JPH0114695B2 - - Google Patents

Info

Publication number
JPH0114695B2
JPH0114695B2 JP53018466A JP1846678A JPH0114695B2 JP H0114695 B2 JPH0114695 B2 JP H0114695B2 JP 53018466 A JP53018466 A JP 53018466A JP 1846678 A JP1846678 A JP 1846678A JP H0114695 B2 JPH0114695 B2 JP H0114695B2
Authority
JP
Japan
Prior art keywords
optical system
laser light
pulsed laser
light source
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP53018466A
Other languages
English (en)
Japanese (ja)
Other versions
JPS54111832A (en
Inventor
Takeoki Myauchi
Katsuro Mizukoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1846678A priority Critical patent/JPS54111832A/ja
Publication of JPS54111832A publication Critical patent/JPS54111832A/ja
Publication of JPH0114695B2 publication Critical patent/JPH0114695B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP1846678A 1978-02-22 1978-02-22 Exposure device Granted JPS54111832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1846678A JPS54111832A (en) 1978-02-22 1978-02-22 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1846678A JPS54111832A (en) 1978-02-22 1978-02-22 Exposure device

Publications (2)

Publication Number Publication Date
JPS54111832A JPS54111832A (en) 1979-09-01
JPH0114695B2 true JPH0114695B2 (enrdf_load_stackoverflow) 1989-03-14

Family

ID=11972406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1846678A Granted JPS54111832A (en) 1978-02-22 1978-02-22 Exposure device

Country Status (1)

Country Link
JP (1) JPS54111832A (enrdf_load_stackoverflow)

Families Citing this family (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814530A (ja) * 1981-07-17 1983-01-27 Fujitsu Ltd レ−ザ光照射方法
US4516832A (en) * 1982-06-23 1985-05-14 International Business Machines Corporation Apparatus for transformation of a collimated beam into a source of _required shape and numerical aperture
JPS597359A (ja) * 1982-07-02 1984-01-14 Canon Inc 照明装置
JPS59153548U (ja) * 1983-03-31 1984-10-15 理化学研究所 パルスレ−ザ−による樹脂凸版の製版装置
JPS60162258A (ja) * 1984-02-01 1985-08-24 Canon Inc 露光装置
US5091744A (en) * 1984-02-13 1992-02-25 Canon Kabushiki Kaisha Illumination optical system
JPH0721583B2 (ja) * 1985-01-22 1995-03-08 株式会社ニコン 露光装置
JPH0792556B2 (ja) * 1984-04-28 1995-10-09 株式会社ニコン 露光装置
JPS61117551A (ja) * 1984-11-13 1986-06-04 Ushio Inc 露光装置
JPH0721585B2 (ja) * 1985-10-28 1995-03-08 キヤノン株式会社 照明光学系
JPS6344726A (ja) * 1986-08-12 1988-02-25 Norihisa Ito エキシマレ−ザを用いたステツパの照明光学装置
DE3750174T2 (de) * 1986-10-30 1994-11-17 Canon K.K., Tokio/Tokyo Belichtungseinrichtung.
JPS63173322A (ja) * 1987-01-13 1988-07-16 Toshiba Corp 半導体露光装置
JPS6428916A (en) * 1987-07-24 1989-01-31 Canon Kk Aligner
JP2653793B2 (ja) * 1987-09-04 1997-09-17 キヤノン株式会社 露光装置及び素子製造方法
JP2732498B2 (ja) * 1988-11-24 1998-03-30 株式会社日立製作所 縮小投影式露光方法及びその装置
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
JP2946950B2 (ja) * 1992-06-25 1999-09-13 キヤノン株式会社 照明装置及びそれを用いた露光装置
JPH06168862A (ja) * 1992-06-30 1994-06-14 Think Lab Kk 半導体レーザ露光装置
JPH07105337B2 (ja) * 1994-04-22 1995-11-13 株式会社日立製作所 パターン刻印装置
JPH09102456A (ja) * 1996-05-24 1997-04-15 Canon Inc 照明光学装置
KR100533836B1 (ko) * 2004-04-28 2005-12-07 삼성전자주식회사 산화촉매유닛 및 이를 포함한 습식 전자사진방식화상형성장치

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (enrdf_load_stackoverflow) * 1971-08-25 1973-04-23

Also Published As

Publication number Publication date
JPS54111832A (en) 1979-09-01

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