JPH01176933U - - Google Patents

Info

Publication number
JPH01176933U
JPH01176933U JP7464588U JP7464588U JPH01176933U JP H01176933 U JPH01176933 U JP H01176933U JP 7464588 U JP7464588 U JP 7464588U JP 7464588 U JP7464588 U JP 7464588U JP H01176933 U JPH01176933 U JP H01176933U
Authority
JP
Japan
Prior art keywords
coating film
elastic material
cooling stand
wafer cooling
film made
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7464588U
Other languages
English (en)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7464588U priority Critical patent/JPH01176933U/ja
Publication of JPH01176933U publication Critical patent/JPH01176933U/ja
Pending legal-status Critical Current

Links

Landscapes

  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】
図面は本考案の一実施例を示す縦断面図である
。 1は金属電極、2は第1の塗膜、3は第2の塗
膜。

Claims (1)

    【実用新案登録請求の範囲】
  1. 半導体工業用ウエハにエツチング或いは成膜処
    理等を施すに際し、これを静電気力により保持し
    冷却するウエハ冷却台であつて、冷却される金属
    電極面上に導電性弾性体からなる第1の塗膜を、
    また該第1の塗膜上に絶縁性弾性体からなる第2
    の塗膜を形成して電極の一方を構成したことを特
    徴とする静電チヤツク式ウエハ冷却台。
JP7464588U 1988-06-03 1988-06-03 Pending JPH01176933U (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7464588U JPH01176933U (ja) 1988-06-03 1988-06-03

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7464588U JPH01176933U (ja) 1988-06-03 1988-06-03

Publications (1)

Publication Number Publication Date
JPH01176933U true JPH01176933U (ja) 1989-12-18

Family

ID=31299748

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7464588U Pending JPH01176933U (ja) 1988-06-03 1988-06-03

Country Status (1)

Country Link
JP (1) JPH01176933U (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02308520A (ja) * 1989-05-23 1990-12-21 Sony Corp 低温処理装置

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH02308520A (ja) * 1989-05-23 1990-12-21 Sony Corp 低温処理装置

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