JPH0121615B2 - - Google Patents

Info

Publication number
JPH0121615B2
JPH0121615B2 JP62269194A JP26919487A JPH0121615B2 JP H0121615 B2 JPH0121615 B2 JP H0121615B2 JP 62269194 A JP62269194 A JP 62269194A JP 26919487 A JP26919487 A JP 26919487A JP H0121615 B2 JPH0121615 B2 JP H0121615B2
Authority
JP
Japan
Prior art keywords
mark
reticle
wafer
light
alignment
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP62269194A
Other languages
English (en)
Japanese (ja)
Other versions
JPS63153821A (ja
Inventor
Toshio Matsura
Kyoichi Suwa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP62269194A priority Critical patent/JPS63153821A/ja
Publication of JPS63153821A publication Critical patent/JPS63153821A/ja
Publication of JPH0121615B2 publication Critical patent/JPH0121615B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Length Measuring Devices By Optical Means (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP62269194A 1987-10-27 1987-10-27 位置合わせ装置 Granted JPS63153821A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP62269194A JPS63153821A (ja) 1987-10-27 1987-10-27 位置合わせ装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP62269194A JPS63153821A (ja) 1987-10-27 1987-10-27 位置合わせ装置

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP56022951A Division JPS57138134A (en) 1981-02-20 1981-02-20 Positioning device

Publications (2)

Publication Number Publication Date
JPS63153821A JPS63153821A (ja) 1988-06-27
JPH0121615B2 true JPH0121615B2 (enrdf_load_html_response) 1989-04-21

Family

ID=17468984

Family Applications (1)

Application Number Title Priority Date Filing Date
JP62269194A Granted JPS63153821A (ja) 1987-10-27 1987-10-27 位置合わせ装置

Country Status (1)

Country Link
JP (1) JPS63153821A (enrdf_load_html_response)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009188012A (ja) * 2008-02-04 2009-08-20 Nsk Ltd 露光装置
JP5489050B2 (ja) * 2008-02-04 2014-05-14 日本精工株式会社 露光装置
WO2016111335A1 (ja) * 2015-01-07 2016-07-14 株式会社 荏原製作所 研磨パッドの表面性状測定装置を備えたｃｍｐ装置

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7606548A (nl) * 1976-06-17 1977-12-20 Philips Nv Werkwijze en inrichting voor het uitrichten van een i.c.-patroon ten opzichte van een halfgelei- dend substraat.
JPS5493974A (en) * 1978-01-06 1979-07-25 Hitachi Ltd Projection-system mask alignment unit
DE2900921C2 (de) * 1979-01-11 1981-06-04 Censor Patent- und Versuchs-Anstalt, 9490 Vaduz Verfahren zum Projektionskopieren von Masken auf ein Werkstück
FR2450468A1 (fr) * 1979-02-27 1980-09-26 Thomson Csf Systeme optique d'alignement de deux motifs et photorepeteur mettant en oeuvre un tel systeme
JPS5612728A (en) * 1979-07-12 1981-02-07 Nippon Kogaku Kk <Nikon> Alignmening device for ic projection exposure equipment

Also Published As

Publication number Publication date
JPS63153821A (ja) 1988-06-27

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