JPH01220872A - Oxide base superconductive material - Google Patents
Oxide base superconductive materialInfo
- Publication number
- JPH01220872A JPH01220872A JP63047217A JP4721788A JPH01220872A JP H01220872 A JPH01220872 A JP H01220872A JP 63047217 A JP63047217 A JP 63047217A JP 4721788 A JP4721788 A JP 4721788A JP H01220872 A JPH01220872 A JP H01220872A
- Authority
- JP
- Japan
- Prior art keywords
- layer
- superconducting
- oxide layer
- oxide
- substrate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000000463 material Substances 0.000 title claims abstract description 60
- 229910052751 metal Inorganic materials 0.000 claims abstract description 18
- 239000002184 metal Substances 0.000 claims abstract description 18
- 229910052737 gold Inorganic materials 0.000 claims abstract description 4
- 229910052697 platinum Inorganic materials 0.000 claims abstract description 4
- 230000001590 oxidative effect Effects 0.000 claims abstract 2
- 238000000034 method Methods 0.000 abstract description 26
- 239000000758 substrate Substances 0.000 abstract description 11
- 238000004519 manufacturing process Methods 0.000 abstract description 7
- 239000012535 impurity Substances 0.000 abstract description 6
- 230000003647 oxidation Effects 0.000 abstract description 5
- 238000007254 oxidation reaction Methods 0.000 abstract description 5
- 229910052709 silver Inorganic materials 0.000 abstract description 5
- 229910045601 alloy Inorganic materials 0.000 abstract description 4
- 239000000956 alloy Substances 0.000 abstract description 4
- 229910052802 copper Inorganic materials 0.000 abstract description 3
- 229910000856 hastalloy Inorganic materials 0.000 abstract description 3
- 150000002739 metals Chemical class 0.000 abstract description 3
- 229910052763 palladium Inorganic materials 0.000 abstract description 3
- 229910002482 Cu–Ni Inorganic materials 0.000 abstract description 2
- 229910001026 inconel Inorganic materials 0.000 abstract description 2
- 239000007769 metal material Substances 0.000 abstract description 2
- 238000002156 mixing Methods 0.000 abstract description 2
- 229910001120 nichrome Inorganic materials 0.000 abstract description 2
- 229910052759 nickel Inorganic materials 0.000 abstract description 2
- -1 stainless Inorganic materials 0.000 abstract description 2
- 229910009203 Y-Ba-Cu-O Inorganic materials 0.000 abstract 1
- 229910052758 niobium Inorganic materials 0.000 abstract 1
- 229910052715 tantalum Inorganic materials 0.000 abstract 1
- 229910052719 titanium Inorganic materials 0.000 abstract 1
- 229910052726 zirconium Inorganic materials 0.000 abstract 1
- 239000002887 superconductor Substances 0.000 description 18
- 239000000843 powder Substances 0.000 description 11
- 238000010438 heat treatment Methods 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 238000001755 magnetron sputter deposition Methods 0.000 description 7
- 238000004544 sputter deposition Methods 0.000 description 7
- 239000010408 film Substances 0.000 description 5
- 230000000737 periodic effect Effects 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 229910010293 ceramic material Inorganic materials 0.000 description 4
- 239000010949 copper Substances 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- 239000013077 target material Substances 0.000 description 4
- 238000001771 vacuum deposition Methods 0.000 description 4
- 238000005229 chemical vapour deposition Methods 0.000 description 3
- 238000001816 cooling Methods 0.000 description 3
- 229910052749 magnesium Inorganic materials 0.000 description 3
- 238000001451 molecular beam epitaxy Methods 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 229910052712 strontium Inorganic materials 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 229910052692 Dysprosium Inorganic materials 0.000 description 2
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 2
- 229910052693 Europium Inorganic materials 0.000 description 2
- 229910052689 Holmium Inorganic materials 0.000 description 2
- 229910052769 Ytterbium Inorganic materials 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910052788 barium Inorganic materials 0.000 description 2
- AYJRCSIUFZENHW-UHFFFAOYSA-L barium carbonate Chemical compound [Ba+2].[O-]C([O-])=O AYJRCSIUFZENHW-UHFFFAOYSA-L 0.000 description 2
- 229910052791 calcium Inorganic materials 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052746 lanthanum Inorganic materials 0.000 description 2
- 239000011812 mixed powder Substances 0.000 description 2
- 238000010298 pulverizing process Methods 0.000 description 2
- 229910052706 scandium Inorganic materials 0.000 description 2
- 238000000682 scanning probe acoustic microscopy Methods 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000008646 thermal stress Effects 0.000 description 2
- 238000011282 treatment Methods 0.000 description 2
- 229910052727 yttrium Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 229910052691 Erbium Inorganic materials 0.000 description 1
- JRPBQTZRNDNNOP-UHFFFAOYSA-N barium titanate Chemical compound [Ba+2].[Ba+2].[O-][Ti]([O-])([O-])[O-] JRPBQTZRNDNNOP-UHFFFAOYSA-N 0.000 description 1
- 229910002113 barium titanate Inorganic materials 0.000 description 1
- 229910052790 beryllium Inorganic materials 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000005056 compaction Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 239000002612 dispersion medium Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 229910000510 noble metal Inorganic materials 0.000 description 1
- 230000009257 reactivity Effects 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- 239000002002 slurry Substances 0.000 description 1
- 238000007592 spray painting technique Methods 0.000 description 1
- 239000003381 stabilizer Substances 0.000 description 1
- 230000000087 stabilizing effect Effects 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- VEALVRVVWBQVSL-UHFFFAOYSA-N strontium titanate Chemical compound [Sr+2].[O-][Ti]([O-])=O VEALVRVVWBQVSL-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E40/00—Technologies for an efficient electrical power generation, transmission or distribution
- Y02E40/60—Superconducting electric elements or equipment; Power systems integrating superconducting elements or equipment
Abstract
Description
【発明の詳細な説明】
「産業上の利用分野」
本発明は、ジョセフソン素子、超電導記憶素子等の超電
導デバイス、超電導配線、超電導線材などとして使用可
能な酸化物系超電導材に関する。DETAILED DESCRIPTION OF THE INVENTION "Field of Industrial Application" The present invention relates to an oxide-based superconducting material that can be used as a superconducting device such as a Josephson element or a superconducting memory element, a superconducting wiring, a superconducting wire, or the like.
「従来の技術およびその課題」
゛ 最近に至り、常電導状態から超電導状態へ遷移する
臨界温度（Ｔ ｃ）が液体窒素温度を超える値を示す酸
化物系超電導体が種々発見されている。この種の酸化物
系超電導体は、一般式Ａ −Ｂ −Ｃｕ−０（ただし、
ＡはＹ、Ｓｃ、Ｌａ、Ｙｂ、Ｅｒ、Ｅｕ、Ｈｏ、Ｄｙ等
の周期律表Ｉ［１ａ族元素の１種以上を示し、ＢはＢｅ
、Ｍｇ、Ｃａ、Ｓ ｒ、Ｂａ等の周期律表ＩＩａ族元素
の１種以上を示す）で示される酸化物であり、液体ヘリ
ウムで冷却することか必要であった従来の合金系あるい
は金属間化合物系の超電導体と比較して格段に有利な冷
却条件で使用できることから、実用上極めて有望な超電
導材料として研究がなされている。"Prior Art and its Problems" Recently, various oxide-based superconductors have been discovered whose critical temperature (Tc) for transitioning from a normal conducting state to a superconducting state exceeds the liquid nitrogen temperature. This type of oxide-based superconductor has the general formula A-B-Cu-0 (however,
A represents one or more elements of group I [1a] of the periodic table, such as Y, Sc, La, Yb, Er, Eu, Ho, Dy, etc., and B represents Be
, Mg, Ca, Sr, Ba, etc.). Since it can be used under much more advantageous cooling conditions than compound-based superconductors, it is being researched as an extremely promising superconducting material for practical use.
そして現在のところ、このような超電導体を用い、銅や
ステンレス鋼などの金属製あるいはアルミナ、チタン酸
ストロンチウム、ＹＳＺなどのセラミックス製の基材の
表面に酸化物超電導薄膜を形成して酸化物系超電導材を
形成するには、例えば基材の表面に、真空蒸着法、スパ
ッタリング法、分子線エピタキシー法、化学気相成長法
、レーザＰＶＤ法などの成膜法を用いて酸化物超電導層
を形成する方法が試みられている。Currently, such superconductors are used to form oxide superconducting thin films on the surfaces of metals such as copper and stainless steel, or ceramics such as alumina, strontium titanate, and YSZ. To form a superconducting material, for example, an oxide superconducting layer is formed on the surface of a base material using a film forming method such as a vacuum evaporation method, a sputtering method, a molecular beam epitaxy method, a chemical vapor deposition method, or a laser PVD method. A method is being tried.
しかし、セラミックス製の基材は、脆いために、衝撃を
受けて破損しやすく、機械強度の優れた酸化物系超電導
材の作成が困難な問題があった。また、これらのセラミ
ックス材料は、表面に酸化物超電導層を形成する際セラ
ミックス中の不純物が超電導層中に拡散混入して超電導
特性を低下さｄ−ることのないように、高純度のセラミ
ックス材料を使用する必要があり、このような高純度セ
ラミックス材料は価格が非常に高い上に、その製造工程
上、大面積の板体や長尺な線材等を得ることが困難なこ
とから、このようなセラミックスからなる基材を利用で
きる範囲が限られてしまう問題があった。However, ceramic base materials are brittle and are easily damaged by impact, making it difficult to create oxide-based superconducting materials with excellent mechanical strength. In addition, these ceramic materials are made of high-purity ceramic materials to prevent impurities in the ceramic from diffusing into the superconducting layer and deteriorating the superconducting properties when forming an oxide superconducting layer on the surface. These high-purity ceramic materials are extremely expensive, and due to the manufacturing process, it is difficult to obtain large-area plates or long wire rods. There has been a problem in that the range in which base materials made of ceramics can be used is limited.
また、基材として金属を用い、その表面に超電導層を形
成する場合には、界面において基材の金属と酸化物超電
導体とが反応を起こして非超電導性の物質が生成され、
超電導特性が低下してしまう問題があった。また、金属
製の基材と超電導層の熱膨張率に格差があるために、そ
の製造時あるいは使用時の温度変化によって歪を生じ、
超電導特性の低下あるいは断線などを起こす問題があっ
た。Furthermore, when a metal is used as a base material and a superconducting layer is formed on its surface, the metal of the base material and the oxide superconductor react at the interface, producing a non-superconducting substance.
There was a problem that the superconducting properties deteriorated. In addition, due to the difference in thermal expansion coefficient between the metal base material and the superconducting layer, distortion occurs due to temperature changes during manufacturing or use.
There were problems such as deterioration of superconducting properties or disconnection.
本発明は、上記課題に濫みてなされた乙ので、優れた超
電導特性を有し、かつ基材に対する超電導層の密着性が
良好で機械強度が高い酸化物系超電導材の製造方法の提
供を目的とずろ。The present invention has been made in view of the above problems, and therefore aims to provide a method for manufacturing an oxide-based superconducting material that has excellent superconducting properties, good adhesion of a superconducting layer to a base material, and high mechanical strength. Tozuro.
［課題を解決するための手段」
上記課題解決の手段として、本□発明の酸化物系超電導
材は、少なくとも表面が金属からなる基材の表面に、酸
化物層が形成され、この酸化物層上にΔｕ、Ｐｔ、Ａｇ
、Ｐｄ等の非酸化性金属からなる非酸化層が形成され、
この非酸化層上に酸化物超電導層が形成されてなるもの
である。[Means for Solving the Problems] As a means for solving the above problems, the oxide-based superconducting material of the present invention has an oxide layer formed on the surface of a base material at least whose surface is made of metal, and the oxide layer Δu, Pt, Ag on top
, a non-oxidized layer made of a non-oxidized metal such as Pd is formed,
An oxide superconducting layer is formed on this non-oxidized layer.
「作用 」
上記基材の表面に、酸化物層と非酸化層と超電導層を積
層形成するので、非酸化層が基材あるいは酸化物層から
の不純物の拡散混入を防止する。"Function" Since an oxide layer, a non-oxidized layer, and a superconducting layer are laminated on the surface of the base material, the non-oxidized layer prevents impurities from diffusing and mixing from the base material or the oxide layer.
また、超電導層と基材との間に酸化物層と非酸化層を形
成したので、熱変化によっておこる歪が緩和される。Furthermore, since an oxide layer and a non-oxidized layer are formed between the superconducting layer and the base material, strain caused by thermal changes is alleviated.
「実施例」
第１図は本発明による酸化物系超電導材の一実施例を示
す図であって、符号１は超電導材である。"Example" FIG. 1 is a diagram showing an example of an oxide-based superconducting material according to the present invention, and reference numeral 1 indicates a superconducting material.
この超電導材１は、金属製の板状の基材２上にＭｇＯか
らなる酸化物層３が形成され、この酸化物層３上にＡｕ
の非酸化層４が形成され、この非酸化層４上にＹ −Ｂ
ａ−Ｃｕ−０系超電導体からなる超電導層５が形成さ
れてなるものである。This superconducting material 1 has an oxide layer 3 made of MgO formed on a metal plate-shaped base material 2, and an Au
A non-oxidized layer 4 of Y-B is formed on this non-oxidized layer 4.
A superconducting layer 5 made of an a-Cu-0 based superconductor is formed.
上記基材２の金属材料としては、Ａｇ％Ｃｕ。The metal material of the base material 2 is Ag%Cu.
Ｔｉｓ Ｔａｓ Ｎｂｓ ＮＬ Ｚｒなどの耐熱性およ
び耐酸化性の良い金属や、ステンレス、ハステロイ、イ
ンコネル、ニクロム、Ｃｕ−Ｎ ｉ合金などの耐熱・耐
酸化性合金が好適に使用される。Metals with good heat resistance and oxidation resistance such as Tis Tas Nbs NL Zr, and heat and oxidation resistant alloys such as stainless steel, Hastelloy, Inconel, nichrome, and Cu-Ni alloy are preferably used.
また、上記酸化物層３および非酸化層４の厚さは、超電
導層５の膜厚等によって適宜設定されるが、例えば超電
導層５の膜厚を１μｍとする場合には、酸化物層３およ
び非酸化層４を０．２〜２μｍ程度の膜厚とするのが好
ましい。Further, the thicknesses of the oxide layer 3 and the non-oxidized layer 4 are appropriately set depending on the thickness of the superconducting layer 5, etc., but for example, when the thickness of the superconducting layer 5 is 1 μm, the thickness of the oxide layer 3 It is also preferable that the non-oxidized layer 4 has a thickness of about 0.2 to 2 μm.
この超電導材！を製造するには、まず、板状の基材２を
用意し、この基材２の表面に真空蒸着法、スパッタリン
グ法、分子線エピタキシー法、化学気相成長法、レーザ
ＰＶＤ法などの成膜法を用い、ＭｇＯからなる酸化物層
３を形成する。次に、この酸化物層３上にＡｕからなる
非酸化層４を形成する。この非酸化層４を形成する方法
としては、真空蒸着法やスパッタリング法が好適に使用
される。次に、この非酸化層４上にＹ −Ｂ ａ−Ｃｕ
−０超電導体からなる超電導層５を形成する。非酸化層
４上に超電導層５を形成するには、真空蒸着法、スパッ
タリング法、分子線エピタキシー法、化学気相成長法、
レーザＰＶＤ法などの成膜法の他、Ｙ −Ｂ ａ−Ｃｕ
−０超電導体粉末にエタノールなどの分散媒を加えてス
ラリー状の材料とし、この材料をスプレー塗装あるいは
基材１を材料中に浸漬して引き上げる操作によって基材
Ｉの非酸化層４上に材料を付着させた後、８００〜１０
００℃でＩ〜数十時間の熱処理を施して超電導層５を形
成する方法などが用いられる。上記Ｙ −Ｂ ａ−Ｃｕ
−０超電導粉末あるいはスパッタリング法やレーザＰＶ
Ｄ法などに使用されるＹ’ −Ｂ ａ−Ｃｕ−０超電導
体のターゲット材料を製造するには、例えばＹ、０３粉
末とＢ ａ Ｃ０３粉末とＣｕＯ粉末をＹ ：Ｂａ：Ｃ
ｕ＝ １ ：２：３となるように均一に混合した混合粉
末を酸素含有雰囲気中、７００〜１０００℃で１〜数十
時間加熱した後、粉砕、圧粉成形、加熱の一連の処理を
１回以上繰り返し行って超電導体粉末とし、更にこの超
電導体粉末をバルク状に圧粉成形し、焼結することによ
ってターゲット材料を作成する方法が好適に用いられる
。This superconducting material! To manufacture, first, a plate-shaped base material 2 is prepared, and a film is formed on the surface of this base material 2 by a method such as a vacuum evaporation method, a sputtering method, a molecular beam epitaxy method, a chemical vapor deposition method, or a laser PVD method. An oxide layer 3 made of MgO is formed using a method. Next, a non-oxidized layer 4 made of Au is formed on this oxide layer 3. As a method for forming this non-oxidized layer 4, a vacuum evaporation method or a sputtering method is suitably used. Next, on this non-oxidized layer 4, Y-Ba-Cu
A superconducting layer 5 made of -0 superconductor is formed. To form the superconducting layer 5 on the non-oxidized layer 4, a vacuum evaporation method, a sputtering method, a molecular beam epitaxy method, a chemical vapor deposition method,
In addition to film formation methods such as laser PVD, Y-B a-Cu
A dispersion medium such as ethanol is added to the -0 superconductor powder to form a slurry material, and this material is coated on the non-oxidized layer 4 of the base material I by spray painting or by immersing the base material 1 into the material and pulling it up. After attaching 800-10
A method of forming the superconducting layer 5 by performing heat treatment at 00° C. for I to several tens of hours is used. Above Y-B a-Cu
-0 superconducting powder or sputtering method or laser PV
To manufacture the target material of the Y'-B a-Cu-0 superconductor used in the D method, for example, Y,03 powder, B a C03 powder, and CuO powder are mixed into Y :Ba:C
A mixed powder uniformly mixed so that u=1:2:3 is heated at 700 to 1000°C for 1 to several tens of hours in an oxygen-containing atmosphere, and then subjected to a series of treatments of pulverization, compaction, and heating. Preferably used is a method in which the target material is created by repeating the process several times or more to obtain a superconductor powder, and then compacting the superconductor powder into a bulk shape and sintering it.
なお、スパッタリング法などの成膜法を用いて超電導層
５を形成した場合であっても、超電導層５形成後に必要
に応じて熱処理を施しても良い。Note that even if the superconducting layer 5 is formed using a film forming method such as a sputtering method, heat treatment may be performed as necessary after the superconducting layer 5 is formed.
この熱処理は酸素含有雰囲気中、８００〜１０００℃で
１〜数十時間加熱した後、室温まで徐冷する加熱条件が
好ましい。The preferred heating conditions for this heat treatment are heating at 800 to 1000° C. for 1 to several tens of hours in an oxygen-containing atmosphere, and then slowly cooling to room temperature.
以上の各操作によって、第１図に示す超電導材Ｉが製造
される。Through each of the above operations, the superconducting material I shown in FIG. 1 is manufactured.
この超電導材ｌは、金属製の基Ｉｔ２上に、ＭｇＯから
なる酸化物層３が形成され、この酸化物層３上にＡｕか
らなる非酸化層４が形成され、この非酸化層４上にＹ
−Ｂ ａ−Ｃｕ−０超電導体からなる超電導層５が形成
された構成なので、超電導層５中に基材２および酸化物
層３から不純物が拡散混入することがなく、高品質の超
電導層５を形成することができ、超電導材１の超電導特
性を向上させることができろ。In this superconducting material 1, an oxide layer 3 made of MgO is formed on a metal base It2, a non-oxidized layer 4 made of Au is formed on this oxide layer 3, and a non-oxidized layer 4 made of Au is formed on this oxide layer 3. Y
Since the superconducting layer 5 made of -B a-Cu-0 superconductor is formed, impurities are not diffused and mixed into the superconducting layer 5 from the base material 2 and the oxide layer 3, and the superconducting layer 5 is of high quality. can be formed, and the superconducting properties of the superconducting material 1 can be improved.
また、基材２と超電導層５の間に、酸化物層３と、柔ら
かく酸化物との接着性の良いＡｕからなる非酸化層４を
介在させたことにより、基材２と超電導層５の熱膨張率
の格差による超電導層５への熱応力付加が緩和され、超
電導層５に生じるクラック等の不良を減少させることが
できる。Furthermore, by interposing the oxide layer 3 and the non-oxidized layer 4 made of Au, which is soft and has good adhesion to oxides, between the base material 2 and the superconducting layer 5, Thermal stress applied to the superconducting layer 5 due to the difference in coefficient of thermal expansion is alleviated, and defects such as cracks occurring in the superconducting layer 5 can be reduced.
また、Ａｕからなる非酸化層４と超電導層５の成分とが
反応して各々の層の界面に非超電導物質が生成されるこ
とがないので、非酸化層４を超電導層５の安定化材とし
て作用させることができる。In addition, since the non-oxidized layer 4 made of Au and the components of the superconducting layer 5 do not react and a non-superconducting substance is not generated at the interface of each layer, the non-oxidized layer 4 is used as a stabilizing material for the superconducting layer 5. It can be made to act as
なお、先の実施例では、酸化物層３の材料としてＭｇＯ
を用いたが、酸化物層３の材料はこれに限定されること
なく、例えばＹＳＺ１ヂタン酸ストロンチウム、チタン
酸バリウム、アルミナなどのセラミックス材料を用いて
も良く、また基け２に酸化処理を施し、その表面に酸化
皮膜を形成し、これを酸化物層３としても良い。In addition, in the previous example, MgO was used as the material of the oxide layer 3.
However, the material of the oxide layer 3 is not limited to this, and for example, ceramic materials such as YSZ1 strontium ditanate, barium titanate, alumina, etc. may be used, or the base 2 may be subjected to an oxidation treatment. , an oxide film may be formed on the surface thereof, and this may be used as the oxide layer 3.
まｆコ、先の実施例では、非酸化層４の材料としてＡｕ
を用いたが、この非酸化層４の材料としてはＡｕに限定
されることなく、ＰＬ、Ａｇ、Ｐｄなどの貴金属の１種
あるいは２種以上を用いることができる。In the previous embodiment, Au was used as the material for the non-oxidized layer 4.
However, the material of the non-oxidized layer 4 is not limited to Au, and one or more noble metals such as PL, Ag, and Pd can be used.
また、基材２の形状は板状に限定されることなく、線状
、管状、テープ状、柱状など種々の形状のものを用いる
ことができる。Further, the shape of the base material 2 is not limited to a plate shape, and various shapes such as a linear shape, a tubular shape, a tape shape, and a columnar shape can be used.
また、先の実施例では超電導層５の材料としてＹ −Ｂ
、ａ−Ｃｕ−０超電導体を用いたが、超電導層５の材
料はこれに限定されることなく、これ以外のＡ −Ｂ
−Ｃｕ−０’（ただし、ＡはＹ、Ｓｃ、Ｌａ、Ｙｂ、Ｅ
ｒ。In addition, in the previous embodiment, Y-B was used as the material for the superconducting layer 5.
, a-Cu-0 superconductor was used, but the material of the superconducting layer 5 is not limited to this, and other A-B
-Cu-0' (A is Y, Sc, La, Yb, E
r.
Ｅｕ、Ｈｏ、Ｄｙ等の周期律表ＩＩＩａ族元素の！種以
上またはＢｉなどの周期律表ｖｂ族元素またはＴＩなど
の周期律表ｍｂ族元素の１種以上を示し、ＢはＢｅ。Group IIIa elements of the periodic table such as Eu, Ho, Dy, etc.! B represents one or more elements of group VB of the periodic table such as Bi or group MB of the periodic table such as TI, and B is Be.
Ｍｇ、Ｃａ、Ｓｒ、Ｂａ等の周期律表［１ａ族元素の１
種以上を示す）超電導体などの酸化物超電導体を用いて
も良い。なおＹ −Ｂ ａ−Ｃｕ−０以外の酸化物超電
導体としては、Ｂｉ＋ Ｓｒ ｕ Ｃａ ｖ Ｃｕ ｙ
ＯＸ（ただし、０．５≦ｕ 、 ０．２≦ｖ、ｌ≦ｙ
である。）、Ｔ ＬＢ ａｔｃ ａｒｃ ｕｚｏ ｘな
どである。Periodic table of elements such as Mg, Ca, Sr, Ba [1 of group 1a elements]
An oxide superconductor such as a superconductor (indicating more than one species) may also be used. Note that as oxide superconductors other than Y-Ba-Cu-0, Bi+ Sru Cav Cu y
OX (however, 0.5≦u, 0.2≦v, l≦y
It is. ), T LB atc arc uzo x, etc.
（製造例）
厚さ１ｍｍのハステロイ製の基板上に、マグネトロンス
パッタ法を用い、ＭｇＯからなる０、５μｍ厚の酸化物
層を形成した。次に、この酸化物層上に、マグネトロン
スパッタ法を用い、０．５μｍ厚のＡｕ層を形成した。(Manufacturing Example) An oxide layer made of MgO and having a thickness of 0.5 μm was formed on a Hastelloy substrate having a thickness of 1 mm using a magnetron sputtering method. Next, a 0.5 μm thick Au layer was formed on this oxide layer using magnetron sputtering.
一方、Ｙ、０３粉末と、ＢａＣＯ３扮末と、ＣｕＯ粉末
を、Ｙ ：Ｂａ：Ｃｕ−１：２ ：３となるように均一
に混合した混合粉末を大気中、９００℃で１２時間加熱
し、これを粉砕後、圧粉成形処理を行ってバルク状の成
形体とし、この成形体を酸素気流中、９５０℃で２４時
間加熱してスパッタ用超電導ターゲツト材を作成した。On the other hand, a mixed powder in which Y,03 powder, BaCO3 powder, and CuO powder were uniformly mixed at a ratio of Y:Ba:Cu-1:2:3 was heated at 900°C in the air for 12 hours. After pulverizing this, a powder molding process was performed to obtain a bulk shaped compact, and this compact was heated at 950° C. for 24 hours in an oxygen stream to prepare a superconducting target material for sputtering.
次に、上記ターゲツト材を用い、先の基板のＡｕ層上に
、マグネトロンスパッタ法によって厚さ１μｍの超電導
層を形成した。次いで、酸化物層とＡｕ層と超電導層の
各層を積層形成した基板を酸素雰囲気中において、９０
０℃で３時間加熱した後、室温まで徐冷する熱処理を施
した。以上の各操作により、第１図に示すものと同等構
成の超電導材（以下、実施例と言う）を得た。Next, using the above target material, a 1 μm thick superconducting layer was formed on the Au layer of the substrate by magnetron sputtering. Next, the substrate on which the oxide layer, Au layer, and superconducting layer were laminated was heated for 90 minutes in an oxygen atmosphere.
After heating at 0° C. for 3 hours, a heat treatment of slowly cooling to room temperature was performed. Through the above operations, a superconducting material (hereinafter referred to as an example) having a structure equivalent to that shown in FIG. 1 was obtained.
なお、次に示す構成の比較例！および比較例２を作成し
、上記実施例との性能比較を行った。In addition, the following is a comparative example of the configuration! Comparative Example 2 was also prepared, and the performance was compared with the above example.
上記実施例に用いたものと同様の基板上に、マグネトロ
ンスパッタ法を用いてＭｇＯからなる厚さ０，５μｍの
酸化物層を形成し、この酸化物層上に、マグネトロンス
パッタ法を用いてＹ −Ｂ ａ−Ｃｕ−０超電導体から
なる厚さ１μｍの超電導層を形成し、比較例１とした。An oxide layer of MgO with a thickness of 0.5 μm was formed on a substrate similar to that used in the above example using magnetron sputtering, and on this oxide layer, Y was formed using magnetron sputtering. A superconducting layer with a thickness of 1 μm made of -B a-Cu-0 superconductor was formed as Comparative Example 1.
また、上記実施例に用いたものと同様の基板上に、マグ
ネトロンスパッタ法を用い、厚さ０．５μｍのＡｕ層を
形成し、このＡｕ層上に、マグネトロンスパッタ法を用
いてＹ −Ｂ ａ−Ｃｕ−０超電導体からなる厚さ１μ
ｍの超電導層を形成し、比較例２とした。Further, on a substrate similar to that used in the above example, an Au layer with a thickness of 0.5 μm was formed using the magnetron sputtering method, and on this Au layer, Y-B a was formed using the magnetron sputtering method. -Thickness 1μ made of Cu-0 superconductor
Comparative Example 2 was prepared by forming a superconducting layer of m.
そして、実施例および比較例１．２の各々の臨界温度（
Ｔｃ）、臨界電流密度（Ｊｃ）を測定した。結果を表１
に示す。Then, the critical temperature (
Tc) and critical current density (Jc) were measured. Table 1 shows the results.
Shown below.
表 １
（なお、Ｔｃはゼロ抵抗時の温度）
表１に示すように、本発明による超電導材は、優れた超
電導特性が得られることが確認された。Table 1 (Tc is the temperature at zero resistance) As shown in Table 1, it was confirmed that the superconducting material according to the present invention has excellent superconducting properties.
また、上記実施例および比較例１．２の各々の超電導層
をＡＥＳ（オージェ電子分光）法により分析し、不純物
の拡散状態を調べた結果、比較例１の超電導層中には酸
化物層中のＭｇが拡散混合しており、また比較例２の超
電導層中には基板中のＮｉがＡｕ層を通して拡散混合さ
れているのに対し、実施例の超電導材中にはＭｇやＮｉ
の拡散混入は認められなかった。In addition, as a result of analyzing each superconducting layer of the above Example and Comparative Example 1.2 by AES (Auger electron spectroscopy) and investigating the diffusion state of impurities, it was found that the superconducting layer of Comparative Example 1 contained an oxide layer. In addition, in the superconducting layer of Comparative Example 2, Ni in the substrate was diffused and mixed through the Au layer, whereas in the superconducting material of the example, Mg and Ni
No diffuse contamination was observed.
「発明の効果」
以上説明したように本発明による酸化物系超電導材は、
少なくとも表面が金属からなる基材の表面に、酸化物層
が形成され、この酸化物層上にＡｕ、Ｐｔ、Ａｇ、Ｐｄ
等の非酸化性金属からなる非酸化層が形成され、この非
酸化層上に酸化物超電導層が形成された構成なので、超
電導層中に基材および酸化物層から不純物が拡散混入す
ることがなく、高品質の超電導層を形成することができ
、超電導材の超電導特性を向上させることができる。"Effects of the Invention" As explained above, the oxide-based superconducting material according to the present invention has
An oxide layer is formed on the surface of the base material, at least the surface of which is made of metal, and on this oxide layer Au, Pt, Ag, Pd
Since the structure is such that a non-oxidized layer made of a non-oxidized metal such as oxide is formed, and an oxide superconducting layer is formed on this non-oxidized layer, impurities cannot diffuse into the superconducting layer from the base material and the oxide layer. Therefore, a high-quality superconducting layer can be formed, and the superconducting properties of the superconducting material can be improved.
また、基材と超電導層の間に酸化物層および非酸化層を
介在させたことにより、基材と超電導層の熱膨張率の格
差による超電導層への熱応力付加が緩和され、超電導層
に生じるクラック等の不良を減少させることができる。In addition, by interposing an oxide layer and a non-oxidized layer between the base material and the superconducting layer, the thermal stress applied to the superconducting layer due to the difference in thermal expansion coefficient between the base material and the superconducting layer is alleviated. Defects such as cracks that occur can be reduced.
また、Ａｕなどの非酸化性金属からなる非酸化層は、超
電導層の成分との反応性がなく、超電導層との界面に非
超電導物質が生成することがないので、非酸化層を超電
導層の安定化材として作用させることができる。In addition, a non-oxidized layer made of a non-oxidized metal such as Au has no reactivity with the components of the superconducting layer, and no non-superconducting substance is generated at the interface with the superconducting layer. It can act as a stabilizing agent.
第１図は本発明の一実施例を示す図であって、超電導材
の断面図である。
１・・・超電導材、２・・・基材、３・・・酸化物層、
４・・・非酸化層、５・・・超電導層。FIG. 1 is a diagram showing one embodiment of the present invention, and is a sectional view of a superconducting material. DESCRIPTION OF SYMBOLS 1... Superconducting material, 2... Base material, 3... Oxide layer,
4... Non-oxidized layer, 5... Superconducting layer.
Claims (1)
層が形成され、この酸化物層上にＡｕ、Ｐｔ、Ａｇ、Ｐ
ｄ等の非酸化性金属からなる非酸化層が形成され、この
非酸化層上に酸化物超電導層が形成されてなることを特
徴とする酸化物系超電導材。An oxide layer is formed on the surface of the base material, at least the surface of which is made of metal, and Au, Pt, Ag, P
An oxide-based superconducting material characterized in that a non-oxidized layer made of a non-oxidizing metal such as d is formed, and an oxide superconducting layer is formed on this non-oxidized layer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63047217A JP2643972B2 (en) | 1988-02-29 | 1988-02-29 | Oxide superconducting material |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63047217A JP2643972B2 (en) | 1988-02-29 | 1988-02-29 | Oxide superconducting material |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01220872A true JPH01220872A (en) | 1989-09-04 |
| JP2643972B2 JP2643972B2 (en) | 1997-08-25 |
Family
ID=12769002
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63047217A Expired - Fee Related JP2643972B2 (en) | 1988-02-29 | 1988-02-29 | Oxide superconducting material |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2643972B2 (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5202305A (en) * | 1989-04-17 | 1993-04-13 | Ngk Insulators, Ltd. | Superconducting structure for magnetic shielding |
| EP1271666A2 (en) * | 2001-06-22 | 2003-01-02 | Fujikura Ltd. | Oxide superconductor layer and its production method |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63305574A (en) * | 1987-06-06 | 1988-12-13 | Chichibu Cement Co Ltd | Substrate for superconductor |
| JPS6450580A (en) * | 1987-08-21 | 1989-02-27 | Matsushita Electric Ind Co Ltd | Superconductor substrate and manufacture thereof |
| JPH01206675A (en) * | 1988-02-15 | 1989-08-18 | Matsushita Electric Ind Co Ltd | Superconductor |
-
1988
- 1988-02-29 JP JP63047217A patent/JP2643972B2/en not_active Expired - Fee Related
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63305574A (en) * | 1987-06-06 | 1988-12-13 | Chichibu Cement Co Ltd | Substrate for superconductor |
| JPS6450580A (en) * | 1987-08-21 | 1989-02-27 | Matsushita Electric Ind Co Ltd | Superconductor substrate and manufacture thereof |
| JPH01206675A (en) * | 1988-02-15 | 1989-08-18 | Matsushita Electric Ind Co Ltd | Superconductor |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5202305A (en) * | 1989-04-17 | 1993-04-13 | Ngk Insulators, Ltd. | Superconducting structure for magnetic shielding |
| EP1271666A2 (en) * | 2001-06-22 | 2003-01-02 | Fujikura Ltd. | Oxide superconductor layer and its production method |
| EP1271666A3 (en) * | 2001-06-22 | 2006-01-25 | Fujikura Ltd. | Oxide superconductor layer and its production method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2643972B2 (en) | 1997-08-25 |
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