JPS54111832A - Exposure device - Google Patents

Exposure device

Info

Publication number
JPS54111832A
JPS54111832A JP1846678A JP1846678A JPS54111832A JP S54111832 A JPS54111832 A JP S54111832A JP 1846678 A JP1846678 A JP 1846678A JP 1846678 A JP1846678 A JP 1846678A JP S54111832 A JPS54111832 A JP S54111832A
Authority
JP
Japan
Prior art keywords
light
exposure
laser
reticle
enters
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP1846678A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0114695B2 (enrdf_load_stackoverflow
Inventor
Takeoki Miyauchi
Katsuro Mizukoshi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP1846678A priority Critical patent/JPS54111832A/ja
Publication of JPS54111832A publication Critical patent/JPS54111832A/ja
Publication of JPH0114695B2 publication Critical patent/JPH0114695B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Projection-Type Copiers In General (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP1846678A 1978-02-22 1978-02-22 Exposure device Granted JPS54111832A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1846678A JPS54111832A (en) 1978-02-22 1978-02-22 Exposure device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1846678A JPS54111832A (en) 1978-02-22 1978-02-22 Exposure device

Publications (2)

Publication Number Publication Date
JPS54111832A true JPS54111832A (en) 1979-09-01
JPH0114695B2 JPH0114695B2 (enrdf_load_stackoverflow) 1989-03-14

Family

ID=11972406

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1846678A Granted JPS54111832A (en) 1978-02-22 1978-02-22 Exposure device

Country Status (1)

Country Link
JP (1) JPS54111832A (enrdf_load_stackoverflow)

Cited By (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814530A (ja) * 1981-07-17 1983-01-27 Fujitsu Ltd レ−ザ光照射方法
DE3323852A1 (de) * 1982-07-02 1984-01-05 Canon K.K., Tokyo Beleuchtungsvorrichtung
JPS597360A (ja) * 1982-06-23 1984-01-14 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光源発生装置
JPS59153548U (ja) * 1983-03-31 1984-10-15 理化学研究所 パルスレ−ザ−による樹脂凸版の製版装置
JPS60162258A (ja) * 1984-02-01 1985-08-24 Canon Inc 露光装置
JPS60230629A (ja) * 1984-04-28 1985-11-16 Nippon Kogaku Kk <Nikon> 照明光学装置
JPS61117551A (ja) * 1984-11-13 1986-06-04 Ushio Inc 露光装置
JPS61169815A (ja) * 1985-01-22 1986-07-31 Nippon Kogaku Kk <Nikon> 露光装置
JPS62100724A (ja) * 1985-10-28 1987-05-11 Canon Inc 照明光学系
JPS6344726A (ja) * 1986-08-12 1988-02-25 Norihisa Ito エキシマレ−ザを用いたステツパの照明光学装置
JPS63173322A (ja) * 1987-01-13 1988-07-16 Toshiba Corp 半導体露光装置
JPS6428916A (en) * 1987-07-24 1989-01-31 Canon Kk Aligner
JPS6465836A (en) * 1987-09-04 1989-03-13 Canon Kk Aligner
US4974919A (en) * 1986-10-30 1990-12-04 Canon Kabushiki Kaisha Illuminating device
US5016149A (en) * 1988-11-24 1991-05-14 Hitachi, Ltd. Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same
US5091744A (en) * 1984-02-13 1992-02-25 Canon Kabushiki Kaisha Illumination optical system
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
JPH06168862A (ja) * 1992-06-30 1994-06-14 Think Lab Kk 半導体レーザ露光装置
JPH06302488A (ja) * 1994-04-22 1994-10-28 Hitachi Ltd パターン形成装置
US5459547A (en) * 1992-06-25 1995-10-17 Canon Kabushiki Kaisha Illumination device
JPH09102456A (ja) * 1996-05-24 1997-04-15 Canon Inc 照明光学装置
US7245846B2 (en) * 2004-04-28 2007-07-17 Samsung Electronics Co., Ltd. Oxidation catalyst unit and a wet-type electrophotographic image forming apparatus comprising the same and a method thereof

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (enrdf_load_stackoverflow) * 1971-08-25 1973-04-23

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4830875A (enrdf_load_stackoverflow) * 1971-08-25 1973-04-23

Cited By (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5814530A (ja) * 1981-07-17 1983-01-27 Fujitsu Ltd レ−ザ光照射方法
JPS597360A (ja) * 1982-06-23 1984-01-14 インタ−ナショナル　ビジネス　マシ−ンズ　コ−ポレ−ション 光源発生装置
DE3323852A1 (de) * 1982-07-02 1984-01-05 Canon K.K., Tokyo Beleuchtungsvorrichtung
JPS59153548U (ja) * 1983-03-31 1984-10-15 理化学研究所 パルスレ−ザ−による樹脂凸版の製版装置
JPS60162258A (ja) * 1984-02-01 1985-08-24 Canon Inc 露光装置
US5091744A (en) * 1984-02-13 1992-02-25 Canon Kabushiki Kaisha Illumination optical system
JPS60230629A (ja) * 1984-04-28 1985-11-16 Nippon Kogaku Kk <Nikon> 照明光学装置
JPS61117551A (ja) * 1984-11-13 1986-06-04 Ushio Inc 露光装置
JPS61169815A (ja) * 1985-01-22 1986-07-31 Nippon Kogaku Kk <Nikon> 露光装置
JPS62100724A (ja) * 1985-10-28 1987-05-11 Canon Inc 照明光学系
JPS6344726A (ja) * 1986-08-12 1988-02-25 Norihisa Ito エキシマレ−ザを用いたステツパの照明光学装置
US4974919A (en) * 1986-10-30 1990-12-04 Canon Kabushiki Kaisha Illuminating device
JPS63173322A (ja) * 1987-01-13 1988-07-16 Toshiba Corp 半導体露光装置
JPS6428916A (en) * 1987-07-24 1989-01-31 Canon Kk Aligner
JPS6465836A (en) * 1987-09-04 1989-03-13 Canon Kk Aligner
US5016149A (en) * 1988-11-24 1991-05-14 Hitachi, Ltd. Illuminating method and illuminating apparatus for carrying out the same, and projection exposure method and projection exposure apparatus for carrying out the same
US5153773A (en) * 1989-06-08 1992-10-06 Canon Kabushiki Kaisha Illumination device including amplitude-division and beam movements
US5463497A (en) * 1989-06-08 1995-10-31 Canon Kabushiki Kaisha Illumination device including an optical integrator defining a plurality of secondary light sources and related method
US5459547A (en) * 1992-06-25 1995-10-17 Canon Kabushiki Kaisha Illumination device
US5684567A (en) * 1992-06-25 1997-11-04 Canon Kabushiki Kaisha Exposure apparatus and device manufacturing method for projecting light from a secondary light source onto a mask or pattern
JPH06168862A (ja) * 1992-06-30 1994-06-14 Think Lab Kk 半導体レーザ露光装置
JPH06302488A (ja) * 1994-04-22 1994-10-28 Hitachi Ltd パターン形成装置
JPH09102456A (ja) * 1996-05-24 1997-04-15 Canon Inc 照明光学装置
US7245846B2 (en) * 2004-04-28 2007-07-17 Samsung Electronics Co., Ltd. Oxidation catalyst unit and a wet-type electrophotographic image forming apparatus comprising the same and a method thereof

Also Published As

Publication number Publication date
JPH0114695B2 (enrdf_load_stackoverflow) 1989-03-14

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