JPH0125055B2 - - Google Patents

Info

Publication number
JPH0125055B2
JPH0125055B2 JP56048854A JP4885481A JPH0125055B2 JP H0125055 B2 JPH0125055 B2 JP H0125055B2 JP 56048854 A JP56048854 A JP 56048854A JP 4885481 A JP4885481 A JP 4885481A JP H0125055 B2 JPH0125055 B2 JP H0125055B2
Authority
JP
Japan
Prior art keywords
positive
radiation
pmma
sensitive material
perchlorate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP56048854A
Other languages
English (en)
Japanese (ja)
Other versions
JPS57162430A (en
Inventor
Hitoshi Kato
Shugo Yamazaki
Yoshikazu Tsujino
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP56048854A priority Critical patent/JPS57162430A/ja
Publication of JPS57162430A publication Critical patent/JPS57162430A/ja
Publication of JPH0125055B2 publication Critical patent/JPH0125055B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electron Beam Exposure (AREA)
JP56048854A 1981-03-31 1981-03-31 Process for positive type fine pattern formation Granted JPS57162430A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP56048854A JPS57162430A (en) 1981-03-31 1981-03-31 Process for positive type fine pattern formation

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP56048854A JPS57162430A (en) 1981-03-31 1981-03-31 Process for positive type fine pattern formation

Publications (2)

Publication Number Publication Date
JPS57162430A JPS57162430A (en) 1982-10-06
JPH0125055B2 true JPH0125055B2 (cg-RX-API-DMAC10.html) 1989-05-16

Family

ID=12814847

Family Applications (1)

Application Number Title Priority Date Filing Date
JP56048854A Granted JPS57162430A (en) 1981-03-31 1981-03-31 Process for positive type fine pattern formation

Country Status (1)

Country Link
JP (1) JPS57162430A (cg-RX-API-DMAC10.html)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0197950A (ja) * 1986-09-01 1989-04-17 Sanyo Electric Co Ltd 高分子放射線感応材料
JP2600897B2 (ja) * 1989-04-03 1997-04-16 凸版印刷株式会社 ポジ型レジスト組成物およびパターン形成方法

Also Published As

Publication number Publication date
JPS57162430A (en) 1982-10-06

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