JPH01279742A - Formation of thin 'sendust(r)' film - Google Patents
Formation of thin 'sendust(r)' filmInfo
- Publication number
- JPH01279742A JPH01279742A JP10838288A JP10838288A JPH01279742A JP H01279742 A JPH01279742 A JP H01279742A JP 10838288 A JP10838288 A JP 10838288A JP 10838288 A JP10838288 A JP 10838288A JP H01279742 A JPH01279742 A JP H01279742A
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- sendust
- film
- chromium
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229910000702 sendust Inorganic materials 0.000 title claims abstract description 44
- 230000015572 biosynthetic process Effects 0.000 title description 2
- 239000010409 thin film Substances 0.000 claims abstract description 63
- 239000011651 chromium Substances 0.000 claims abstract description 26
- 229910052804 chromium Inorganic materials 0.000 claims abstract description 24
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims abstract description 23
- 239000000758 substrate Substances 0.000 claims abstract description 17
- 238000000034 method Methods 0.000 claims abstract description 10
- 239000010408 film Substances 0.000 abstract description 11
- 230000035699 permeability Effects 0.000 abstract description 8
- 238000004544 sputter deposition Methods 0.000 abstract description 8
- 229910045601 alloy Inorganic materials 0.000 abstract description 5
- 239000000956 alloy Substances 0.000 abstract description 5
- 239000011521 glass Substances 0.000 abstract description 4
- 229910018125 Al-Si Inorganic materials 0.000 abstract 2
- 229910018520 Al—Si Inorganic materials 0.000 abstract 2
- 230000005389 magnetism Effects 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000012299 nitrogen atmosphere Substances 0.000 description 2
- 238000002441 X-ray diffraction Methods 0.000 description 1
- 150000001844 chromium Chemical class 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
Landscapes
- Physical Vapour Deposition (AREA)
Abstract
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は、薄膜磁気ヘッド等の製造に用いるセンダスト
薄膜の成膜方法に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for forming a sendust thin film used for manufacturing thin film magnetic heads and the like.
薄膜磁気ヘッド等では、スパッタリング法等により例え
ば膜厚１１Ｍ以下の非常に薄いセンダスト薄膜を形成す
る必要がある。For thin film magnetic heads and the like, it is necessary to form a very thin Sendust thin film, for example, 11M or less in thickness, by sputtering or the like.
そして、従来は、第２図に示すように、結晶化ガラス等
からなる基板１１上に直接センダスト薄膜１２を成膜し
ていた。Conventionally, as shown in FIG. 2, a sendust thin film 12 was formed directly on a substrate 11 made of crystallized glass or the like.
（発明が解決しようとする課題〕
この従来の成膜方法で成膜されたセンダスト薄膜１２の
特性例を示す。ここで基板１１は、熱膨張係数１３５Ｘ
１０−’（ｄｅｇ−’）の結晶化ガラスを用いた。また
、センダスト薄膜１２は、スパッタリング法により膜厚
１μまで成膜した。そして、成膜後は、窒素雰囲気中で
５００℃・３時間保持の熱処理を施した。この結果、セ
ンダスト薄膜１２の周波数ＩＭＩＩｚにおける透磁率は
５６０であり、保磁力は３．ＯＯｅであった・
このため、従来の成膜方法では、センダスト薄膜の透磁
率が高くならず、また保磁力も大きすぎるために、十分
な軟磁性を得ることができないという問題点が生じてい
た。(Problems to be Solved by the Invention) An example of the characteristics of the Sendust thin film 12 formed by this conventional film forming method will be shown.Here, the substrate 11 has a thermal expansion coefficient of 135X.
10-'(deg-') crystallized glass was used. The sendust thin film 12 was formed to a thickness of 1 μm by sputtering. After the film was formed, heat treatment was performed at 500° C. for 3 hours in a nitrogen atmosphere. As a result, the magnetic permeability of the Sendust thin film 12 at the frequency IMIIz is 560, and the coercive force is 3. Therefore, with conventional film formation methods, the magnetic permeability of the Sendust thin film did not increase and the coercive force was too large, resulting in the problem that sufficient soft magnetism could not be obtained. .
このように軟磁性が悪化するのは、膜厚が極めて薄いた
めに（０２２）面の高配向センダスト薄膜を形成するこ
とができないからである。そこで、本発明は、クロム薄
膜を下地層に用いて（０２２）面の高配向センダスト薄
膜を形成することにより、透磁率が高く、かつ保磁力が
小さいセンダスト薄膜を得ることを目的としている。The reason why the soft magnetism deteriorates in this way is that it is impossible to form a highly oriented sendust thin film with a (022) plane because the film thickness is extremely thin. Therefore, an object of the present invention is to obtain a Sendust thin film with high magnetic permeability and low coercive force by forming a highly oriented Sendust thin film with a (022) plane using a chromium thin film as an underlayer.
本発明に係るセンダスト薄膜の成膜方法は、上記課題を
解決するために、基板上にクロム薄膜を成膜し、このク
ロム薄膜の上層にセンダスト薄膜を成膜することを特徴
としている。In order to solve the above-mentioned problems, the method for forming a Sendust thin film according to the present invention is characterized in that a chromium thin film is formed on a substrate, and a Sendust thin film is formed on top of the chromium thin film.
クロム薄膜は、クロム（Ｃｒ）又はクロムを主体とする
合金からなる薄膜である。このクロム薄膜は、スパッタ
リング法等により基板上に成膜される。The chromium thin film is a thin film made of chromium (Cr) or an alloy mainly composed of chromium. This chromium thin film is formed on the substrate by sputtering or the like.
センダスト薄膜は、Ｆｅ−Ａｌ−３ｉ又はこれらを主体
とするセンダスト合金からなる薄膜である。このセンダ
スト薄膜は、基板上に成膜したクロム薄膜のさらに上層
にスパッタリング法等により成膜される。The Sendust thin film is a thin film made of Fe-Al-3i or a Sendust alloy mainly composed of Fe-Al-3i. This sendust thin film is formed by a sputtering method or the like as a layer further above the chromium thin film formed on the substrate.
センダスト薄膜をこのようにクロム薄膜の上層に成膜す
ると、従来と同様の薄い膜厚に形成した場合にも、（０
２２）面の高配向センダスト薄膜を得ることができる。When the sendust thin film is formed on top of the chromium thin film in this way, even when it is formed to the same thin film thickness as the conventional one,
22) A highly oriented sendust thin film can be obtained.
従って、本発明の成膜方法によれば、透磁率が高（、か
つ保磁力の小さなセンダスト薄膜を得ることができる。Therefore, according to the film forming method of the present invention, it is possible to obtain a sendust thin film with high magnetic permeability (and low coercive force).
本発明の一実施例を第１図に基づいて説明すれば、以下
の通りである。An embodiment of the present invention will be described below based on FIG.
本実施例では、方形板状の試料片上にセンダスト薄膜を
成膜する場合を示す。In this example, a case is shown in which a sendust thin film is formed on a rectangular plate-shaped sample piece.
まず、方形板状の基板１を準備した。この基板１は、熱
膨張係数が１３５ Ｘ １０− ’ （ｄｅｇ−’ ）
の結晶化ガラスを用いる。First, a rectangular plate-shaped substrate 1 was prepared. This substrate 1 has a thermal expansion coefficient of 135 x 10-'(deg-')
crystallized glass is used.
次に、この基板１の表面にクロム薄膜３を成膜した。ク
ロム薄膜３は、クロム（Ｃｒ）をスパッタリング法によ
り基板１上に成膜したものである。また、このクロム薄
膜３の膜厚は、４個の基板ｌについて、それぞれ５０人
、１００人、２００人及び１ 、０００人の４種類の厚
さを試した。Next, a chromium thin film 3 was formed on the surface of this substrate 1. The chromium thin film 3 is formed by depositing chromium (Cr) on the substrate 1 by sputtering. Furthermore, four different thicknesses of 50, 100, 200, and 1,000 thicknesses of the chromium thin film 3 were tested for four substrates 1, respectively.
そして、各基板１上に成膜されたこれらのクロム薄膜３
の上層に、さらにセンダスト薄膜２をそれぞれ成膜した
。これらのセンダスト薄膜２は、Ｆｅ−Ａｌ−３ｉのセ
ンダスト合金をスパッタリング法によりクロム薄膜３上
に成膜したものである。また、これらセンダスト薄膜２
の膜厚は、全てＩＪｆｍとした。These chromium thin films 3 formed on each substrate 1
A sendust thin film 2 was further formed on the upper layer of each. These sendust thin films 2 are formed by forming a sendust alloy of Fe-Al-3i on the chromium thin film 3 by sputtering. In addition, these sendust thin films 2
All film thicknesses were IJfm.
最後に、このセンダスト薄膜２を成膜した基板１に窒素
雰囲気中で５００℃・３時間保持の熱処理を施した。Finally, the substrate 1 on which the Sendust thin film 2 was formed was subjected to heat treatment at 500° C. for 3 hours in a nitrogen atmosphere.
上記のようにして成膜されたセンダスト薄膜２の特性を
測定した結果を第１表に示す。Table 1 shows the results of measuring the characteristics of the Sendust thin film 2 formed as described above.
第１表
この表に示すように、本実施例によるセンダスト薄膜２
の（０２２）面のＸ線回折強度を測定すると、クロム薄
膜３の膜厚が５０人、１００人、２００人及びｉ、ｏｏ
ｏ人のいずれの場合にも、従来例に比べ３倍以上であっ
た。このことから、本実施例では、クロム薄膜３を下地
層とすることにより、（０２２）面の高配向センダスト
薄膜を得ていることが分かる。そして、本実施例による
センダスト薄膜２の周波数ＩＭＩＩｚにおける透磁率は
、従来例の２〜３倍となり、保磁力も約４分の１に減少
していた。Table 1 As shown in this table, Sendust thin film 2 according to this example
When measuring the X-ray diffraction intensity of the (022) plane of
In all cases, the number of patients was more than three times that of the conventional example. From this, it can be seen that in this example, by using the chromium thin film 3 as the base layer, a highly oriented sendust thin film of the (022) plane was obtained. The magnetic permeability of the Sendust thin film 2 according to this example at the frequency IMIIz was two to three times that of the conventional example, and the coercive force was also reduced to about one-fourth.
このことから、本発明に係るセンダスト薄■りの成膜方
法を薄膜磁気ヘッド等に実施すれば、軟磁性の大幅な改
善を図ることができることは明白である。From this, it is clear that if the method for forming a thin film of Sendust according to the present invention is applied to a thin film magnetic head or the like, the soft magnetism can be significantly improved.
本発明に係るセンダスト薄膜の成膜方法は、以上のよう
に、基板上にクロム薄膜を成膜し、このクロム薄膜の上
層にセンダスト薄膜を成膜する構成をなしている。As described above, the method for forming a Sendust thin film according to the present invention has a structure in which a chromium thin film is formed on a substrate, and a Sendust thin film is formed on top of the chromium thin film.
これにより、（０２２）面の高配向センダスト薄膜を得
ることができる。そして、このセンダスト薄膜は、透磁
率が高（、かつ保磁力の小さなものとなる。As a result, a highly oriented sendust thin film with a (022) plane can be obtained. This Sendust thin film has high magnetic permeability (and low coercive force).
従って、本発明の成膜方法によれば、センダスト薄膜の
軟磁性を改善することができるという効果を奏する。Therefore, according to the film forming method of the present invention, it is possible to improve the soft magnetic properties of the Sendust thin film.
【図面の簡単な説明】
第１図は本発明の一実施例を示すものであって、センダ
スト薄膜を成膜した試料片の部分断面斜視図である。第
２図は従来例を示すものであって、センダスト薄膜を成
膜した試料片の部分断面斜視図である。
１は基板、２はセンダスト薄膜、３はクロム薄膜である
。
ｔ １ ニBRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 shows an embodiment of the present invention, and is a partial cross-sectional perspective view of a sample piece on which a sendust thin film was formed. FIG. 2 shows a conventional example, and is a partial cross-sectional perspective view of a sample piece on which a Sendust thin film has been formed. 1 is a substrate, 2 is a Sendust thin film, and 3 is a chromium thin film. t 1 d
Claims (1)
層にセンダスト薄膜を成膜することを特徴とするセンダ
スト薄膜の成膜方法。1. A method for forming a sendust thin film, which comprises forming a chromium thin film on a substrate, and forming a sendust thin film on top of the chromium thin film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63108382A JPH0751743B2 (en) | 1988-04-30 | 1988-04-30 | Method for forming sendust thin film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63108382A JPH0751743B2 (en) | 1988-04-30 | 1988-04-30 | Method for forming sendust thin film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01279742A true JPH01279742A (en) | 1989-11-10 |
| JPH0751743B2 JPH0751743B2 (en) | 1995-06-05 |
Family
ID=14483355
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63108382A Expired - Lifetime JPH0751743B2 (en) | 1988-04-30 | 1988-04-30 | Method for forming sendust thin film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0751743B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06111233A (en) * | 1992-09-30 | 1994-04-22 | Victor Co Of Japan Ltd | Thin film laminated magnetic head |
| EP0737960A1 (en) * | 1995-04-10 | 1996-10-16 | Sharp Kabushiki Kaisha | Magnetic thin film for magnetic head, method of manufacturing the same, and magnetic head |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61240434A (en) * | 1985-04-18 | 1986-10-25 | Seiko Epson Corp | Production of magnetic thin film |
-
1988
- 1988-04-30 JP JP63108382A patent/JPH0751743B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS61240434A (en) * | 1985-04-18 | 1986-10-25 | Seiko Epson Corp | Production of magnetic thin film |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH06111233A (en) * | 1992-09-30 | 1994-04-22 | Victor Co Of Japan Ltd | Thin film laminated magnetic head |
| EP0737960A1 (en) * | 1995-04-10 | 1996-10-16 | Sharp Kabushiki Kaisha | Magnetic thin film for magnetic head, method of manufacturing the same, and magnetic head |
| US5756201A (en) * | 1995-04-10 | 1998-05-26 | Sharp Kabushiki Kaisha | Magnetic thin film for magnetic head, method of manufacturing the same, and magnetic head |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0751743B2 (en) | 1995-06-05 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH01279742A (en) | Formation of thin 'sendust(r)' film | |
| JPH0323972B2 (en) | ||
| JPH02203407A (en) | Magnetic head | |
| JPS62222416A (en) | Member for thin film magnetic film | |
| JPS62134817A (en) | Magnetic recording medium | |
| JPS62132224A (en) | Vertical magnetic recording medium | |
| KR100324730B1 (en) | Method for fabricating magnetic head | |
| JPS6316414A (en) | Magnetic recording body | |
| JPH0426920A (en) | Production of magnetic disk | |
| JPH03168909A (en) | Production of magnetic head | |
| JPS61158017A (en) | Thin film magnetic head | |
| JPS60231911A (en) | Magnetic recording medium | |
| JPS62128109A (en) | Manufacture of high-permeability laminating film | |
| JP2646901B2 (en) | Substrates for magnetic recording media | |
| JPS60236118A (en) | Production of thin film magnetic recording medium | |
| JPS6247814A (en) | Double azimuth thin film magnetic head | |
| JPS62291719A (en) | Magnetic recording medium | |
| JPS61220132A (en) | Production of vertical magnetic recording medium | |
| JPH03203008A (en) | Production of laminated film of fe-si-al ferromagnetic alloy for magnetic head | |
| JPH0489620A (en) | Production of magnetic recording medium | |
| JPH0376102A (en) | Multilayer magnetic thin film and magnetic head using the same | |
| JPH02177015A (en) | Magnetic recording medium and production thereof | |
| JPS63126208A (en) | Texture-modulated magnetically-soft laminated film | |
| JPS60170027A (en) | Magnetic recording medium | |
| JPH08162355A (en) | Manufacture of soft magnetic film and magnetic head |