (https=) 1989-07-04

Family

ID=15733867

Family Applications (1)

Application Number Title Priority Date Filing Date
JP55161374A Granted JPS5785050A (en) 1980-11-18 1980-11-18 Pattern forming composition

Country Status (1)

Country Link
JP (1) JPS5785050A (https=)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6317908A (ja) * 1986-07-11 1988-01-25 Toagosei Chem Ind Co Ltd 紫外線又は電子線硬化性組成物

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS527361B2 (https=) * 1972-07-05 1977-03-02
JPS5844743B2 (ja) * 1976-07-28 1983-10-05 三菱レイヨン株式会社 ホトエツチング法による食刻製品の製造方法

Also Published As

Publication number Publication date
JPS5785050A (en) 1982-05-27

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